公开(公告)号：US20130098555A1

公开(公告)日：2013-04-25

申请号：US13595612

申请日：2012-08-27

申请人： Kallol Bera ,  Shahid Rauf ,  Ankur Agarwal

发明人： Kallol Bera ,  Shahid Rauf ,  Ankur Agarwal

IPC分类号： H05H1/46

CPC分类号： H01J37/3233

摘要： In a plasma reactor employing a planar electron beam as a plasma source, the electron beam source chamber has an internal conductive fin that is profiled along a direction transverse to the beam propagation diction and parallel to the plane of the electron beam, in order to correct electron beam density distribution.

摘要翻译： 在采用平面电子束作为等离子体源的等离子体反应器中，电子束源室具有内部导电翅片，该内部导电翅片沿着横向于光束传播的方向并且平行于电子束的平面成型，以便校正 电子束密度分布。

公开(公告)号：US09267742B2

公开(公告)日：2016-02-23

申请号：US12886255

申请日：2010-09-20

申请人： Kallol Bera ,  Xiaoping Zhou ,  Douglas A. Buchberger, Jr. ,  Andrew Nguyen ,  Hamid Tavassoli ,  Surajit Kumar ,  Shahid Rauf

发明人： Kallol Bera ,  Xiaoping Zhou ,  Douglas A. Buchberger, Jr. ,  Andrew Nguyen ,  Hamid Tavassoli ,  Surajit Kumar ,  Shahid Rauf

IPC分类号： F25B29/00 ,  F28F3/12 ,  F28F13/00

CPC分类号： F28F3/12 ,  F28F2013/001

摘要： Apparatus for controlling the thermal uniformity of a substrate. In some embodiments, the thermal uniformity of the substrate is controlled to be more uniform. In some embodiments, the thermal uniformity of the substrate is controlled to be non-uniform in a desired pattern. In some embodiments, an apparatus for controlling thermal uniformity of a substrate includes a substrate support having a support surface to support a substrate thereon. A plurality of flow paths having a substantially equivalent fluid conductance are disposed within the substrate support to flow a heat transfer fluid beneath the support surface.

摘要翻译： 用于控制基板的热均匀性的装置。 在一些实施例中，将基板的热均匀性控制得更均匀。 在一些实施例中，基板的热均匀性被控制为以期望的图案不均匀。 在一些实施例中，用于控制衬底的热均匀性的装置包括具有用于在其上支撑衬底的支撑表面的衬底支撑件。 具有基本相当的流体电导的多个流动路径设置在基板支撑件内，以使传热流体在支撑表面下方流动。

公开(公告)号：US08894805B2

公开(公告)日：2014-11-25

申请号：US13595452

申请日：2012-08-27

申请人： Kallol Bera ,  Shahid Rauf ,  Leonid Dorf ,  Kenneth S. Collins ,  Ajit Balakrishna ,  Gary Leray

发明人： Kallol Bera ,  Shahid Rauf ,  Leonid Dorf ,  Kenneth S. Collins ,  Ajit Balakrishna ,  Gary Leray

IPC分类号： H05H1/46 ,  H01J37/32 ,  H05H7/00

CPC分类号： H01J37/3233 ,  H05H1/46 ,  H05H7/001

摘要： A plasma reactor employs an e-beam source to generate plasma, and the e-beam source has a configurable magnetic shield.

摘要翻译： 等离子体反应器采用电子束源产生等离子体，并且电子束源具有可配置的磁屏蔽。

公开(公告)号：US08076247B2

公开(公告)日：2011-12-13

申请号：US11733770

申请日：2007-04-11

申请人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger, Jr. ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

发明人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger, Jr. ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC分类号： H01L21/302

CPC分类号： C23C16/45574 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/67069 ,  H01L21/6831

摘要： A method is provided for processing a workpiece in a plasma reactor chamber. The method includes coupling, to a plasma in the chamber, power of an RF frequency via a ceiling electrode and coupling, to the plasma, power of at least approximately the same RF frequency via a workpiece support electrode. The method also includes providing an edge ground return path. The method further includes adjusting the proportion between (a) current flow between said electrodes and (b) current flow to the edge ground return path from said electrodes, to control plasma ion density distribution uniformity over the workpiece.

摘要翻译： 提供了一种用于在等离子体反应器室中处理工件的方法。 该方法包括通过天线电极将等离子体耦合到腔室中的等离子体，并通过工件支撑电极将等离子体的功率耦合到至少近似相同的RF频率。 该方法还包括提供边缘接地返回路径。 该方法还包括调节（a）所述电极之间的电流之间的比例和（b）从所述电极到达边缘接地返回路径的电流，以控制工件上的等离子体离子密度分布均匀性。

公开(公告)号：US20090159213A1

公开(公告)日：2009-06-25

申请号：US12004472

申请日：2007-12-19

申请人： Kallol Bera ,  Shahid Rauf

发明人： Kallol Bera ,  Shahid Rauf

IPC分类号： C23F1/08

CPC分类号： H01J37/3244

摘要： A showerhead of a plasma reactor has an internal plenum comprising a showerhead floor and a plurality of gas injection holes through the floor of the showerhead. A path splitting manifold is immersed inside the plenum and comprises a gas supply inlet, plural gas outlets, and a plurality of channels comprising plural paths of equal lengths between the inlet and respective ones of the plural outlets.

摘要翻译： 等离子体反应器的喷头具有内部增压室，其包括喷头底板和穿过喷头底部的多个气体注入孔。 路径分流歧管浸入增压室内，包括气体供应入口，多个气体出口，以及多个通道，其包括多个入口与多个出口中相应长度的相同长度的通道。

公开(公告)号：US20090159002A1

公开(公告)日：2009-06-25

申请号：US12004448

申请日：2007-12-19

申请人： Kallol Bera ,  Shahid Rauf

发明人： Kallol Bera ,  Shahid Rauf

IPC分类号： C23C16/44 ,  B05B1/18

CPC分类号： C23C16/45585 ,  H01J37/3244

摘要： A gas distribution plate for a plasma reactor has an annular gas distribution plenum with an array of gas injection holes and a gas injection port at one end of the annular plenum, the plenum being progressively constricted in cross-sectional area along its azimuthal path by a sloping ceiling.

摘要翻译： 用于等离子体反应器的气体分配板具有环形气体分配气室，其具有气体注入孔阵列和在环形增压室的一端处的气体注入口，所述增压室沿着其方位角路径的横截面积逐渐收缩， 倾斜的天花板

公开(公告)号：US20080179011A1

公开(公告)日：2008-07-31

申请号：US11734040

申请日：2007-04-11

申请人： KENNETH S. COLLINS ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

发明人： KENNETH S. COLLINS ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/45574 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/67069 ,  H01L21/6831

摘要： A plasma reactor includes an electrostatic chuck in the chamber for supporting the workpiece, a ceiling electrode facing the electrostatic chuck and an ESC electrode in the electrostatic chuck with an electrostatic clamping voltage supply coupled to the ESC electrode. The reactor further includes at least a first RF bias source of an LF or HF frequency coupled to the pedestal electrode, and first and second VHF power sources of different frequencies coupled to the same or to different ones of the electrodes. The first and second VHF power sources are of sufficiently high and sufficiently low frequencies, respectively, to produce center-high and center-low plasma distribution non-uniformities, respectively, in the chamber.

摘要翻译： 等离子体反应器包括用于支撑工件的室中的静电卡盘，面向静电卡盘的天花板电极和静电卡盘中的ESC电极，其具有耦合到ESC电极的静电钳位电压源。 反应器还包括耦合到基座电极的LF或HF频率的至少第一RF偏置源，以及耦合到相同或不同电极的不同频率的第一和第二VHF电源。 第一和第二VHF电源分别具有足够高和足够低的频率，以分别在腔室中产生中心高和中心低等离子体分布不均匀性。

公开(公告)号：US20180308663A1

公开(公告)日：2018-10-25

申请号：US15960372

申请日：2018-04-23

申请人： Kenneth S. Collins ,  Kartik Ramaswamy ,  Yue Guo ,  Shahid Rauf ,  Kallol Bera ,  James D. Carducci ,  Michael R. Rice

发明人： Kenneth S. Collins ,  Kartik Ramaswamy ,  Yue Guo ,  Shahid Rauf ,  Kallol Bera ,  James D. Carducci ,  Michael R. Rice

IPC分类号： H01J37/32 ,  C23C16/455

CPC分类号： H01J37/32137 ,  C23C16/45536 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32715 ,  H01J2237/3321 ,  H01J2237/3323 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6831

摘要： A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distributor to deliver a processing gas to the plasma chamber, a pump coupled to the plasma chamber to evacuate the chamber, a workpiece support to hold a workpiece, an intra-chamber electrode assembly including a plurality of filaments extending laterally through the plasma chamber between a ceiling of the plasma chamber and the workpiece support, each filament including a conductor surrounded by a cylindrical insulating shell, and an RF power source configured to apply a first RF signal to at least some of the plurality of filaments, to apply a second RF signal of equal frequency to at least some of the plurality of filaments, and to modulate a phase offset between the first RF signal and the second RF signal.

公开(公告)号：US08512509B2

公开(公告)日：2013-08-20

申请号：US12004444

申请日：2007-12-19

申请人： Kallol Bera ,  Shahid Rauf

发明人： Kallol Bera ,  Shahid Rauf

IPC分类号： H01L21/306

CPC分类号： B01J19/26 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32449

摘要： In a showerhead assembly, a path splitting manifold comprises a gas supply inlet and a planar floor and plural gas outlets extending axially through the floor and azimuthally distributed about the floor. The path splitting manifold further comprises a plurality of channels comprising plural paths between the inlet and respective ones of the plural outlets. A gas distribution showerhead underlies the floor of the manifold and is open to the plural outlets. In certain embodiments, the plural paths are of equal lengths.

公开(公告)号：US20130098873A1

公开(公告)日：2013-04-25

申请号：US13595655

申请日：2012-08-27

申请人： Kartik Ramaswamy ,  Kallol Bera ,  Kenneth S. Collins ,  Shahid Rauf

发明人： Kartik Ramaswamy ,  Kallol Bera ,  Kenneth S. Collins ,  Shahid Rauf

IPC分类号： H01L21/3065 ,  C23F1/08

CPC分类号： H01J37/32091 ,  H01J37/32541

摘要： A plasma reactor has a main chamber for processing a workpiece in a processing region bounded between an overhead ceiling and a workpiece support surface, the reactor having an overhead electron beam source that produces an electron beam flowing into the processing region through the ceiling of the main chamber.

摘要翻译： 等离子体反应器具有用于在位于顶棚顶板和工件支撑表面之间的加工区域内加工工件的主室，所述反应器具有塔顶电子束源，其产生通过主体的天花板流入处理区域的电子束 房间。