Abstract:
Apparatus for forming a magnetic field and methods of use thereof are provided herein. In some embodiments, a plurality of coils having substantially similar dimensions disposed about a process chamber in a symmetric pattern centered about a central axis of the process chamber, wherein the plurality of coils are configured to produce a magnetic field having a plurality of magnetic field lines that are substantially planar and substantially parallel. In some embodiments, the plurality of coils comprises eight coils disposed about the process chamber, wherein each of the eight coils is offset by an angle of about 45 degrees from respective adjacent coils of the eight coils.
Abstract:
A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented beam dump that is profiled to promote uniformity in the electron beam-produced plasma.
Abstract:
A plasma, reactor that relies on an electron beam as a plasma source employs a profiled electron beam extraction grid in an electron beam source to improve uniformity.
Abstract:
A plasma thruster includes extraction of a stream of positive ions. The plasma thruster includes a single ionization stage; injecting ionizable gas for said ionization stage comprising injecting a first gas and an electronegative second gas; creating an RF electric field to cause the gases to ionize in the ionization stage creating a first zone called the hot zone, in the ionization stage; the first gas being distributed in the hot first zone, the second gas being distributed in a second zone less hot than said first zone; extracting a stream of negative ions and a stream of positive ions, these being both connected to the ionization stage; and the extraction of a stream of positive ions and the extraction of a stream of negative ions, ensuring that the thruster is electrically neutral.
Abstract:
Apparatus for forming a magnetic field and methods of use thereof are provided herein. In some embodiments, a plurality of coils having substantially similar dimensions disposed about a process chamber in a symmetric pattern centered about a central axis of the process chamber, wherein the plurality of coils are configured to produce a magnetic field having a plurality of magnetic field lines that are substantially planar and substantially parallel. In some embodiments, the plurality of coils comprises eight coils disposed about the process chamber, wherein each of the eight coils is offset by an angle of about 45 degrees from respective adjacent coils of the eight coils.
Abstract:
A plasma thruster includes extraction of a stream of positive ions. The plasma thruster includes a single ionization stage; means for injecting ionizable gas for said ionization stage, said means comprising at least first means for injecting a first gas and second means for injecting an electronegative second gas; means for creating an RF electric field so as to cause the gases to ionize in the ionization stage, said means creating a first zone called the hot zone, in the ionization stage; the first gas being distributed in the hot first zone, the second gas being distributed in a second zone less hot than said first zone; first means for extracting a stream of negative ions and second means for extracting a stream of positive ions, these being both connected to the ionization stage; and the extraction of a stream of positive ions and the extraction of a stream of negative ions, ensuring that the thruster is electrically neutral.
Abstract:
A plasma reactor that generates plasma in workpiece processing chamber by a electron beam, has an electron beam source chamber and an array of plasma sources facing the electron beam source chamber for affecting plasma electron density in different portions of the processing chamber. In another embodiment, an array of separately controlled electron beam source chambers is provided.
Abstract:
A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented beam dump that is profiled to promote uniformity in the electron beam-produced plasma.