公开(公告)号：US09637421B2

公开(公告)日：2017-05-02

申请号：US14401680

申请日：2013-05-15

申请人： KURARAY CO., LTD.

发明人： Osamu Nakayama ,  Junichi Fuji ,  Masaki Shimizu

IPC分类号： C07C1/20 ,  C07C1/207 ,  C07C1/213 ,  B01J31/24

CPC分类号： C07C1/2078 ,  B01J31/24 ,  B01J31/2404 ,  B01J2231/40 ,  B01J2531/824 ,  C07C1/213 ,  C07C2531/12 ,  C07C2531/24 ,  C07C11/12

摘要： An object of the present invention is to provide a process for producing an octadiene from 2,7-octadienyl formate in an industrially useful manner in which palladium can maintain its catalytic activity for a long period of time. More specifically, the present invention relates to a process for producing an octadiene which includes the steps of continuously adding 2,7-octadienyl formate into a reaction system in which a mixture of a palladium compound, a tertiary organophosphorus compound and a solvent is present; and subjecting the 2,7-octadienyl formate to reaction while continuously distilling off a reaction product containing the resulting octadiene out of the reaction system.

公开(公告)号：US20150105598A1

公开(公告)日：2015-04-16

申请号：US14401680

申请日：2013-05-15

申请人： KURARAY CO., LTD.

发明人： Osamu Nakayama ,  Junichi Fuji ,  Masaki Shimizu

IPC分类号： C07C1/207

CPC分类号： C07C1/2078 ,  B01J31/24 ,  B01J31/2404 ,  B01J2231/40 ,  B01J2531/824 ,  C07C1/213 ,  C07C2531/12 ,  C07C2531/24 ,  C07C11/12

摘要： An object of the present invention is to provide a process for producing an octadiene from 2,7-octadienyl formate in an industrially useful manner in which palladium can maintain its catalytic activity for a long period of time. More specifically, the present invention relates to a process for producing an octadiene which includes the steps of continuously adding 2,7-octadienyl formate into a reaction system in which a mixture of a palladium compound, a tertiary organophosphorus compound and a solvent is present; and subjecting the 2,7-octadienyl formate to reaction while continuously distilling off a reaction product containing the resulting octadiene out of the reaction system.

摘要翻译： 本发明的目的是提供一种以工业上有用的方式从2,7-辛二烯基甲酸生产辛二烯的方法，其中钯可以长时间保持其催化活性。 更具体地说，本发明涉及一种辛二烯的制造方法，该方法包括以下步骤：在其中存在钯化合物，叔有机磷化合物和溶剂的混合物的反应体系中连续加入2,7-辛二烯基甲酸酯; 并将2,7-辛二烯基甲酸酯反应，同时连续地将含有所得辛二烯的反应产物蒸馏出反应体系。

公开(公告)号：US09395625B2

公开(公告)日：2016-07-19

申请号：US14381352

申请日：2013-02-25

申请人： KURARAY CO., LTD.

发明人： Akinobu Takeda ,  Takashi Fukumoto ,  Osamu Nakayama

IPC分类号： C07D275/04 ,  C07D275/06 ,  G03F7/038 ,  C08F20/38 ,  G03F7/039 ,  C08F228/02 ,  C08F128/06

CPC分类号： G03F7/038 ,  C07D275/04 ,  C07D275/06 ,  C08F20/38 ,  C08F128/06 ,  C08F228/02 ,  G03F7/0397

摘要： Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, m, x, and y are as defined in the text of Description.

摘要翻译： 本发明提供一种丙烯酸酯衍生物，其用作半导体用光致抗蚀剂组合物中所含的聚合物的构成单元时，显示出优异的光刻特性如LWR等。 具体地，提供由以下通式（1）表示的丙烯酸酯衍生物。 另外，作为丙烯酸酯衍生物的中间体及其制造方法， 含有丙烯酸酯衍生物作为构成单元的聚合物; 以及含有该聚合物的半导体的光致抗蚀剂组合物。 其中，R 1，R 2，R 3，R 4，R 5，R 6，R 7，R 8，R 9，R 10，R 11，R 12，R 13，m，x和y如说明书的文字所定义。

公开(公告)号：US20150037733A1

公开(公告)日：2015-02-05

申请号：US14381352

申请日：2013-02-25

申请人： KURARAY CO., LTD.

发明人： Akinobu Takeda ,  Takashi Fukumoto ,  Osamu Nakayama

IPC分类号： G03F7/038 ,  C08F128/06 ,  C07D275/06

CPC分类号： G03F7/038 ,  C07D275/04 ,  C07D275/06 ,  C08F20/38 ,  C08F128/06 ,  C08F228/02 ,  G03F7/0397

摘要： Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, m, x, and y are as defined in the text of Description.

摘要翻译： 本发明提供一种丙烯酸酯衍生物，其用作半导体用光致抗蚀剂组合物中所含的聚合物的构成单元时，显示出优异的光刻特性如LWR等。 具体地，提供由以下通式（1）表示的丙烯酸酯衍生物。 另外，作为丙烯酸酯衍生物的中间体及其制造方法， 含有丙烯酸酯衍生物作为构成单元的聚合物; 以及含有该聚合物的半导体的光致抗蚀剂组合物。 其中，R 1，R 2，R 3，R 4，R 5，R 6，R 7，R 8，R 9，R 10，R 11，R 12，R 13，m，x和y如说明书的文字所定义。