Abstract:
Provided are a saturable absorber including at least one material selected from a group of MXenes, and a Q-switching and mode-locked pulsed laser system using the same.
Abstract:
Provided is a method of analyzing binding efficiency of adhesive nanoparticles. The method includes (a) injecting a solution containing nanoparticles into a first chamber slide, (b) evaporating only the solution from the first chamber slide into which the solution containing the nanoparticles is injected, and measuring a saturation temperature using a thermal imager while radiating light from a light source, (c) injecting cells into a second chamber slide, (d) injecting a solution containing nanoparticles into the second chamber slide in which the cells are cultured, (e) removing nanoparticles which are not bound to the cells from the second chamber slide into which the cells and the nanoparticles are injected, and (f) evaporating only the solution from the second chamber slide from which the nanoparticles are removed, and measuring a saturation temperature using a thermal image while radiating light from the light source.
Abstract:
Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.
Abstract:
The present disclosure relates to a photoacoustic gas sensor for detecting the presence or absence of gas using the interaction of a laser beam and gas molecules. The integrated photoacoustic gas sensor according to an embodiment includes a light output unit; a lens unit configured to concentrate a laser beam output from the light output unit; and a photoacoustic sensing unit having a quartz tuning fork aligned on the lens unit and configured to convert a vibration, generated when the laser beam passing through the lens unit interacts with gas molecules, into an electric signal.
Abstract:
Disclosed are an apparatus for estimating a pedestrian position based on pedestrian motion recognition, and a method therefor. The method for estimating the pedestrian position based on pedestrian motion recognition includes recognizing a specific motion of a plurality of motions of the pedestrian, performing a unique pedestrian dead-reckoning (PDR) technique corresponding to the recognized specific motion among unique PDR techniques for each of the plurality of motions of the pedestrian, and estimating the pedestrian's position by the performed unique PDR technique.
Abstract:
One aspect of the disclosed is to provide a method of manufacturing a nanoporous multilayer graphene membrane, including a first step of oxidizing a surface of a multilayer graphene membrane, a second step of reducing the oxidized surface of the multilayer graphene to carry out reductive etching such that oxidized carbon atoms on the surface are naturally and randomly dispersed, and a third step of repeatedly performing a series of the first and the second steps until nanopores penetrating the multilayer graphene are formed.
Abstract:
Provided is an extreme ultra-violet (EUV) beam generation apparatus using multi-gas cell modules in which a gas is prevented from directly flowing into a vacuum chamber by adding an auxiliary gas cell serving as a buffer chamber to a main gas cell, a diffusion rate of the gas is decreased, a high vacuum state is maintained, and a higher power EUV beam is continuously generated.
Abstract:
Provided are an apparatus and method for calibrating an extreme ultraviolet (EUV) spectrometer in which a wavelength of a spectrum of EUV light used for EUV lithography and mask inspection technology can be measured accurately.
Abstract:
Provided is a pulse laser apparatus for generating laser light. The apparatus includes a first mirror and a second mirror which are disposed at both ends of a resonator and configured to reflect the laser light, a gain medium disposed between the first and second mirrors and configured to amplify and output light incident from an outside, an etalon configured to adjust a pulse width of the laser light, and an acousto-optic modulator disposed between the first and second mirrors and configured to form a mode-locked and Q-switched signal from the laser light, in which some of the laser light is output through either the first or second mirror to outside the resonator.
Abstract:
The present invention relates to an unmanned aerial vehicle system having a multi-rotor type rotary wing. The unmanned aerial vehicle system having a multi-rotor type rotary wing includes a first unmanned aerial vehicle, at least one second unmanned aerial vehicle, and a bridge that connects the first unmanned aerial vehicle and the at least one second unmanned aerial vehicle to be separable from each other, wherein the at least one second unmanned aerial vehicle is moveable by the first unmanned aerial vehicle in a state where the at least one second unmanned aerial vehicle is coupled to the first unmanned aerial vehicle by the bridge without being driven, and the at least one second unmanned aerial vehicle is separable from the first unmanned aerial vehicle which is in flight.