Method and Apparatus for Non-Contact Measurement of Sheet Resistance and Shunt Resistance of P-N Junctions
    1.
    发明申请
    Method and Apparatus for Non-Contact Measurement of Sheet Resistance and Shunt Resistance of P-N Junctions 有权
    用于非接触式测量P-N接头的薄层电阻和分流电阻的方法和装置

    公开(公告)号:US20150241512A1

    公开(公告)日:2015-08-27

    申请号:US14516556

    申请日:2014-10-16

    CPC classification number: G01R31/2656 G01R31/2648 G01R31/2831 G01R31/308

    Abstract: Non-Contact measurement of characteristics of p-n junctions includes illuminating an illumination area of a surface of a p-n junction with light, measuring a first junction photovoltage (JPV) signal from a first area of the p-n junction with a first electrode, measuring a second JPV signal from a second area with a second electrode, measuring a third JPV signal from a third area with a reference electrode, and determining a sheet resistance of the p-n junction top layer with a corrected first JPV signal, a corrected second JPV signal, a corrected first calibration JPV signal, a corrected second calibration JPV signal or the known sheet resistance of the calibration p-n junction.

    Abstract translation: pn结的特性的非接触测量包括用光照射pn结的表面的照明区域,从与第一电极的pn结的第一区域测量第一结光电压(JPV)信号,测量第二JPV 来自具有第二电极的第二区域的信号,从具有参考电极的第三区域测量第三JPV信号,以及使用校正的第一JPV信号,校正的第二JPV信号,校正的第二JPV信号确定pn结顶层的薄层电阻 第一校准JPV信号,校正的第二校准JPV信号或校准pn结的已知薄片电阻。

    Method and Apparatus for Non-Contact Measurement of Internal Quantum Efficiency in Light Emitting Diode Structures
    3.
    发明申请
    Method and Apparatus for Non-Contact Measurement of Internal Quantum Efficiency in Light Emitting Diode Structures 有权
    用于非接触式测量发光二极管结构内部量子效率的方法和装置

    公开(公告)号:US20150077741A1

    公开(公告)日:2015-03-19

    申请号:US14485468

    申请日:2014-09-12

    CPC classification number: G01N21/66 G01N33/00 G01N2033/0095 G01R31/2635

    Abstract: Non-contact measurement of one or more electrical response characteristics of a LED structure includes illuminating an illumination area of a surface of a light emitting diode structure with one or more light pulses, measuring a transient of a luminescence signal from a luminescence area within the illumination area of the light emitting diode structure with a luminescence sensor, determining a first luminescence intensity at a first time of the measured transient of the luminescence signal from the light emitting diode structure, determining a second luminescence intensity at a second time different from the first time of the measured transient of the luminescence signal from the light emitting diode structure and determining an intensity of the electroluminescence component of the luminescence signal from the light emitting diode structure based on the first luminescence signal and the second luminescence signal.

    Abstract translation: LED结构的一个或多个电响应特性的非接触测量包括用一个或多个光脉冲照射发光二极管结构的表面的照明区域,测量来自照明内的发光区域的发光信号的瞬变 具有发光传感器的发光二极管结构的面积,确定在来自发光二极管结构的发光信号的测量瞬态的第一时间的第一发光强度,在与第一次不同的第二时间确定第二发光强度 测量来自发光二极管结构的发光信号的瞬态,并且基于第一发光信号和第二发光信号确定来自发光二极管结构的发光信号的电致发光分量的强度。

    Method and apparatus for non-contact measurement of internal quantum efficiency in light emitting diode structures

    公开(公告)号:US09823198B2

    公开(公告)日:2017-11-21

    申请号:US14485468

    申请日:2014-09-12

    CPC classification number: G01N21/66 G01N33/00 G01N2033/0095 G01R31/2635

    Abstract: Non-contact measurement of one or more electrical response characteristics of a LED structure includes illuminating an illumination area of a surface of a light emitting diode structure with one or more light pulses, measuring a transient of a luminescence signal from a luminescence area within the illumination area of the light emitting diode structure with a luminescence sensor, determining a first luminescence intensity at a first time of the measured transient of the luminescence signal from the light emitting diode structure, determining a second luminescence intensity at a second time different from the first time of the measured transient of the luminescence signal from the light emitting diode structure and determining an intensity of the electroluminescence component of the luminescence signal from the light emitting diode structure based on the first luminescence signal and the second luminescence signal.

    Method and Apparatus for Non-Contact Measurement of Forward Voltage, Saturation Current Density, Ideality Factor and I-V Curves in P-N Junctions
    8.
    发明申请
    Method and Apparatus for Non-Contact Measurement of Forward Voltage, Saturation Current Density, Ideality Factor and I-V Curves in P-N Junctions 有权
    用于非接触式测量P-N接头中正向电压,饱和电流密度,理想因子和I-V曲线的方法和装置

    公开(公告)号:US20150061715A1

    公开(公告)日:2015-03-05

    申请号:US14475025

    申请日:2014-09-02

    Abstract: Non-contact measurement of one or more electrical response characteristics of a p-n junction includes illuminating a surface of the p-n junction with light of a first intensity having a modulation or pulsed characteristic sufficient to establish a steady-state condition in a junction photovoltage (JPV) of the p-n junction, measuring a first JPV from the p-n junction within the illumination area, illuminating the surface of the p-n junction with light of an additional intensity, measuring an additional photovoltage from the portion of the p-n junction within the illumination area, determining a photocurrent density of the p-n junction at the first intensity. The non-contact measurement further includes determining the forward voltage, the saturation current density, the ideality factor or one or more I-V curves with the measured first photovoltage, the measured additional photovoltage and/or the determined photocurrent density of the p-n junction.

    Abstract translation: pn结的一个或多个电响应特性的非接触测量包括用具有足以在结光电压(JPV)中建立稳态条件的调制或脉冲特性的具有第一强度的光照射pn结的表面, 在照明区域内从pn结测量第一JPV,用附加强度的光照射pn结的表面,从照明区域内的pn结的部分测量额外的光电压,确定 第一强度下pn结的光电流密度。 非接触测量还包括利用所测量的第一光电压,测量的附加光电压和/或确定的p-n结的光电流密度来确定正向电压,饱和电流密度,理想因子或一个或多个I-V曲线。

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