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公开(公告)号：US20160161749A1
公开(公告)日：2016-06-09
申请号：US14871943
申请日：2015-09-30
Applicant: KLA-Tencor Corporation
Inventor： Qibiao Chen
CPC classification number: G02B27/0927 , G01N21/4738 , G01N21/8806 , G01N21/9501 , G01N2021/8822 , G01N2201/0631 , G01N2201/0638 , G02B13/143 , G02B27/0961
Abstract: Systems configured to provide illumination for wafer inspection performed by a wafer inspection tool are provided. One system includes one or more pupil lenses configured to focus a first far field pattern having a shape different than a shape of light generated by a light source. The system also includes a field lens array positioned between the one or more pupil lenses and an aperture stop. In addition, the system includes a lens group configured to focus a second far field pattern generated by the field lens array to a back focal plane of the lens group. The back focal plane of the lens group is a field plane of a wafer inspection tool at which a wafer to be inspected is placed during wafer inspection.
Abstract translation: 提供被配置为提供由晶片检查工具执行的用于晶片检查的照明的系统。 一个系统包括配置成聚焦具有不同于由光源产生的光的形状的形状的第一远场图案的一个或多个光瞳透镜。 该系统还包括位于一个或多个光瞳透镜与孔径光阑之间的场透镜阵列。 此外，该系统包括被配置为将由场透镜阵列产生的第二远场图案聚焦到透镜组的后焦平面的透镜组。 透镜组的后焦平面是晶片检查工具的场平面，在晶片检查期间将待检查的晶片放置在晶圆检查工具中。
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公开(公告)号：US20130321797A1
公开(公告)日：2013-12-05
申请号：US13863519
申请日：2013-04-16
Applicant: KLA-TENCOR CORPORATION
Inventor： Daniel L. Cavan , Grace Hsiu-Ling Chen , Qibiao Chen
IPC: G01N21/95
CPC classification number: G01N21/9501 , G01N21/8806 , G01N2021/8835
Abstract: The disclosure is directed to a system and method for inspecting a sample by illuminating the sample at a plurality of different angles and independently processing the resulting image streams. Illumination is directed through a plurality of pupil apertures to a plurality of respective field apertures so that the sample is imaged by portions of illumination directed at different angles. The corresponding portions of light reflected, scattered, or radiated from the surface of the sample are independently processed. Information associated with the independently processed portions of illumination is utilized to determine a location of at least one defect of the sample. Independently processing multiple image streams associated with different illumination angles allows for retention of frequency content that would otherwise be lost by averaging information from multiple imaging angles.
Abstract translation: 本公开涉及一种用于通过以多个不同角度照射样品并独立地处理所得图像流来检查样品的系统和方法。 照明被引导通过多个光瞳孔到多个相应的场孔，使得样本通过以不同角度照射的部分成像。 从样品表面反射，散射或辐射的光的相应部分被独立地处理。 与独立处理的照明部分相关联的信息用于确定样品的至少一个缺陷的位置。 独立地处理与不同照明角度相关联的多个图像流允许保留通过从多个成像角度平均信息而丢失的频率内容。
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公开(公告)号：US09128064B2
公开(公告)日：2015-09-08
申请号：US13863519
申请日：2013-04-16
Applicant: KLA-Tencor Corporation
Inventor： Daniel L. Cavan , Grace Hsiu-Ling Chen , Qibiao Chen
CPC classification number: G01N21/9501 , G01N21/8806 , G01N2021/8835
Abstract: The disclosure is directed to a system and method for inspecting a sample by illuminating the sample at a plurality of different angles and independently processing the resulting image streams. Illumination is directed through a plurality of pupil apertures to a plurality of respective field apertures so that the sample is imaged by portions of illumination directed at different angles. The corresponding portions of light reflected, scattered, or radiated from the surface of the sample are independently processed. Information associated with the independently processed portions of illumination is utilized to determine a location of at least one defect of the sample. Independently processing multiple image streams associated with different illumination angles allows for retention of frequency content that would otherwise be lost by averaging information from multiple imaging angles.
Abstract translation: 本公开涉及一种用于通过以多个不同角度照射样品并独立地处理所得图像流来检查样品的系统和方法。 照明被引导通过多个光瞳孔到多个相应的场孔，使得样本通过以不同角度照射的部分成像。 从样品表面反射，散射或辐射的光的相应部分被独立地处理。 与独立处理的照明部分相关联的信息用于确定样品的至少一个缺陷的位置。 独立地处理与不同照明角度相关联的多个图像流允许保留通过从多个成像角度平均信息而丢失的频率内容。
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公开(公告)号：US09625726B2
公开(公告)日：2017-04-18
申请号：US14871943
申请日：2015-09-30
Applicant: KLA-Tencor Corporation
Inventor： Qibiao Chen
CPC classification number: G02B27/0927 , G01N21/4738 , G01N21/8806 , G01N21/9501 , G01N2021/8822 , G01N2201/0631 , G01N2201/0638 , G02B13/143 , G02B27/0961
Abstract: Systems configured to provide illumination for wafer inspection performed by a wafer inspection tool are provided. One system includes one or more pupil lenses configured to focus a first far field pattern having a shape different than a shape of light generated by a light source. The system also includes a field lens array positioned between the one or more pupil lenses and an aperture stop. In addition, the system includes a lens group configured to focus a second far field pattern generated by the field lens array to a back focal plane of the lens group. The back focal plane of the lens group is a field plane of a wafer inspection tool at which a wafer to be inspected is placed during wafer inspection.
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