公开(公告)号：US09678421B2

公开(公告)日：2017-06-13

申请号：US14795549

申请日：2015-07-09

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Feler Yoel ,  Daniel Kandel

IPC: G03F1/42 ,  G06F17/50 ,  G03F7/20 ,  H01L21/66

CPC classification number: G03F1/42 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70683 ,  G06F17/5072 ,  H01L22/30

Abstract: Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.