公开(公告)号：US20180112968A1

公开(公告)日：2018-04-26

申请号：US15787789

申请日：2017-10-19

Applicant: KLA-Tencor Corporation

Inventor： Boxue Chen ,  Andrei Veldman ,  Alexander Kuznetsov ,  Andrei V. Shchegrov

IPC: G01B11/02 ,  G01B15/00 ,  G01N21/95 ,  G01N21/956 ,  G01N23/225 ,  G01N23/201

Abstract: Methods and systems for evaluating the geometric characteristics of patterned structures are presented. More specifically, geometric structures generated by one or multiple patterning processes are measured by two or more metrology systems in accordance with a hybrid metrology methodology. A measurement result from one metrology system is communicated to at least one other metrology systems to increase the measurement performance of the receiving system. Similarly, a measurement result from the receiving metrology system is communicated back to the sending metrology system to increase the measurement performance of the sending system. In this manner, measurement results obtained from each metrology system are improved based on measurement results received from other cooperating metrology systems. In some examples, metrology capability is expanded to measure parameters of interest that were previously unmeasurable by each metrology system operating independently. In other examples, measurement sensitivity is improved and parameter correlation is reduced.

公开(公告)号：US10712145B2

公开(公告)日：2020-07-14

申请号：US15787789

申请日：2017-10-19

Applicant: KLA-Tencor Corporation

Inventor： Boxue Chen ,  Andrei Veldman ,  Alexander Kuznetsov ,  Andrei V. Shchegrov

IPC: G01B11/02 ,  G01B15/00 ,  G01N21/95 ,  G01N21/956 ,  G01N23/225 ,  G01N23/201 ,  H01L21/66 ,  G01N23/2251

Abstract: Methods and systems for evaluating the geometric characteristics of patterned structures are presented. More specifically, geometric structures generated by one or multiple patterning processes are measured by two or more metrology systems in accordance with a hybrid metrology methodology. A measurement result from one metrology system is communicated to at least one other metrology systems to increase the measurement performance of the receiving system. Similarly, a measurement result from the receiving metrology system is communicated back to the sending metrology system to increase the measurement performance of the sending system. In this manner, measurement results obtained from each metrology system are improved based on measurement results received from other cooperating metrology systems. In some examples, metrology capability is expanded to measure parameters of interest that were previously unmeasurable by each metrology system operating independently. In other examples, measurement sensitivity is improved and parameter correlation is reduced.