公开(公告)号：US12019030B2

公开(公告)日：2024-06-25

申请号：US17578310

申请日：2022-01-18

Applicant: KLA Corporation

Inventor： Antonio Arion Gellineau ,  Andrei V. Shchegrov ,  Hyowon Park ,  Pavan Gurudath ,  Christopher Liman ,  Jung Heon Song

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N2021/8845 ,  G01N2021/8848 ,  G01N2021/8883

Abstract: Methods and systems for monitoring the quality of a semiconductor measurement in a targeted manner are presented herein. Rather than relying on one or more general indices to determine overall measurement quality, one or more targeted measurement quality indicators are determined. Each targeted measurement quality indicator provides insight into whether a specific operational issue is adversely affecting measurement quality. In this manner, the one or more targeted measurement quality indicators not only highlight deficient measurements, but also provide insight into specific operational issues contributing to measurement deficiency. In some embodiments, values of one or more targeted measurement quality indicators are determined based on features extracted from measurement data. In some embodiments, values of one or more targeted measurement quality indicators are determined based on features extracted from one or more indications of a comparison between measurement data and corresponding measurement data simulated by a trained measurement model.

公开(公告)号：US20230228692A1

公开(公告)日：2023-07-20

申请号：US17578310

申请日：2022-01-18

Applicant: KLA Corporation

Inventor： Antonio Arion Gellineau ,  Andrei V. Shchegrov ,  Hyowon Park ,  Pavan Gurudath ,  Christopher Liman ,  Jung Heon Song

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N2021/8845

Abstract: Methods and systems for monitoring the quality of a semiconductor measurement in a targeted manner are presented herein. Rather than relying on one or more general indices to determine overall measurement quality, one or more targeted measurement quality indicators are determined. Each targeted measurement quality indicator provides insight into whether a specific operational issue is adversely affecting measurement quality. In this manner, the one or more targeted measurement quality indicators not only highlight deficient measurements, but also provide insight into specific operational issues contributing to measurement deficiency. In some embodiments, values of one or more targeted measurement quality indicators are determined based on features extracted from measurement data. In some embodiments, values of one or more targeted measurement quality indicators are determined based on features extracted from one or more indications of a comparison between measurement data and corresponding measurement data simulated by a trained measurement model.