公开(公告)号：US11101153B2

公开(公告)日：2021-08-24

申请号：US16496918

申请日：2019-08-23

Applicant: KLA CORPORATION

Inventor： Vladimir Levinski ,  Yuri Paskover ,  Sharon Aharon ,  Amnon Manassen

IPC: H01L21/67 ,  G03F7/20 ,  H01L21/66 ,  G01N21/21 ,  G01N21/47 ,  G01N21/95 ,  H01L23/544

Abstract: A parameter-stable misregistration measurement amelioration system and method including providing a wafer, including a plurality of multilayered semiconductor devices formed thereon, selected from a batch wafers intended to be identical, using a misregistration metrology tool to measure misregistration at multiple sites between at least a first layer and a second layer of the wafer, using a plurality of sets of measurement parameters, thereby generating measured misregistration data for each of the sets of measurement parameters, identifying and removing a parameter-dependent portion and a mean error portion from the measured misregistration data for the wafer for each of the sets of measurement parameters, thereby generating ameliorated parameter-stable ameliorated misregistration data for the wafer.