公开(公告)号：US12100574B2

公开(公告)日：2024-09-24

申请号：US16918242

申请日：2020-07-01

Applicant: KLA CORPORATION

Inventor： Nadav Gutman ,  Oliver Ache ,  Carey Phelps

IPC: H01J37/22 ,  G03F7/00 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  G03F7/70633 ,  G03F7/70683 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/24578

Abstract: An overlay target includes a grating-over-grating structure with a bottom grating structure disposed on a specimen and a top grating structure disposed on the bottom grating structure. The overlay target further includes a calibration scan location including the bottom grating structure but not the top grating structure and an overlay scan location including the top grating structure and the bottom grating structure.

公开(公告)号：US20220005668A1

公开(公告)日：2022-01-06

申请号：US16918242

申请日：2020-07-01

Applicant: KLA CORPORATION

Inventor： Nadav Gutman ,  Oliver Ache ,  Carey Phelps

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: An overlay target includes a grating-over-grating structure with a bottom grating structure disposed on a specimen and a top grating structure disposed on the bottom grating structure. The overlay target further includes a calibration scan location including the bottom grating structure but not the top grating structure and an overlay scan location including the top grating structure and the bottom grating structure.