Apparatus with improved layers of group III-nitride semiconductor
    1.
    发明授权
    Apparatus with improved layers of group III-nitride semiconductor 有权
    具有改进的III族氮化物半导体层的装置

    公开(公告)号:US07038300B2

    公开(公告)日:2006-05-02

    申请号:US10735191

    申请日:2003-12-12

    IPC分类号: H01L29/30 H01L31/0328

    摘要: An apparatus includes a crystalline substrate having a top surface, a crystalline semiconductor layer located on the top surface, and a plurality of dielectric regions. The crystalline semiconductor layer includes group III-nitride and has first and second surfaces. The first surface is in contact with the top surface. The second surface is separated from the top surface by semiconductor of the crystalline semiconductor layer. The dielectric regions are located on the second surface. Each dielectric region is distant from the other dielectric regions and covers an end of an associated lattice defect. Each lattice defect threads the crystalline semiconductor layer.

    摘要翻译: 一种装置包括具有顶表面的晶体衬底,位于顶表面上的晶体半导体层,以及多个电介质区域。 晶体半导体层包括III族氮化物并具有第一和第二表面。 第一表面与顶表面接触。 第二表面通过晶体半导体层的半导体与顶表面分离。 电介质区域位于第二表面上。 每个电介质区域远离其它电介质区域并覆盖相关晶格缺陷的一端。 每个晶格缺陷都会导致晶体半导体层。