-
1.发明授权System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes 有权通过将光束互补孔径形状与光束形状匹配来减少颗粒和污染的系统和方法公开(公告)号：US07977628B2
公开(公告)日：2011-07-12
申请号：US12146122
申请日：2008-06-25
IPC分类号： H01J49/00
CPC分类号： H01J37/04 , H01J37/05 , H01J37/244 , H01J2237/022 , H01J2237/0455 , H01J2237/24507 , H01J2237/24542 , H01J2237/24578
摘要： An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.
摘要翻译： 一种离子注入系统，包括被配置为沿着光束路径产生离子束的离子源，质量分析器位于离子源的下游，其中质量分析器被配置为执行离子束的质量分析和位于下游的束互补孔 的质量分析器并且沿着光束路径，光束互补孔具有对应于离子束的横截面波束包围的尺寸和形状。
-
2.发明申请SYSTEM AND METHOD FOR REDUCING PARTICLES AND CONTAMINATION BY MATCHING BEAM COMPLEMENTARY APERTURE SHAPES TO BEAM SHAPES 有权用于通过匹配光束将粒子和污染减少的系统和方法对波束形状的补充光栅形状公开(公告)号：US20090321632A1
公开(公告)日：2009-12-31
申请号：US12146122
申请日：2008-06-25
CPC分类号： H01J37/04 , H01J37/05 , H01J37/244 , H01J2237/022 , H01J2237/0455 , H01J2237/24507 , H01J2237/24542 , H01J2237/24578
摘要： An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.
摘要翻译： 一种离子注入系统，包括被配置为沿着光束路径产生离子束的离子源，质量分析器位于离子源的下游，其中质量分析器被配置为执行离子束的质量分析和位于下游的束互补孔 的质量分析器并且沿着光束路径，光束互补孔具有对应于离子束的横截面波束包围的尺寸和形状。
-
搜索结果
2 条记录 (耗时 0.017 秒)
