公开(公告)号：US20160310944A1

公开(公告)日：2016-10-27

申请号：US15133202

申请日：2016-04-19

申请人： JSR CORPORATION

发明人： Isao NISHIMURA ,  Kenji HOSHIKO ,  Masahiro KANEKO

IPC分类号： B01L3/00 ,  B32B37/14 ,  B32B38/00 ,  G03F7/031

CPC分类号： B01L3/502707 ,  B01L2200/12 ,  B01L2300/041 ,  B01L2300/0848 ,  B01L2300/0887 ,  B01L2300/12 ,  B32B37/14 ,  B32B38/0008 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2203/032 ,  G03F7/031

摘要： The present disclosure relates to a method of producing a microfluidic device, a microfluidic device, and a photosensitive resin composition, the method including the steps of: forming a resin layer on a support from a photosensitive resin composition that includes a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; partially UV-exposing and developing the resin layer; preparing a laminate by placing a cover material on the thus developed resin layer; and UV-exposing the thus obtained laminate.

摘要翻译： 本发明涉及一种微流体装置的制造方法，微流体装置和感光性树脂组合物，其特征在于，包括以下步骤：在由感光性树脂组合物构成的载体上形成树脂层，所述感光性树脂组合物含有具有至少两个 可自由基聚合的基团，光自由基发生剂，具有至少两个阳离子反应性基团的化合物，光阳离子发生剂和至少一种选自含保护基团的胺，可光降解碱，含酰亚胺结构的化合物，酰胺 含结构的化合物和含脲结构的化合物; 部分UV曝光和显影树脂层; 通过将覆盖材料放置在如此展开的树脂层上来制备层压板; 并将如此得到的层压体UV曝光。