Abstract:
A novel device and method for characterization of molecules is provides that improves characterization accuracy by utilizing larger numbers of reactive molecules that are smaller or shorter in chain length for the analysis procedure. Modification of markers such as nanotubes form nanotube assemblies that are easily detected using a number of surface analysis devices such as AFM and STM. The novel method shown using carbon nanotubes to mark a signature on reactive molecules permits a larger distribution and smaller molecule size of reactive molecules used in characterization of a sample molecule. The modification of the carbon nanotubes allows the characterization procedure to detect the nanotube markers more easily, thus decreasing characterization errors, and allowing faster characterization speeds.
Abstract:
A novel device and method for characterization of molecules is provides that improves characterization accuracy by utilizing larger numbers of reactive molecules that are smaller or shorter in chain length for the analysis procedure. Modification of markers such as nanotubes form nanotube assemblies that are easily detected using a number of surface analysis devices such as AFM and STM. The novel method shown using carbon nanotubes to mark a signature on reactive molecules permits a larger distribution and smaller molecule size of reactive molecules used in characterization of a sample molecule. The modification of the carbon nanotubes allows the characterization procedure to detect the nanotube markers more easily, thus decreasing characterization errors, and allowing faster characterization speeds.
Abstract:
A method and apparatus for forming a polymer array on a substrate suitable for synthesizing polymer sequences. This includes forming an array, each location of the array having at least one strand end, forming photosensitive protection on the strand ends, and selectively scanning and modulating at least one energy beam to expose a pattern on the photosensitive protection. In some embodiments, the method further includes removing a protective group from selected strand ends based on the exposed pattern. The method then includes adding a predetermined one or more polymeric subunits to the deprotected strand ends. In some embodiments the photosensitive protection includes a layer of photoresist to cover the strand ends. Some embodiments use an ultra-violet laser.