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公开(公告)号：US20200278607A1
公开(公告)日：2020-09-03
申请号：US16158103
申请日：2018-10-11
Inventor： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
IPC: G03F7/004 , G03F7/20 , C08F220/18 , C08F220/30 , G03F7/038 , G03F7/32
Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
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公开(公告)号：US20140242526A1
公开(公告)日：2014-08-28
申请号：US13775122
申请日：2013-02-23
Inventor： Robert D. Allen , Ramakrishnan Ayothi , Luisa D. Bozano , William D. Hinsberg , Linda K. Sundberg , Sally A. Swanson , Hoa D. Truong , Gregory M. Wallraff
IPC: G03F7/32
CPC classification number: G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.
Abstract translation: 提供了一种用具有至少一种多元醇如乙二醇和/或甘油的有机显影剂溶剂单独或与另外的有机溶剂如异丙醇和/或其混合物形成的正性化学放大抗蚀剂的方法，和/ 或水。 本文所述的有机溶剂显影的正色调抗蚀剂可用于光刻图案形成工艺; 用于制造诸如集成电路（IC）的半导体器件; 并且对于不适合碱性溶剂的应用，例如用不需要存在酸部分的生物分子或去保护应用阵列图案化的芯片的制造。
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3.发明申请公开(公告)号：US20140220495A1
公开(公告)日：2014-08-07
申请号：US13831570
申请日：2013-03-14
Applicant: International Business Machines Corporation
Inventor： Luisa D. Bozano , Dario L. Goldfarb , Linda K. Sundberg , Hoa D. Truong , Hsinyu Tsai , Gregory M. Wallraff
Abstract: A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites. One-step simultaneous base treatment and solvent development employs a composition comprising a mix of the basic compound and solvent developer.
Abstract translation: 用于负色调发展的方法和组合物包括提供产生酸性位点的光致抗蚀剂膜。 以图形方式照射光致抗蚀剂膜提供具有暴露区域和未曝光区域的照射膜，其中曝光区域包括成像位置。 在升高的温度下烘烤照射的膜产生包含成像部位的焙烤辐射膜，其在照射，烘烤或照射和烘烤之后均包含酸性成像部位。 用液体，气态或气态的弱碱性化合物处理烘烤过的薄膜将酸性成像部位转化为具有化学改性的酸性成像部位的碱处理膜。 施加溶剂显影剂基本上溶解未暴露于辐射能的膜的区域，其中溶剂显影剂包含用于化学改性的酸性成像位点的基本非溶剂。 一步同步碱处理和溶剂开发采用包含碱性化合物和溶剂显影剂混合物的组合物。
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公开(公告)号：US10915023B2
公开(公告)日：2021-02-09
申请号：US15802584
申请日：2017-11-03
Applicant: International Business Machines Corporation
Inventor： Shu-Jen Han , Brian Lin , Hareem T. Maune , Charles T. Rettner , Linda K. Sundberg , Leslie E. Thompson , Hoa D. Truong
Abstract: A crosslinked self-assembled monolayer (SAM), comprising surface groups containing a nitrogen-heterocycle, was formed on an oxygen plasma-treated silicon oxide or hafnium oxide top surface of a substrate. The SAM is covalently bound to the underlying oxide layer. The SAM was patterned by direct write methods using ultraviolet (UV) light of wavelength 193 nm or an electron beam, forming a line-space pattern comprising non-exposed SAM features. The non-exposed SAM features non-covalently bound DNA-wrapped carbon nanotubes (DNA-CNT) deposited from aqueous solution with a selective placement efficiency of about 90%. Good alignment of carbon nanotubes to the long axis of the SAM features was also observed. The resulting patterned biopolymer features were used to prepare a CNT based field effect transistor.
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公开(公告)号：US10345700B2
公开(公告)日：2019-07-09
申请号：US14479378
申请日：2014-09-08
Inventor： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
IPC: G03F7/20 , G03F7/038 , G03F7/32 , C08F220/18 , C08F220/30 , C08F220/24 , G03F7/004
Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
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Patent Agency Ranking
公开(公告)号：US20190137879A1
公开(公告)日：2019-05-09
申请号：US15802584
申请日：2017-11-03
Applicant: International Business Machines Corporation
Inventor： Shu-Jen Han , Brian Lin , Hareem T. Maune , Charles T. Rettner , Linda K. Sundberg , Leslie E. Thompson , Hoa D. Truong , Willi Volksen
Abstract: A crosslinked self-assembled monolayer (SAM), comprising surface groups containing a nitrogen-heterocycle, was formed on an oxygen plasma-treated silicon oxide or hafnium oxide top surface of a substrate. The SAM is covalently bound to the underlying oxide layer. The SAM was patterned by direct write methods using ultraviolet (UV) light of wavelength 193 nm or an electron beam, forming a line-space pattern comprising non-exposed SAM features. The non-exposed SAM features non-covalently bound DNA-wrapped carbon nanotubes (DNA-CNT) deposited from aqueous solution with a selective placement efficiency of about 90%. Good alignment of carbon nanotubes to the long axis of the SAM features was also observed. The resulting patterned biopolymer features were used to prepare a CNT based field effect transistor.
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公开(公告)号：US10174229B2
公开(公告)日：2019-01-08
申请号：US15817843
申请日：2017-11-20
Applicant: International Business Machines Corporation
Inventor： Robert D. Allen , Jeffrey Gelorme , Li-Wen Hung , Ratnam Sooriyakumaran , Linda K. Sundberg
IPC: C09J129/10 , H01L21/50 , C09J125/08 , H01L21/683 , C08F212/08 , C09J133/06
Abstract: An adhesive bonding method that includes bonding a handling wafer to a front side surface of a device wafer with an adhesive comprising N-substituted maleimide copolymers. The device wafer may then be thinned from the backside surface of the device wafer while the device wafer is adhesively engaged to the handling wafer. The adhesive can then be removed by laser debonding, wherein the device wafer is separated from the handling wafer.
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公开(公告)号：US20180330955A1
公开(公告)日：2018-11-15
申请号：US15991003
申请日：2018-05-29
Applicant: International Business Machines Corporation
Inventor： Amy N. Bowers , Luisa D. Bozano , Andrea Fasoli , Krystelle Lionti , Elizabeth M. Lofano , Robert D. Miller , Linda K. Sundberg
IPC: H01L21/30 , H01L21/02 , C03C17/25 , H01L31/046 , B01F1/00
CPC classification number: H01L21/30 , B01F2001/0044 , C03C17/253 , C03C2217/211 , C03C2217/231 , C03C2217/425 , C03C2218/113 , C03C2218/116 , H01L21/02203 , H01L21/02255 , H01L21/02282 , H01L21/02623 , H01L31/046
Abstract: Initial film layers prepared from tin(II) chloride spontaneously generate open cavities when the initial film layers are thermally cured to about 400° C. using a temperature ramp of 1° C./minute to 10° C./minute while exposed to air. The openings of the bowl-shaped cavities have characteristic dimensions whose lengths are in a range of 30 nm to 300 nm in the plane of the top surfaces of the cured film layers. The cured film layers comprise tin oxide and have utility in gas sensors, electrodes, photocells, and solar cells.
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公开(公告)号：US09389516B2
公开(公告)日：2016-07-12
申请号：US14636237
申请日：2015-03-03
Applicant: International Business Machines Corporation
Inventor： Luisa D. Bozano , Dario L. Goldfarb , Linda K. Sundberg , Hoa D. Truong , Hsinyu Tsai , Gregory M. Walraff
Abstract: A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites. One-step simultaneous base treatment and solvent development employs a composition comprising a mix of the basic compound and solvent developer.
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公开(公告)号：US20160070169A1
公开(公告)日：2016-03-10
申请号：US14479378
申请日：2014-09-08
Inventor： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
CPC classification number: G03F7/0045 , C08F220/18 , C08F220/30 , G03F7/0046 , G03F7/0382 , G03F7/20 , G03F7/322 , C08F212/14 , C08F2220/382
Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
Abstract translation: 提供了一种负色调抗蚀剂组合物，其包含游离的光致酸产生剂和与产生光致酸的部分共价结合的多官能聚合物，其中组合物基本上不含交联剂。 还提供了与抗蚀剂组合物结合使用的多官能聚合物，以及使用本发明组合物和聚合物在基材上产生抗蚀剂图像的方法。
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