公开(公告)号：US20140130740A1

公开(公告)日：2014-05-15

申请号：US13726239

申请日：2012-12-24

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Jui-Mei Hsu ,  Chen-Der Tsai ,  Jiuan-Ren Jei ,  Ying-Fang Chang ,  Chia-Chiang Chang

IPC: B05C9/02

CPC classification number: H05H1/42 ,  C23C16/4486 ,  C23C16/45519 ,  C23C16/50

Abstract: A plasma deposition apparatus including a plasma generation unit and a droplet separation unit is provided. The plasma generation unit includes an inlet end and an outlet end. The droplet separation unit is located at the inlet end. Besides, the droplet separation unit includes a first chamber, an import port, and a connection port. The import port and the connection port are connected to the first chamber. The connection port is connected to the inlet end, and the import port serves to receive an atomized precursor. The atomized precursor is separated into a first portion and a second portion after entering the first chamber, and droplets of the first portion are smaller than droplets of the second portion. The first portion of the atomized precursor is suitable for entering the inlet end through the connection port.

Abstract translation: 提供了包括等离子体产生单元和液滴分离单元的等离子体沉积设备。 等离子体产生单元包括入口端和出口端。 液滴分离单元位于入口端。 此外，液滴分离单元包括第一室，进口和连接口。 进口端口和连接端口连接到第一个室。 连接端口连接到入口端，导入口用于接收雾化前体。 雾化的前体在进入第一室之后被分离成第一部分和第二部分，并且第一部分的液滴小于第二部分的液滴。 雾化前体的第一部分适于通过连接口进入入口端。