公开(公告)号：US20110155056A1

公开(公告)日：2011-06-30

申请号：US12969699

申请日：2010-12-16

申请人： Hitoshi KATO ,  Manabu HONMA ,  Yasushi TAKEUCHI

发明人： Hitoshi KATO ,  Manabu HONMA ,  Yasushi TAKEUCHI

IPC分类号： C23C16/458

CPC分类号： H01L21/68764 ,  C23C16/45538 ,  C23C16/45551 ,  H01L21/68771

摘要： A film deposition apparatus has a vacuum chamber in which a turntable placing plural substrates is rotated, the plural substrates come into contact with plural reaction gases supplied to plural process areas and thin films are deposited on surfaces of the plural substrates, and has plural reaction gas supplying portions for supplying the plural processing gases, a separation gas supplying portion for supplying a separation gas and an evacuation mechanism for ejecting the plural processing gases and the separation gas, wherein the plural process areas includes a first process area for causing a first reaction gas to adsorb on the surfaces of the plural substrates, and a second process area, having an area larger than the first process area, for causing the first reaction gas having adsorbed the surfaces of the plural substrates and a second reaction gas to react, and depositing the films on the surfaces of the plural substrates.

摘要翻译： 一种成膜装置具有：真空室，其中放置多个基板的转台旋转，多个基板与多个处理区域供应的多个反应气体接触，薄膜沉积在多个基板的表面上，并且具有多个反应气体 用于供给多种处理气体的供给部分，用于供给分离气体的分离气体供给部分和用于喷射多种处理气体和分离气体的排出机构，其中多个处理区域包括：第一处理区域，用于使第一反应气体 吸附在多个基板的表面上，以及具有比第一处理区域大的面积的第二处理区域，用于使吸附有多个基板的表面的第一反应气体和第二反应气体反应， 在多个基板的表面上的膜。

公开(公告)号：US20120075460A1

公开(公告)日：2012-03-29

申请号：US13236700

申请日：2011-09-20

申请人： Katsuyoshi AIKAWA ,  Manabu HONMA

发明人： Katsuyoshi AIKAWA ,  Manabu HONMA

IPC分类号： H01L21/66 ,  H04N7/18 ,  G08B21/00

CPC分类号： H01L21/68764 ,  C23C16/44 ,  C23C16/45551 ,  C23C16/52 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68721 ,  H01L21/68742 ,  H01L21/68771

摘要： A substrate position detection method includes rotating the susceptor so that the substrate receiving portion is moved into an image taking area of a imaging apparatus; detecting first two position detection marks provided in the process chamber so that the first two position detection marks are within the image taking area, wherein a first perpendicular bisector of the first two position detection marks passes through a rotational center of the susceptor; detecting second two position detection marks provided in the susceptor so that the second two position detection marks can be within the image taking area, wherein a second perpendicular bisector of the second two position detection marks passes through the rotational center of the susceptor and a center of the substrate receiving portion; and determining whether the substrate receiving portion is positioned in a predetermined range in accordance with the detected first two and second two position detection marks.

摘要翻译： 基板位置检测方法包括旋转基座，使得基板接收部分移动到成像设备的图像拍摄区域中; 检测设置在处理室中的前两个位置检测标记，使得前两个位置检测标记在图像拍摄区域内，其中前两个位置检测标记的第一垂直平分线经过基座的旋转中心; 检测设置在所述基座中的第二位置检测标记，使得所述第二两个位置检测标记可以在所述摄像区域内，其中所述第二两个位置检测标记的第二垂直平分线经过所述基座的旋转中心， 所述基板接收部分; 以及根据检测到的第一和第二两个位置检测标记确定基板接收部分是否位于预定范围内。

公开(公告)号：US20130074770A1

公开(公告)日：2013-03-28

申请号：US13622582

申请日：2012-09-19

申请人： Manabu HONMA

发明人： Manabu HONMA

IPC分类号： C23C16/458

CPC分类号： C23C16/401 ,  C23C16/45521 ,  C23C16/45548 ,  C23C16/4585

摘要： A film deposition apparatus includes processing areas spaced part from each other in a circumferential direction and at least one separation gas nozzle arranged between the process areas, and separates the process areas from each other by supplying a separation gas from the separation gas nozzle. Moreover, a first ceiling surface is provided on the downstream side in a rotational direction of the turntable relative to the separation gas nozzle to form a narrow space between an upper surface of the turntable and a lower surface of the first ceiling surface. Furthermore, a second ceiling surface higher than the first ceiling surface is provided on the upstream side in the rotational direction of the turntable.

摘要翻译： 膜沉积设备包括沿圆周方向彼此分开的处理区域和布置在处理区域之间的至少一个分离气体喷嘴，并且通过从分离气体喷嘴供给分离气体来分离处理区域。 此外，在转盘相对于分离气体喷嘴的旋转方向的下游侧设置有第一顶面，以在转台的上表面和第一顶面的下表面之间形成狭窄的空间。 此外，在转台的旋转方向的上游侧设置有高于第一顶面的第二顶板面。