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公开(公告)号：US20100314264A1
公开(公告)日：2010-12-16
申请号：US12815509
申请日：2010-06-15
CPC分类号： G01N33/0037 , Y02A50/245
摘要： A method of correcting NOx sensor includes the steps of preparing a corrective map in advance, finding an existing proportion of NO or NO2 in a mixture of NOx in exhaust gases before coming into an NOx sensor, and correcting an NOx concentration that the NOx sensor detects actually. The corrective map records relationships between temperature physical quantities that are relevant to a temperature of the exhaust gases, oxygen-concentration physical quantities that are relevant to an oxygen concentration in the exhaust gases, and the existing proportion. The existing proportion is found with reference to the corrective map using the temperature physical quantities and oxygen-concentration physical quantities that are detected actually. The NOx concentration is corrected on the basis of not only the existing proportion but also a difference between an NO2 diffusion velocity and an NO diffusion velocity.
摘要翻译： 一种校正NOx传感器的方法包括以下步骤：预先准备校正图，在进入NOx传感器之前发现排气中的NOx的混合物中的NO或NO 2的存在比例，以及NO x传感器检测到的NOx浓度的校正 其实。 校正图记录与废气温度相关的温度物理量与废气中的氧浓度相关的氧浓度物理量与现有比例之间的关系。 使用实际检测的温度物理量和氧浓度物理量参照校正图找到现有比例。 NOx浓度不仅基于现有的比例而且还与NO 2扩散速度和NO扩散速度之间的差异进行校正。
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公开(公告)号：US20220387983A1
公开(公告)日：2022-12-08
申请号：US17752495
申请日：2022-05-24
申请人： Koji SUGIURA , Takeshi HIRABAYASHI , Akemi SATOU , Keisuke MURAWAKI , Takaya OTA , Masatoshi IKEBE , Kohei TAKASAKI , Takeshi MORISHIMA
发明人： Koji SUGIURA , Takeshi HIRABAYASHI , Akemi SATOU , Keisuke MURAWAKI , Takaya OTA , Masatoshi IKEBE , Kohei TAKASAKI , Takeshi MORISHIMA
IPC分类号： B01J35/00 , B01J35/04 , B01J21/04 , B01J21/06 , B01J23/10 , B01J23/42 , B01J23/46 , F01N3/28 , B01D53/94
摘要： There is provided an exhaust gas purification device that shows a high HC removal performance under a condition in which a rich air-fuel mixture is introduced. The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end and a downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region including the upstream end of the substrate. The second catalyst layer is disposed inside the partition wall in a downstream region including the downstream end of the substrate. The first catalyst layer contains a first metal catalyst and alumina-zirconia composite oxide. The second catalyst layer contains a second metal catalyst.
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公开(公告)号：US20220370997A1
公开(公告)日：2022-11-24
申请号：US17734702
申请日：2022-05-02
申请人： Koji SUGIURA , Takeshi HIRABAYASHI , Akemi SATOU , Keisuke MURAWAKI , Takaya OTA , Masatoshi IKEBE , Kohei TAKASAKI , Takeshi MORISHIMA
发明人： Koji SUGIURA , Takeshi HIRABAYASHI , Akemi SATOU , Keisuke MURAWAKI , Takaya OTA , Masatoshi IKEBE , Kohei TAKASAKI , Takeshi MORISHIMA
摘要： The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and an outlet cell adjacent to the inlet cell sealed at the upstream end and opening at the downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region. In a downstream region, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more.
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公开(公告)号：US20220347626A1
公开(公告)日：2022-11-03
申请号：US17717690
申请日：2022-04-11
申请人： Akemi SATO , Takeshi HIRABAYASHI , Koji SUGIURA , Keisuke MURAWAKI , Takaya OTA , Masatoshi IKEBE , Kohei TAKASAKI , Takeshi MORISHIMA
发明人： Akemi SATO , Takeshi HIRABAYASHI , Koji SUGIURA , Keisuke MURAWAKI , Takaya OTA , Masatoshi IKEBE , Kohei TAKASAKI , Takeshi MORISHIMA
IPC分类号： B01D53/94
摘要： An exhaust gas purification device suppresses a pressure loss increase and includes a honeycomb substrate and inflow cell side catalyst layer. The substrate includes a porous partition wall defining several cells extending from an inflow side end surface to an outflow side end surface. The cells include an inflow and outflow cell adjacent across the wall. The inflow cell has an open inflow side end and sealed outflow side end. The outflow cell has a sealed inflow side end and open outflow side end. The catalyst layer is on an inflow cell side surface in an region extending from the inflow side end positioned 10% or more of the partition wall length. At this position, a filled portion of the inflow cell side catalyst layer pores are 40% or less. The pores are present to a depth of 50% of a thickness of the partition wall.
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