公开(公告)号：US20050280799A1

公开(公告)日：2005-12-22

申请号：US11210786

申请日：2005-08-25

申请人： Hideo Tanaka ,  Kazunori Iwamoto ,  Yukio Takabayashi

发明人： Hideo Tanaka ,  Kazunori Iwamoto ,  Yukio Takabayashi

IPC分类号： G12B5/00 ,  G03F7/20 ,  G05D3/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/58

CPC分类号： G03F7/70716 ,  G03F7/709 ,  H01L21/682

摘要： A moving mechanism includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator which is movable along the second guide surface. The first structural member is supported by the second structural member at three positions.

摘要翻译： 移动机构包括具有第一引导表面的第一结构构件，可沿着第一引导表面移动的移动构件，具有第二引导表面的第二结构构件和具有设置在移动构件上的可移动元件的致动器和定子 其可沿着第二引导表面移动。 第一结构构件由第三结构构件在三个位置处支撑。

公开(公告)号：US06990386B2

公开(公告)日：2006-01-24

申请号：US10212748

申请日：2002-08-07

申请人： Hideo Tanaka ,  Kazunori Iwamoto ,  Yukio Takabayashi

发明人： Hideo Tanaka ,  Kazunori Iwamoto ,  Yukio Takabayashi

IPC分类号： G06F19/00

CPC分类号： G03F7/70716 ,  G03F7/709 ,  H01L21/682

摘要： Disclosed is a moving mechanism which includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator being movable along the second guide surface, wherein the first and second structural members are isolated from each other with respect to vibration, such that displacement of the stator due to a reaction force as the moving member is driven does not have an influence to the moving member guide surface.

公开(公告)号：US07346414B2

公开(公告)日：2008-03-18

申请号：US11210786

申请日：2005-08-25

申请人： Hideo Tanaka ,  Kazunori Iwamoto ,  Yukio Takabayashi

发明人： Hideo Tanaka ,  Kazunori Iwamoto ,  Yukio Takabayashi

IPC分类号： G06F19/00

CPC分类号： G03F7/70716 ,  G03F7/709 ,  H01L21/682

摘要： A moving mechanism includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator which is movable along the second guide surface. The first structural member is supported by the second structural member at three positions.

摘要翻译： 移动机构包括具有第一引导表面的第一结构构件，可沿着第一引导表面移动的移动构件，具有第二引导表面的第二结构构件和具有设置在移动构件上的可移动元件的致动器和定子 其可沿着第二引导表面移动。 第一结构构件由第三结构构件在三个位置处支撑。

公开(公告)号：US06965428B2

公开(公告)日：2005-11-15

申请号：US10704638

申请日：2003-11-12

申请人： Yasuyo Muto ,  Kazunori Iwamoto ,  Yukio Takabayashi ,  Takashi Meguro

发明人： Yasuyo Muto ,  Kazunori Iwamoto ,  Yukio Takabayashi ,  Takashi Meguro

IPC分类号： H01L21/683 ,  H01L21/027 ,  H01L21/68 ,  H01L21/687 ,  G03B27/58 ,  G03B27/62

CPC分类号： H01L21/68785 ,  G03F7/707 ,  G03F7/70716 ,  H01L21/68 ,  H01L21/68792 ,  Y10T279/23

摘要： A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.

摘要翻译： 平台装置具有夹持和保持基板的基板保持单元，并且包括具有要安装基板保持单元的凹部的平坦表面。 固定构件将设置在基板保持单元上的突起支撑件固定到平坦表面上。 基板保持单元由固定构件支撑，而突起支撑件的远端与平坦表面的凹部接触，并且基板保持单元的剩余部分不与平坦表面接触。

公开(公告)号：US20060017909A1

公开(公告)日：2006-01-26

申请号：US11210883

申请日：2005-08-25

申请人： Yasuyo Muto ,  Kazunori Iwamoto ,  Yukio Takabayashi ,  Takashi Meguro

发明人： Yasuyo Muto ,  Kazunori Iwamoto ,  Yukio Takabayashi ,  Takashi Meguro

IPC分类号： G03B27/58

CPC分类号： H01L21/68785 ,  G03F7/707 ,  G03F7/70716 ,  H01L21/68 ,  H01L21/68792 ,  Y10T279/23

摘要： A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.

摘要翻译： 平台装置具有夹持和保持基板的基板保持单元，并且包括具有要安装基板保持单元的凹部的平坦表面。 固定构件将设置在基板保持单元上的突起支撑件固定到平坦表面上。 基板保持单元由固定构件支撑，而突起支撑件的远端与平坦表面的凹部接触，并且基板保持单元的剩余部分不与平坦表面接触。

公开(公告)号：US20090044837A1

公开(公告)日：2009-02-19

申请号：US12246651

申请日：2008-10-07

申请人： Hideo Tanaka ,  Yukio Takabayashi

发明人： Hideo Tanaka ,  Yukio Takabayashi

IPC分类号： B08B7/00

CPC分类号： G03F7/707 ,  G03F7/70925

摘要： A method includes a step of processing a substrate with a substrate processing apparatus that includes a chuck configured to hold a substrate, and a support member configured to support the chuck. A cleaning mechanism is configured to move at least one of the chuck and the support member such that the chuck and the support member move relative to each other while staying in substantial contact with each other. An additional step moves a foreign substance between protrusions on the chuck and the support member.

摘要翻译： 一种方法包括用基板处理装置处理基板的步骤，该基板处理装置包括构造成保持基板的卡盘和构造成支撑卡盘的支撑构件。 清洁机构构造成移动卡盘和支撑构件中的至少一个，使得卡盘和支撑构件相对于彼此保持基本接触地移动。 附加步骤将异物移动到卡盘上的突起和支撑构件之间。

公开(公告)号：US20070177282A1

公开(公告)日：2007-08-02

申请号：US11624320

申请日：2007-01-18

申请人： Ryota Makino ,  Yukio Takabayashi

发明人： Ryota Makino ,  Yukio Takabayashi

IPC分类号： G02B7/02

CPC分类号： G02B7/008

摘要： A holding device 100A according to one preferred form of the invention includes a holding member having holding portions 121 with an approximately V-shaped recess by which a subject member 110 having approximately V-shaped protrusions 111 is held, wherein the V-shaped protrusions 111 are disposed at a pitch of about 120 degrees with respect to the center of the subject member 110 and the holding portions 121 are disposed at positions to be opposed to the V-shaped protrusions, wherein the V-shaped protrusions 111 and the supporting portions 121 have supporting flat surfaces 112 and 112, and 114 and 124 which are opposed to and in parallel to each other, and wherein rolling members 131 are disposed between these parallel flat surfaces.

摘要翻译： 根据本发明的一个优选形式的保持装置100A包括具有保持部分121的保持部件，该保持部件具有大致V形的凹部，通过该保持部件具有大致V形突起111的被检体部件110，其中，V形突起 111相对于被检体110的中心以约120度的间距配置，并且保持部121配置在与V形突起相对的位置，其中，V形突起111和支撑部 121具有彼此相对且平行的支撑平面112和112以及114和124，并且其中滚动构件131设置在这些平行的平坦表面之间。

公开(公告)号：US06809802B1

公开(公告)日：2004-10-26

申请号：US09640724

申请日：2000-08-18

申请人： Izumi Tsukamoto ,  Itaru Fujita ,  Hideki Nogawa ,  Yukio Takabayashi

发明人： Izumi Tsukamoto ,  Itaru Fujita ,  Hideki Nogawa ,  Yukio Takabayashi

IPC分类号： G03B2758

CPC分类号： H01L21/6838 ,  G03F7/707 ,  G03F7/70708 ,  G03F9/7076

摘要： A substrate attracting and holding method includes steps of supporting a substrate by use of a protrusion provided on a holding table for holding the substrate and reducing pressure between the holding table and the substrate to attract and hold the substrate. The protrusion is disposed to be placed in a predetermined positional relation, with respect to a direction along the surface of the substrate, with (i) a position of an alignment mark to be used for processing the substrate or (ii) a position to with respect to which an alignment mark is to be produced. The method also includes attracting and holding the substrate.

摘要翻译： 基板吸附保持方法包括以下步骤：通过使用设置在保持台上的用于保持基板并且减小保持台和基板之间的压力以吸引并保持基板的突起来支撑基板。 突起被设置为相对于沿着基板的表面的方向以预定的位置关系放置，（i）用于处理基板的对准标记的位置或（ii）相对于 要产生对准标记。 该方法还包括吸引和保持基底。

公开(公告)号：US20080284997A1

公开(公告)日：2008-11-20

申请号：US12046709

申请日：2008-03-12

申请人： Yukio Takabayashi

发明人： Yukio Takabayashi

IPC分类号： G03B27/42

CPC分类号： G03F7/70725 ,  G03F7/70358

摘要： A scanning exposure apparatus projects a pattern of an original onto a substrate via a projection optical system and shifts the original and the substrate in synchronization with each other with respect to an optical axis of the projection optical system so as to transfer the pattern of the original to the substrate by exposure. The scanning exposure apparatus includes a unit configured to correct a relative position between the original and the substrate by a correction amount according to a shifting rate at which the original and the substrate are shifted in synchronization with each other.

摘要翻译： 扫描曝光装置通过投影光学系统将原稿的图案投影到基板上，并且使原稿和基板相对于投影光学系统的光轴彼此同步地移动，以便将原稿的图案 通过暴露于底物。 扫描曝光装置包括：单元，被配置为根据原稿和基板彼此同步地偏移的移动速率，校正原稿和基板之间的相对位置的校正量。

公开(公告)号：US06307620B1

公开(公告)日：2001-10-23

申请号：US09557972

申请日：2000-04-25

申请人： Yukio Takabayashi ,  Shigeyuki Uzawa

发明人： Yukio Takabayashi ,  Shigeyuki Uzawa

IPC分类号： G03B2758

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70916 ,  G03F7/70925 ,  H01L21/6875

摘要： An exposure holding apparatus includes a substrate holding section for holding a substrate. The substrate holding section includes a thin film, which causes a photocatalytic reaction upon irradiation with light. This substrate holding apparatus prevents adhesion of foreign materials, which causes a decrease in yield of device production, and provides a system for rapidly removing the foreign materials.

摘要翻译： 曝光保持装置包括用于保持基板的基板保持部。 基板保持部包括在照射光时引起光催化反应的薄膜。 该基板保持装置防止异物粘附，导致器件制造成品率下降，并提供快速除去异物的系统。