发明授权
US06965428B2 Stage apparatus, exposure apparatus, and semiconductor device manufacturing method
失效
舞台装置，曝光装置和半导体装置的制造方法
- 专利标题： Stage apparatus, exposure apparatus, and semiconductor device manufacturing method
- 专利标题（中）： 舞台装置，曝光装置和半导体装置的制造方法
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申请号： US10704638申请日： 2003-11-12
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公开(公告)号： US06965428B2公开(公告)日： 2005-11-15
- 发明人: Yasuyo Muto , Kazunori Iwamoto , Yukio Takabayashi , Takashi Meguro
- 申请人： Yasuyo Muto , Kazunori Iwamoto , Yukio Takabayashi , Takashi Meguro
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2002-329701 20021113
- 主分类号： H01L21/683
- IPC分类号： H01L21/683 ; H01L21/027 ; H01L21/68 ; H01L21/687 ; G03B27/58 ; G03B27/62
摘要：
A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.
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