公开(公告)号：US20080096052A1

公开(公告)日：2008-04-24

申请号：US11877634

申请日：2007-10-23

申请人： Hideki MATSUO ,  Shoji SAKAGUCHI ,  Hiroyuki NAKAMURA

发明人： Hideki MATSUO ,  Shoji SAKAGUCHI ,  Hiroyuki NAKAMURA

IPC分类号： G11B5/62 ,  B24B7/00

CPC分类号： G11B5/8404 ,  B24B19/028 ,  B24B21/004 ,  B24B37/08

摘要： A perpendicular magnetic recording media substrate, suitable for magnetic recording media using the perpendicular magnetic recording method, is disclosed. Texturing is used to polish the substrate. A polishing tape is pressed against a substrate, while a polishing slurry comprising abrasive particles is supplied onto the substrate for perpendicular magnetic recording media while it is rotated, to perform texturing of the substrate. The average fiber diameter of polishing fibers contained in the polishing tape is 400 nm or less, and the average particle diameter of abrasive particles contained in the polishing slurry is 150 nm or less.

摘要翻译： 公开了一种适用于使用垂直磁记录方法的磁记录介质的垂直磁记录介质基片。 纹理用于抛光基材。 抛光带被压靠在基板上，同时包含磨料颗粒的抛光浆料在旋转时被供应到用于垂直磁记录介质的基板上，以进行基材的纹理化。 抛光带中所含的研磨纤维的平均纤维直径为400nm以下，研磨浆料中所含的研磨粒子的平均粒径为150nm以下。

公开(公告)号：US20120009441A1

公开(公告)日：2012-01-12

申请号：US13045918

申请日：2011-03-11

申请人： Shoji SAKAGUCHI ,  Masaoki Miyakoshi ,  Jun Natsume

发明人： Shoji SAKAGUCHI ,  Masaoki Miyakoshi ,  Jun Natsume

IPC分类号： G11B5/73 ,  B24B1/00

CPC分类号： B24B37/044 ,  B24B37/013 ,  B24B37/245 ,  C09G1/02 ,  C09K3/1463 ,  G11B5/8404

摘要： A method of manufacturing a perpendicular magnetic recording medium substrate is capable of reducing the waviness of all wavelength components and a recording medium is capable of reducing contact with a magnetic head to improve the flying stability of the magnetic head. The method includes two polishing operations. The first operation includes polishing a substrate having a Ni—P-based alloy underlayer with a first porous material that includes 0.1 wt % to 25 wt % of alumina, titania, silica, and zirconia abrasive while supplying a first slurry liquid including an organic or inorganic acid and a first abrasive to the underlayer of the substrate. The second operation includes polishing a surface of the underlayer polished in the first polishing with a second porous material while supplying a second slurry liquid including an organic or inorganic acid and a second abrasive with a grain diameter smaller than that of the first abrasive.

摘要翻译： 垂直磁记录介质基板的制造方法能够减少所有波长成分的波纹，记录介质能够减小与磁头的接触，提高磁头的飞行稳定性。 该方法包括两次抛光操作。 第一操作包括：在第一浆料液体的同时，提供含有Ni-P基合金底层的基材，该第一多孔材料包括0.1重量％至25重量％的氧化铝，二氧化钛，二氧化硅和氧化锆磨料， 无机酸和基材的底层的第一研磨剂。 第二操作包括用第二多孔材料抛光在第一抛光中抛光的底层的表面，同时提供包括有机或无机酸的第二浆料液体和具有小于第一研磨剂粒径的第二研磨剂。