摘要:
A dual-polarization planar radiating element having an external metal grid, at least one metal patch concentric with the external metal grid and a cavity separating the metal grid and the metal patch, the grid and the patch having a polygonal shape delimited by at least four pairwise opposite sides, and two orthogonal directions of polarization associated with two orthogonal electric fields Ev and Eh, at least one of the directions of polarization being parallel to two sides of the polygon. Each side of the metal patch parallel to a direction of polarization is linked electrically to a zone of the external grid where one of the electric fields Ev or Eh is a minimum. The invention exhibits the advantage of reducing the phenomenon of electrostatic discharges in the planar radiating elements without significantly modifying the response of the radiating element subjected to an orthogonally polarized wave.
摘要:
A reflector array comprises a plurality of individual radiating elements forming a reflecting surface with no abrupt transitions wherein each radiating element of the reflecting surface is selected from a set of predetermined consecutive radiating elements, called the pattern, the first and last elements of the pattern correspond to one and the same phase, modulo 360°, and are identical, and the radiating elements of the pattern have a radiating structure, of metal patch type and/or of radiating aperture type, that progressively changes from one radiating element to another adjacent radiating element, the change in the radiating structure comprising a succession of progressive growths of at least one metal patch and/or at least one aperture and appearances of at least one metal patch in an aperture and/or at least one aperture in a metal patch.
摘要:
A reflector array comprises a plurality of individual radiating elements forming a reflecting surface with no abrupt transitions wherein each radiating element of the reflecting surface is selected from a set of predetermined consecutive radiating elements, called the pattern, the first and last elements of the pattern correspond to one and the same phase, modulo 360°, and are identical, and the radiating elements of the pattern have a radiating structure, of metal patch type and/or of radiating aperture type, that progressively changes from one radiating element to another adjacent radiating element, the change in the radiating structure comprising a succession of progressive growths of at least one metal patch and/or at least one aperture and appearances of at least one metal patch in an aperture and/or at least one aperture in a metal patch.
摘要:
A dual-polarization planar radiating element having an external metal grid, at least one metal patch concentric with the external metal grid and a cavity separating the metal grid and the metal patch, the grid and the patch having a polygonal shape delimited by at least four pairwise opposite sides, and two orthogonal directions of polarization associated with two orthogonal electric fields Ev and Eh, at least one of the directions of polarization being parallel to two sides of the polygon. Each side of the metal patch parallel to a direction of polarization is linked electrically to a zone of the external grid where one of the electric fields Ev or Eh is a minimum. The invention exhibits the advantage of reducing the phenomenon of electrostatic discharges in the planar radiating elements without significantly modifying the response of the radiating element subjected to an orthogonally polarized wave.