公开(公告)号：US20130033705A1

公开(公告)日：2013-02-07

申请号：US13648124

申请日：2012-10-09

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Koichi TANIGUCHI ,  Masayuki OCHI ,  Shuichi CHIKAMATSU ,  Shigehisa NOZAWA

IPC: G01N21/956

CPC classification number: G01N21/9501 ,  G01N2021/8887 ,  G01N2021/8896 ,  G01N2201/1241

Abstract: An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value.

Abstract translation: 一种检查装置，用于检查包括用于向检查对象照射光通量的光源的检查对象的缺陷; 用于引导来自检查对象的反射光的光学系统; 光电图像传感器，其具有布置用于将被引导的光转换成检测信号的多个光电单元; 检测信号传送单元，其具有各自由信号校正单元，转换器和图像形成单元构成的信道，并且分别对应于通过划分光电图像传感器形成的多个区域中的每一个; 以及图像合成单元，用于通过合成输出的部分图像来形成对象的表面的图像; 检查装置通过处理合成图像来检查物体的缺陷; 从而可以将来自所述光电单元的检测信号校正为接近预定的基准目标值。

公开(公告)号：US20130182100A1

公开(公告)日：2013-07-18

申请号：US13656353

申请日：2012-10-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenji AIKO ,  Shuichi CHIKAMATSU ,  Minori NOGUCHI ,  Hisafumi IWATA

IPC: H04N7/18

CPC classification number: H04N7/18 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection system can suppress an effect of light from a rough surface or a circuit pattern and increasing a gain of light from a defect to detect the defect with high sensitivity. When a lens with a large NA value is used, the diameter is 10a, an angle between the sample surface and a traveling direction of the light from a defect being α1. A system receives the light from the defect at a reduced elevation angle α2 with respect to the sample surface to reduce the scattered light, and to increase the light from the defect. The diameter 10a is smaller than the diameter 10b, resulting in a reduction in the ability to focus the scattered light. When a lens having a diameter 10c is used, the lens interferes with the sample. To avoid the interference, a portion of the lens interfering with the sample is removed.

Abstract translation: 缺陷检查系统可以抑制来自粗糙表面或电路图案的光的影响，并且增加来自缺陷的光的增益以高灵敏度检测缺陷。 当使用具有大NA值的透镜时，直径为10a，样品表面与来自缺陷的光的行进方向之间的角度为α1。 系统以相对于样品表面的降低的仰角α2接收来自缺陷的光，以减少散射光，并增加来自缺陷的光。 直径10a小于直径10b，导致聚焦散射光的能力降低。 当使用具有直径10c的透镜时，透镜干扰样品。 为了避免干扰，去除了与样品干扰的一部分透镜。