公开(公告)号：US11473208B2

公开(公告)日：2022-10-18

申请号：US16467240

申请日：2017-12-07

Applicant: HIRTENBERGER ENGINEERED SURFACES GMBH

Inventor： Wolfgang Hansal ,  Selma Hansal ,  Rudolf Mann ,  Gabriela Sandulache

IPC: C25F7/00 ,  C25F3/20 ,  C25F3/26

Abstract: The invention relates to a method for the electrochemical polishing of metal surfaces by means of repeating pulse sequences, wherein at least one anodic pulse is provided, the current intensity of which rises continuously in the time curve up to a specifiable value. The invention further relates to the use of said method for components produced in 3-D and to a system therefor.

公开(公告)号：US20200025588A1

公开(公告)日：2020-01-23

申请号：US16496248

申请日：2018-03-20

Applicant: Hirtenberger Engineered Surfaces GmbH

Inventor： Wolfgang Hansal ,  Selma Hansal ,  Rudolf Mann

IPC: G01D5/20 ,  G01L1/12

Abstract: The invention relates to a magnetic field sensor (100, 100A, 100B) for components (200) having a preferably cylindrical, conical, prismatic main body (210) or having a free-form main body, wherein at least one first magnetic conductive track (110) and at least one second conductive track (120) are mounted on the main body (210 of the component (200), and the at least second conductive track (120) is arranged at a distance—preferably in the form of a separation layer (300)—from the at least first magnetic conductive track (110), wherein at least one exciter magnet is provided and a change in the magnetic flux due to a change in the distance (A) of the at least one first magnetic conductive track (110) from the at least second magnetic conductive track (120) is monitored.

公开(公告)号：US11549194B2

公开(公告)日：2023-01-10

申请号：US16467206

申请日：2017-12-07

Applicant: HIRTENBERGER ENGINEERED SURFACES GMBH

Inventor： Wolfgang Hansal ,  Selma Hansal ,  Gabriela Sandulache

IPC: C25F3/16 ,  C25F3/20 ,  C25F3/26

Abstract: The invention relates to an electrolyte for electropolishing metal surfaces, said electrolyte comprising methanesulphonic acid and additionally at least one phosphonic acid, as well as to an electropolishing method for same.

公开(公告)号：US11060925B2

公开(公告)日：2021-07-13

申请号：US16481004

申请日：2018-01-26

Applicant: HIRTENBERGER ENGINEERED SURFACES GMBH

Inventor： Wolfgang Hansal ,  Selma Hansal ,  Rudolf Mann ,  Martina Halmdienst

IPC: G01L1/00 ,  G01L1/12 ,  G01R33/00

Abstract: The invention relates to a magnetic force sensor (100), having at least one conducting track (111, 211) of soft magnetic material, wherein the at least one conducting track (111, 211) has at least one interruption (130) having a distance (A), wherein the force sensor (100) is arranged on a substrate, in particular on a component (1, 2) to be monitored, and a change in the distance (A) or rather a change in the magnetic flux in the at least one magnetic conducting track (111, 211) is monitored.