-
公开(公告)号：US20160225391A1
公开(公告)日：2016-08-04
申请号：US14608586
申请日：2015-01-29
Applicant: Headway Technologies, Inc.
Inventor： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Kazuki Sato , Hideo Mamiya
CPC classification number: G11B5/3123 , G11B5/17 , G11B5/3906 , G11B2005/0021
Abstract: A magnetic write head has a plated coil with narrow pitch and is suitable for writing at high frequencies on magnetic media with high coercivity. The narrow pitch is obtained without such disadvantages as overplating that has adversely affected prior art attempts to produce such narrow pitches. The process that produces the magnetic write head is characterized by an RIE plasma etch using O2/N2 to etch plating trenches into a baked layer of photoresist with the ratio of gases being 5/45 sccm so that a dilute O2 concentration does not create unwanted side etching of the plating trenches. In addition, a Cu seed layer is coated with an insulating layer of Al2O3 which redeposits on the trench sidewalls to inhibit redeposition of any Cu from the seed layer and prevent outward growth of the plated Cu that would result in overplating.
Abstract translation: 磁写头具有窄间距的电镀线圈，适用于高矫顽磁性介质的高频写入。 获得窄的间距没有诸如对现有技术尝试产生这种窄间距产生不利影响的过度镀敷的缺点。 产生磁写头的过程的特征在于使用O 2 / N 2的RIE等离子体蚀刻将电镀沟槽蚀刻成光致抗蚀剂的烘烤层，其中气体比例为5/45sccm，使得稀的O 2浓度不会产生不期望的侧面 蚀刻电镀槽。 此外，Cu籽晶层涂覆有Al 2 O 3的绝缘层，其重新沉积在沟槽侧壁上以抑制任何Cu从种子层的再沉积，并防止导致过镀的镀覆Cu的向外生长。
-
公开(公告)号：US09741377B1
公开(公告)日：2017-08-22
申请号：US15051321
申请日：2016-02-23
Applicant: HEADWAY TECHNOLOGIES, INC.
Inventor： Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hideo Mamiya , Seiichiro Tomita , Hironori Araki
CPC classification number: G11B5/6088 , G11B5/1272 , G11B5/314 , G11B7/1387 , G11B2005/0005 , G11B2005/001 , G11B2005/0021
Abstract: A thermally-assisted magnetic recording head includes a main pole and a plasmon generator. The plasmon generator includes a first material portion and a second material portion formed of different materials. The first material portion is located away from the medium facing surface. The second material portion includes a near-field light generating surface. The main pole has a front end face including a first end face portion and a second end face portion. The near-field light generating surface, the first end face portion and the second end face portion are arranged in this order along the direction of travel of a recording medium.
-
公开(公告)号：US20170011756A1
公开(公告)日：2017-01-12
申请号：US15222431
申请日：2016-07-28
Applicant: Headway Technologies, Inc.
Inventor： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Kazuki Sato , Hideo Mamiya
CPC classification number: G11B5/3123 , G11B5/17 , G11B5/3906 , G11B2005/0021
Abstract: A magnetic write head has a plated coil with narrow pitch and is suitable for writing at high frequencies on magnetic media with high coercivity. The narrow pitch is obtained without such disadvantages as overplating that has adversely affected prior art attempts to produce such narrow pitches. The process that produces the magnetic write head is characterized by an RIE plasma etch using O2/N2 to etch plating trenches into a baked layer of photoresist with the ratio of gases being 5/45 sccm so that a dilute O2 concentration does not create unwanted side etching of the plating trenches. In addition, a Cu seed layer is coated with an insulating layer of Al2O3 which redeposits on the trench sidewalls to inhibit redeposition of any Cu from the seed layer and prevent outward growth of the plated Cu that would result in overplating.
Abstract translation: 磁写头具有窄间距的电镀线圈，适用于高矫顽磁性介质的高频写入。 获得窄的间距没有诸如对现有技术尝试产生这种窄间距产生不利影响的过度镀敷的缺点。 产生磁写头的过程的特征在于使用O 2 / N 2的RIE等离子体蚀刻将电镀沟槽蚀刻成光致抗蚀剂的烘烤层，其中气体比例为5/45sccm，使得稀的O 2浓度不会产生不期望的侧面 蚀刻电镀槽。 此外，Cu籽晶层涂覆有Al 2 O 3的绝缘层，其重新沉积在沟槽侧壁上以抑制任何Cu从种子层的再沉积，并防止导致过镀的镀覆Cu的向外生长。
-
公开(公告)号：US09412397B1
公开(公告)日：2016-08-09
申请号：US14608586
申请日：2015-01-29
Applicant: Headway Technologies, Inc.
Inventor： Hironori Araki , Yoshitaka Sasaki , Hiroyuki Ito , Seiichiro Tomita , Kazuki Sato , Hideo Mamiya
CPC classification number: G11B5/3123 , G11B5/17 , G11B5/3906 , G11B2005/0021
Abstract: A magnetic write head has a plated coil with narrow pitch and is suitable for writing at high frequencies on magnetic media with high coercivity. The narrow pitch is obtained without such disadvantages as overplating that has adversely affected prior art attempts to produce such narrow pitches. The process that produces the magnetic write head is characterized by an RIE plasma etch using O2/N2 to etch plating trenches into a baked layer of photoresist with the ratio of gases being 5/45 sccm so that a dilute O2 concentration does not create unwanted side etching of the plating trenches. In addition, a Cu seed layer is coated with an insulating layer of Al2O3 which redeposits on the trench sidewalls to inhibit redeposition of any Cu from the seed layer and prevent outward growth of the plated Cu that would result in overplating.
Abstract translation: 磁写头具有窄间距的电镀线圈，适用于高矫顽磁性介质的高频写入。 获得窄的间距没有诸如对现有技术尝试产生这种窄间距产生不利影响的过度镀敷的缺点。 产生磁写头的过程的特征在于使用O 2 / N 2的RIE等离子体蚀刻将电镀沟槽蚀刻成光致抗蚀剂的烘烤层，其中气体比例为5/45sccm，使得稀的O 2浓度不会产生不期望的侧面 蚀刻电镀槽。 此外，Cu籽晶层涂覆有Al 2 O 3的绝缘层，其重新沉积在沟槽侧壁上以抑制任何Cu从种子层的再沉积，并防止导致过镀的镀覆Cu的向外生长。
-
-
-
Search Results
4
records
(took 0.049 seconds)
