公开(公告)号：US20170160451A1

公开(公告)日：2017-06-08

申请号：US15327089

申请日：2015-07-10

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Takafumi SEKO ,  Masaomi TAKASAKA ,  Hiroshi OKAMOTO

IPC: G02B5/28 ,  G02B26/02 ,  G02B1/11

CPC classification number: G02B5/28 ,  G02B1/11 ,  G02B1/115 ,  G02B5/04 ,  G02B5/045 ,  G02B5/285 ,  G02B26/007 ,  G02B26/02

Abstract: An optical element includes an optical block through which object light is transmitted along a light transmission axis direction, a first wavelength selection filter provided on a first filter surface set such that a normal line forms an angle α with the light transmission axis, and a second wavelength selection filter located on a rear side with respect to the first wavelength selection filter, and provided on a second filter surface set such that a normal line forms an angle α with the light transmission axis, the second filter surface being in non-parallel, having an opposite inclination direction, and forming an angle 2α with the first filter surface. The optical block is constituted by combining an incidence-side block, a first filter block, a second filter block, and an emission-side block, formed of the same material and in the same shape.

公开(公告)号：US20250007139A1

公开(公告)日：2025-01-02

申请号：US18711929

申请日：2022-11-01

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Takafumi SEKO ,  Masaomi TAKASAKA ,  Hiroshi OKAMOTO

IPC: H01P1/207 ,  H01P1/20 ,  H01P11/00

Abstract: This method for producing a bandpass filter is a method for producing a bandpass filter made of a dielectric multilayer film including: a cavity layer made of TiO2; and laminated portions arranged to sandwich the cavity layer, the laminated portion being formed by alternately laminating a first dielectric layer made of a high refractive index material and a second dielectric layer made of a low refractive index material, in which in a film formation step of the dielectric multilayer film, a film formation stop period to lower a temperature of a film formation substrate by temporarily stopping film formation during the film formation step is set.

公开(公告)号：US20170047470A1

公开(公告)日：2017-02-16

申请号：US15305371

申请日：2015-04-23

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Koei YAMAMOTO ,  Hiroshi OKAMOTO ,  Masaomi TAKASAKA ,  Yuki OKUWA ,  Shinya IWASHINA

IPC: H01L31/16 ,  H01L31/0232 ,  H01L33/60

CPC classification number: H01L31/165 ,  G01C2009/066 ,  H01L31/02325 ,  H01L33/60

Abstract: An optical sensor includes: a light emitting element 40; a lower substrate 20 on which the light emitting element 40 is provided; an upper substrate 10 provided so that the light emitting element 40 is positioned between the upper substrate 10 and the lower substrate 20; and an optical block 30 provided on the upper substrate 10. The upper substrate 10 includes a division-type photodiode SD. The optical block 30 is configured to reflect light emitted from the light emitting element 40 toward a measurement target R, and light reflected by the measurement target R is incident onto the division-type photodiode SD.

Abstract translation: 光学传感器包括：发光元件40; 设置有发光元件40的下基板20; 设置为使得发光元件40位于上基板10和下基板20之间的上基板10; 以及设置在上基板10上的光学块30.上基板10包括分割型光电二极管SD。 光学块30被配置为将从发光元件40发射的光朝向测量对象R反射，并且由测量对象R反射的光入射到分割型光电二极管SD上。