Eddy current apparatus and method for in-situ profile measurement
    2.
    发明授权
    Eddy current apparatus and method for in-situ profile measurement 有权
    用于原位轮廓测量的涡流装置和方法

    公开(公告)号:US07999540B2

    公开(公告)日:2011-08-16

    申请号:US11505659

    申请日:2006-08-16

    CPC classification number: B24B37/013 B24B49/105 G01B7/10 H01L21/67253

    Abstract: An eddy current monitoring system may include an elongated core. One or more coils may be coupled with the elongated core for producing an oscillating magnetic field that may couple with one or more conductive regions on a wafer. The core may be translated relative to the wafer to provide improved resolution while maintaining sufficient signal strength. An eddy current monitoring system may include a DC-coupled marginal oscillator for producing an oscillating magnetic field at a resonant frequency, where the resonant frequency may change as a result of changes to one or more conductive regions. Eddy current monitoring systems may be used to enable real-time profile control.

    Abstract translation: 涡流监视系统可以包括细长的核心。 一个或多个线圈可以与细长铁芯耦合以产生可与晶片上的一个或多个导电区域耦合的振荡磁场。 芯可以相对于晶片翻转以提供改善的分辨率,同时保持足够的信号强度。 涡流监测系统可以包括用于产生谐振频率的振荡磁场的DC耦合边缘振荡器,其中谐振频率可能由于对一个或多个导电区域的改变而改变。 涡流监视系统可用于实现实时配置文件控制。

    Eddy Current System for In-Situ Profile Measurement
    3.
    发明申请
    Eddy Current System for In-Situ Profile Measurement 审中-公开
    用于原位轮廓测量的涡流系统

    公开(公告)号:US20110294402A1

    公开(公告)日:2011-12-01

    申请号:US13207213

    申请日:2011-08-10

    CPC classification number: B24B37/013 B24B49/105 G01B7/10 H01L21/67253

    Abstract: An eddy current monitoring system may include an elongated core. One or more coils may be coupled with the elongated core for producing an oscillating magnetic field that may couple with one or more conductive regions on a wafer. The core may be translated relative to the wafer to provide improved resolution while maintaining sufficient signal strength. An eddy current monitoring system may include a DC-coupled marginal oscillator for producing an oscillating magnetic field at a resonant frequency, where the resonant frequency may change as a result of changes to one or more conductive regions. Eddy current monitoring systems may be used to enable real-time profile control.

    Abstract translation: 涡流监视系统可以包括细长的核心。 一个或多个线圈可以与细长铁芯耦合以产生可与晶片上的一个或多个导电区域耦合的振荡磁场。 芯可以相对于晶片翻转以提供改善的分辨率,同时保持足够的信号强度。 涡流监测系统可以包括用于产生谐振频率的振荡磁场的DC耦合边缘振荡器,其中谐振频率可能由于对一个或多个导电区域的改变而改变。 涡流监视系统可用于实现实时配置文件控制。

    Eddy current system for in-situ profile measurement
    4.
    发明授权
    Eddy current system for in-situ profile measurement 有权
    用于原位轮廓测量的涡流系统

    公开(公告)号:US07112960B2

    公开(公告)日:2006-09-26

    申请号:US10633276

    申请日:2003-07-31

    CPC classification number: B24B37/013 B24B49/105 G01B7/10 H01L21/67253

    Abstract: An eddy current monitoring system may include an elongated core. One or more coils may be coupled with the elongated core for producing an oscillating magnetic field that may couple with one or more conductive regions on a wafer. The core may be translated relative to the wafer to provide improved resolution while maintaining sufficient signal strength. An eddy current monitoring system may include a DC-coupled marginal oscillator for producing an oscillating magnetic field at a resonant frequency, where the resonant frequency may change as a result of changes to one or more conductive regions. Eddy current monitoring systems may be used to enable real-time profile control.

    Abstract translation: 涡流监视系统可以包括细长的核心。 一个或多个线圈可以与细长铁芯耦合以产生可与晶片上的一个或多个导电区域耦合的振荡磁场。 芯可以相对于晶片翻转以提供改善的分辨率,同时保持足够的信号强度。 涡流监测系统可以包括用于产生谐振频率的振荡磁场的DC耦合边缘振荡器,其中谐振频率可能由于对一个或多个导电区域的改变而改变。 涡流监视系统可用于实现实时配置文件控制。

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