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公开(公告)号：US20230087746A1
公开(公告)日：2023-03-23
申请号：US17957408
申请日：2022-09-30
申请人： FUJIFILM Corporation
IPC分类号： B01D37/04 , B01J47/014 , B01D27/00 , B01D39/16 , B01D53/46 , B01J31/00 , B01J31/06 , B01D19/04
摘要： An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.
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公开(公告)号：US20240246853A1
公开(公告)日：2024-07-25
申请号：US18627780
申请日：2024-04-05
申请人： FUJIFILM Corporation
IPC分类号： C03C17/245 , B65D23/02 , C03C17/00 , C09G1/00 , G03F7/004 , H01L21/027
CPC分类号： C03C17/245 , B65D23/02 , C03C17/004 , C09G1/00 , G03F7/0048 , C03C2218/152 , H01L21/0274
摘要： The chemical liquid storage includes a container and a chemical liquid, wherein the chemical liquid contains at least one of Fe, Al, Cr, and Ni, a content of the specific metal component in the chemical liquid with respect to a total mass of the chemical liquid is equal to or smaller than 100 mass ppt, at least a portion of a liquid contact portion of the container is formed of glass containing sodium atoms, and provided that B represents a content of sodium atoms in a bulk region with respect to a total mass of the bulk region, and A represents a content of sodium atoms in a surface region with respect to a total mass of the surface region, a content mass ratio of A to B represented by A/B is higher than 0.10 and less than 1.0 in at least a portion of the liquid contact portion.
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公开(公告)号：US11976001B2
公开(公告)日：2024-05-07
申请号：US16787197
申请日：2020-02-11
申请人： FUJIFILM Corporation
IPC分类号： B65D23/02 , C03C17/00 , C03C17/245 , C09G1/00 , G03F7/004 , H01L21/027
CPC分类号： C03C17/245 , B65D23/02 , C03C17/004 , C09G1/00 , G03F7/0048 , C03C2218/152 , H01L21/0274
摘要： An object of the present invention is to provide a chemical liquid storage body which hardly causes short and defects in a formed wiring board in a case where a chemical liquid stored in the chemical liquid storage body is used in a wiring forming process including photolithography after the chemical liquid storage body is preserved for a certain period of time. The chemical liquid storage body according to an embodiment of the present invention includes a container and a chemical liquid stored in the container, in which the chemical liquid contains at least one kind of specific metal component selected from the group consisting of Fe, Al, Cr, and Ni, a content of the specific metal component in the chemical liquid with respect to a total mass of the chemical liquid is equal to or smaller than 100 mass ppt, at least a portion of a liquid contact portion of the container is formed of glass containing sodium atoms, and provided that B represents a content of sodium atoms in a bulk region with respect to a total mass of the bulk region, and A represents a content of sodium atoms in a surface region with respect to a total mass of the surface region, a content mass ratio of A to B represented by A/B is higher than 0.10 and less than 1.0 in at least a portion of the liquid contact portion.
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公开(公告)号：US11958005B2
公开(公告)日：2024-04-16
申请号：US17957408
申请日：2022-09-30
申请人： FUJIFILM Corporation
IPC分类号： B01D37/04 , B01D19/04 , B01D27/00 , B01D39/16 , B01D53/46 , B01J31/00 , B01J31/06 , B01J47/014
CPC分类号： B01D37/04 , B01D19/0404 , B01D27/00 , B01D39/1676 , B01D53/46 , B01J31/00 , B01J31/063 , B01J47/014 , B01D2257/60
摘要： An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.
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公开(公告)号：US20230243780A1
公开(公告)日：2023-08-03
申请号：US18173048
申请日：2023-02-22
申请人： FUJIFILM Corporation
发明人： Akihiko OHTSU , Yukihisa Kawada , Naotsugu Muro , Masahiro Yoshidome , Tetsuya Kamimura , Ryo Saito
IPC分类号： G01N29/036 , B08B3/08 , B08B13/00 , G03F7/20 , H01L21/02
CPC分类号： G01N29/036 , B08B3/08 , B08B13/00 , G03F7/70925 , H01L21/02041
摘要： Provided are a method of manufacturing a semiconductor device in which the purity of a chemical liquid containing an organic solvent is more easily managed, a method of washing a semiconductor manufacturing apparatus, and a simpler method of measuring the cleanliness of a washing solution. A method of manufacturing a semiconductor device has Step 1 of bringing an oscillator into contact with a chemical liquid containing an organic solvent as a main component to obtain the amount of change in the resonance frequency of the oscillator resulting from the contact with the chemical liquid, Step 2 of confirming whether or not the amount of change in the resonance frequency of the chemical liquid falls within a permissible range of the amount of change in the resonance frequency based on the preset purity of the chemical liquid, and Step 3 of using the chemical liquid confirmed in Step 2 in manufacturing a semiconductor device.
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公开(公告)号：US11429018B2
公开(公告)日：2022-08-30
申请号：US16129826
申请日：2018-09-13
申请人： FUJIFILM Corporation
IPC分类号： G03F7/32 , G03F1/68 , G03F7/40 , G03F7/11 , G03F7/039 , G03F7/16 , G03F7/00 , G03F1/86 , G03F7/38 , H01J49/10
摘要： In a method of manufacturing a chemical fluid for manufacturing an electronic material, a method of reducing particulate metal in the chemical fluid is selected according to a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by SP ICP-MS in the chemical fluid, and at least one of the concentration of particulate metal including an iron atom, the concentration of particulate metal including a copper atom, or the concentration of particulate metal including a zinc atom is reduced by using the selected reducing method.
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公开(公告)号：US11491428B2
公开(公告)日：2022-11-08
申请号：US16778705
申请日：2020-01-31
申请人： FUJIFILM Corporation
IPC分类号： B01D37/04 , B01J47/014 , B01D27/00 , B01D39/16 , B01D53/46 , B01J31/00 , B01J31/06 , B01D19/04
摘要： An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.
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公开(公告)号：US11351503B2
公开(公告)日：2022-06-07
申请号：US16784976
申请日：2020-02-07
申请人： FUJIFILM Corporation
摘要： An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by filtering a substance to be purified containing an organic solvent by using two or more kinds of filters having different pore sizes, in which a supply pressure P1 of the substance to be purified supplied to a filter Fmax having a maximum pore size X1 among the two or more kinds of filters and a supply pressure P2 of the substance to be purified supplied to a filter Fmin having a minimum pore size X2 among the two or more kinds of filters satisfy P1>P2.
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公开(公告)号：US20210405535A1
公开(公告)日：2021-12-30
申请号：US17465834
申请日：2021-09-02
申请人： FUJIFILM Corporation
IPC分类号： G03F7/40 , G03F7/32 , H01L21/027
摘要： An object of the present invention is to provide a resist pattern forming method that has excellent pattern forming properties and generates few residues and a semiconductor chip manufacturing method. The resist pattern forming method according to an embodiment of the present invention has a step A of forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing a photoacid generator and a resin whose polarity is increased by the action of an acid, a step B of exposing the film, step C of developing the exposed film by using an alkali developer, a step D of washing the developed film by using water, and a step E of washing the film washed in the step D by using a chemical liquid containing an alcohol-based solvent, in which the alkali developer contains a quaternary ammonium salt.
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公开(公告)号：US20200164294A1
公开(公告)日：2020-05-28
申请号：US16778705
申请日：2020-01-31
申请人： FUJIFILM Corporation
IPC分类号： B01D37/04 , B01J47/014 , B01D27/00 , B01D39/16
摘要： An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.
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