公开(公告)号：US20230133710A1

公开(公告)日：2023-05-04

申请号：US18063496

申请日：2022-12-08

申请人： FUJIFILM Corporation

发明人： Aina USHIYAMA ,  Akira TAKADA ,  Masafumi KOJIMA ,  Akiyoshi GOYO ,  Michihiro SHIRAKAWA ,  Keita KATO

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20

摘要： An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be formed even after the composition is stored for a long period of time. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin of which polarity increases through decomposition by an action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, and the compound that generates an acid upon irradiation with actinic rays or radiation is selected from compounds (I) and (II).

公开(公告)号：US20230043143A1

公开(公告)日：2023-02-09

申请号：US17896712

申请日：2022-08-26

申请人： FUJIFILM Corporation

发明人： Aina USHIYAMA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA

IPC分类号： G03F7/029 ,  G03F7/30

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.

公开(公告)号：US20220082938A1

公开(公告)日：2022-03-17

申请号：US17536085

申请日：2021-11-28

申请人： FUJIFILM Corporation

发明人： Aina USHIYAMA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Hironori OKA

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C309/12 ,  C07C309/42 ,  C07D283/00 ,  C07C309/06 ,  C07C309/29 ,  C07C309/19

摘要： An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.

公开(公告)号：US20220179307A1

公开(公告)日：2022-06-09

申请号：US17678271

申请日：2022-02-23

申请人： FUJIFILM Corporation

发明人： Akira TAKADA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Aina USHIYAMA ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Hironori OKA ,  Mitsuhiro FUJITA ,  Yasuharu SHIRAISHI

IPC分类号： G03F7/004 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/039

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a resin X including a repeating unit derived from a compound including two or more structural moieties consisting of an anionic moiety and a cationic moiety, and a polymerizable group, in which the compound generates an acid including an acidic moiety derived from the anionic moiety in the two or more structural moieties by irradiation with actinic rays or radiation.

公开(公告)号：US20220002257A1

公开(公告)日：2022-01-06

申请号：US17480822

申请日：2021-09-21

申请人： FUJIFILM Corporation

发明人： Aina USHIYAMA

IPC分类号： C07D265/06 ,  C07C231/12

摘要： In a production method for a hemiaminal compound, a compound represented by Formula (1), a compound represented by Formula (2), and an oxidizing agent are mixed. A hemiaminal compound represented by Formula (3) is obtained. In a production method for a heterocyclic compound, a hemiaminal compound is mixed with a base.