公开(公告)号：US20240222068A1

公开(公告)日：2024-07-04

申请号：US18092103

申请日：2022-12-30

Applicant: FEI Company

Inventor： Jing Wang ,  Chad Rue ,  Aurelien Philippe Jean Maclou Botman

IPC: H01J37/26 ,  C23C16/06 ,  C23C16/44 ,  C23C16/455

CPC classification number: H01J37/261 ,  C23C16/06 ,  C23C16/4408 ,  C23C16/45559 ,  H01J2237/022 ,  H01J2237/186 ,  H01J2237/2001

Abstract: Methods include arranging a substrate in a vacuum chamber of a charged particle beam microscope, wherein the substrate is held at a cryogenic temperature, and depositing on the substrate at the cryogenic temperature a condensate precursor that is stored in a crucible, wherein the deposited condensate precursor forms a deposition layer on the substrate. An apparatus include a vacuum chamber configured to support a substrate, a condensate precursor system coupled to the vacuum chamber, wherein a vacuum pump is configured to draw a vacuum on a storage reservoir to reduce a vapor pressure build-up of a one or more volatile contaminants in the storage reservoir and thereby reduce a deposition of the one or more contaminants on the substrate during the condensing of the condensate precursor on the substrate. A condensate precursor can comprise a transition metal center comprising hafnium or osmium. Related deposition and cap layers are disclosed.

公开(公告)号：US20210118646A1

公开(公告)日：2021-04-22

申请号：US17074404

申请日：2020-10-19

Applicant: FEI Company

Inventor： Chad Rue ,  Jing Wang ,  Aurelien Philippe Jean Maclou Botman ,  Joe Christian ,  Kenny Mani ,  Gabriella Kiss

IPC: H01J37/31 ,  H01J37/20

Abstract: Methods and apparatuses disclosed herein for large-area 3D analysis of samples using glancing incidence FIB milling. An example method at least includes milling, with a focused ion beam, a sample at a shallow angle and at a plurality of rotational orientations to remove a layer of the sample and to expose a surface, and after milling, imaging, with a charged particle beam, the exposed surface of the sample.