公开(公告)号：US20240096671A1

公开(公告)日：2024-03-21

申请号：US18370337

申请日：2023-09-19

Applicant: ENTEGRIS, INC.

Inventor： Matthew A. Fuller ,  Gary Gallagher ,  Thomas Martin Adrian

IPC: H01L21/673

CPC classification number: H01L21/67393 ,  H01L21/67383 ,  H01L21/67386

Abstract: Described are substrate containers that are useful for holding or transporting substrates such as semiconductor wafers and microelectronic devices, in a clean environment, as well as methods of using the substrate containers.

公开(公告)号：US20200152496A1

公开(公告)日：2020-05-14

申请号：US16076082

申请日：2017-02-09

Applicant: ENTEGRIS, Inc.

Inventor： Gary Gallagher ,  Matthew A. Fuller ,  Mark V. Smith ,  Barry Gregerson ,  Michael L. Johnson

IPC: H01L21/673

Abstract: A substrate container (1100) includes a shell (1105) defining an opening and a door (1505) for selectively sealing the opening. A cantilevered support tray (1120) supports a substrate (1115) within the shell (1105). The support tray (1120) includes a support collar (1300) for coupling the support tray (1120) to a support post (1215) such that the support tray (1120) is cantilevered from the support post (1215).

公开(公告)号：US20250149363A1

公开(公告)日：2025-05-08

申请号：US18935313

申请日：2024-11-01

Applicant: ENTEGRIS, INC.

Inventor： Matthew A. Fuller ,  Colton J. Harr ,  Paul J. Magoon ,  Rocky Dean Gipson ,  Gary Gallagher

IPC: H01L21/673 ,  H01L21/67

Abstract: Described are methods and apparatus that are useful to for purifying a substrate container that is used to hold, store, or transport semiconductor substrates.

公开(公告)号：US20220388751A1

公开(公告)日：2022-12-08

申请号：US17835716

申请日：2022-06-08

Applicant: ENTEGRIS, INC.

Inventor： Matthew A. Fuller ,  Colton J. Harr ,  Gary Gallagher ,  Peter D. Doenges ,  Thomas H. Wilkie

IPC: B65D81/26 ,  B65D85/30 ,  B65D81/05

Abstract: In a wafer container, diffusers are positioned such that they are closer to a center line of the wafer container. This improves the distribution of purge gas within the wafer container. The diffusers can be positioned such that their position corresponds to a recessed central panel of the back wall. The diffusers can be positioned such that an angle between the diffusers relative to a center of a wafer contained within the wafer container is 60 degrees or less. The diffusers can be joined to purge ports by offset connectors oriented such that the diffusers are closer to the center line of the wafer container than the purge ports. The distance from each of the diffusers to the center line of the wafer container can be less than one fourth of a diameter of the wafer that the wafer container is configured to accommodate.

公开(公告)号：US10566225B2

公开(公告)日：2020-02-18

申请号：US15743519

申请日：2016-07-13

Applicant: ENTEGRIS, INC.

Inventor： Gary Gallagher ,  Stephen Sumner

IPC: H01L21/673

Abstract: Substrate containers and/or portions thereof for use in the semiconductor manufacturing industry can be formed by injection molding metal slurries. More particularly, such substrate containers and/or portions thereof can be formed by injection molding metal slurries containing magnesium or magnesium alloys. Substrate containers, wherein at least a portion of the substrate container is injection molded from a metal slurry containing magnesium or magnesium alloy can exhibit improved permeation control of moisture and oxygen over, and as compared to, comparable substrate carriers formed of polymer based materials. Exemplary substrate containers can include wafer containers, reticle pods, disk shippers and/or work-in-process boxes.