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公开(公告)号：US20210017056A1
公开(公告)日：2021-01-21
申请号：US16922415
申请日：2020-07-07
申请人： EBARA CORPORATION
发明人： Yoichi NAKAGAWA , Suguru OZAWA , Yuji ARAKI , Toshifumi WATANABE
摘要： A gas dissolved liquid manufacturing device includes: a pump configured to pressurize a liquid; a pipe communicating with the pump; a nozzle disposed in the pipe, the nozzle being configured to generate micro bubbles using a supplied gas; and a gas-liquid separation tank whose upper part communicates with the pipe, the gas-liquid separation tank being configured to separate a gas-liquid mixture generated by the nozzle into a gas and a liquid.
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公开(公告)号：US20190015801A1
公开(公告)日：2019-01-17
申请号：US16069862
申请日：2017-01-13
申请人： EBARA CORPORATION
发明人： Suguru OZAWA , Yoichi NAKAGAWA , Muneto TAKAHASHI , Tao XU , Toshio YOKOYAMA
摘要： Provided is a supply-liquid producing apparatus capable of producing a supply liquid by an amount needed at a use point.A supply-liquid producing apparatus includes a mixer that mixes water and ozone gas to produce ozone water; a booster pump that increases the pressure of the water supplied to the mixer; a gas-liquid separation tank that separates the ozone water produced by the mixer into ozone water to be supplied to a use point and exhaust gas to be discharged from an exhaust port; a flowmeter that measures the flow rate of the ozone water supplied from the gas-liquid separation tank to the use point; a flow control unit that adjusts the flow rate of the water supplied to the mixer by controlling the booster pump in response to the flow rate of the ozone water measured by the flowmeter; and an exhaust pressure control unit that controls the exhaust pressure to keep constant the water level in the gas-liquid separation tank.
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公开(公告)号：US20180333686A1
公开(公告)日：2018-11-22
申请号：US15982092
申请日：2018-05-17
申请人： EBARA CORPORATION
发明人： Yoichi NAKAGAWA
CPC分类号： B01F3/04099 , B01D19/0005 , B01D19/0036 , B01D19/0063 , B01D19/0073 , B01D2259/45 , B01F3/2223 , B01F2003/04886 , C02F1/78
摘要： A gas solution production apparatus 1 includes a gas dissolving unit 4 that dissolves gas of a second raw material into a liquid of a first raw material to generate a mixture liquid, and a gas-liquid separation unit 7 that subjects the liquid mixture generated by the gas dissolving unit 4 to gas-liquid separation into a gas solution that is supplied to a use point 5 and an exhaust gas that is discharged from an exhaust port 6. The gas-liquid separation unit 7 includes a capacity variable section 8, 20 that changes a capacity of an internal space of the gas-liquid separation unit 7.
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公开(公告)号：US20210245115A1
公开(公告)日：2021-08-12
申请号：US17164026
申请日：2021-02-01
申请人： EBARA CORPORATION
发明人： Suguru OZAWA , Yuji ARAKI , Yoichi NAKAGAWA , Toshifumi WATANABE
摘要： A gas solution manufacturing device 1 includes a gas supply line 2 configured to supply a gas as a raw material of a gas solution, a liquid supply line 3 configured to supply a liquid as a raw material of the gas solution, a gas solution production unit 4 configured to mix the gas and the liquid together to produce the gas solution, a gas-liquid separation unit 5 configured to perform gas-liquid separation of the produced gas solution into a supplied liquid to be supplied to a use point and a discharged gas to be discharged through an exhaust port, and a gas dissolving unit 6 provided in the liquid supply line 4 and configured to dissolve the discharged gas resulting from the gas-liquid separation in the liquid. The gas dissolving unit 6 is configured with a hollow fiber membrane configured with a gas permeable membrane.
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公开(公告)号：US20190193034A1
公开(公告)日：2019-06-27
申请号：US16225666
申请日：2018-12-19
申请人： EBARA CORPORATION
发明人： Yoichi NAKAGAWA , Suguru OZAWA , Toshifumi WATANABE , Tao XU
IPC分类号： B01F3/04
CPC分类号： B01F3/04737 , B01F3/04439 , B01F2003/04886 , C02F1/78 , C02F2201/782 , C02F2209/40 , G02F2001/1316 , H01L21/67051
摘要： A gas-dissolved liquid producing apparatus 1 includes a gas supply unit 2, a first liquid supply unit 3, a gas-dissolved liquid generator 4, a second liquid generator 20, a second liquid supply unit 21, a flow rate measuring unit 14, and a controller 23. The controller 23 controls the supply amount of the first liquid to be supplied to the gas-dissolved liquid generator 4 according to the flow rate of circulated gas-dissolved liquid measured by the flow rate measuring unit 14. The gas-dissolved liquid generator 4 dissolves gas supplied from the gas supply unit 2 in first liquid supplied from the first liquid supply unit 3 and second liquid supplied from the second liquid supply unit 21 to generate gas-dissolved liquid.
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公开(公告)号：US20160145760A1
公开(公告)日：2016-05-26
申请号：US14919002
申请日：2015-10-21
申请人： EBARA CORPORATION
CPC分类号： C25D17/008 , C25D5/022 , C25D17/001 , C25D17/06 , C25D17/10
摘要： A plating apparatus according to the present disclosure includes an anode holder configured to hold an anode; a substrate holder placed opposite the anode holder and configured to hold a substrate; and an anode mask installed on a front face of the anode holder and provided with a first opening adapted to allow passage of an electric current flowing between an anode and the substrate. The diameter of the first opening in the anode mask is configured to be adjustable. When a first substrate is plated, a diameter of the first opening is adjusted to a first diameter. When a second substrate is plated, the diameter of the first opening is adjusted to a second diameter smaller than the first diameter.
摘要翻译： 根据本公开的电镀设备包括：阳极保持器，其构造成保持阳极; 衬底保持器，与所述阳极保持器相对放置并且构造成保持衬底; 以及阳极掩模，其安装在所述阳极保持器的前表面上并且设置有适于允许在阳极和所述基板之间流动的电流通过的第一开口。 阳极掩模中的第一开口的直径被配置为可调节的。 当第一衬底被镀覆时，将第一开口的直径调节到第一直径。 当第二基板被镀覆时，将第一开口的直径调节到小于第一直径的第二直径。
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公开(公告)号：US20220105478A1
公开(公告)日：2022-04-07
申请号：US17488814
申请日：2021-09-29
申请人： EBARA CORPORATION
发明人： Suguru OZAWA , Yuji ARAKI , Toshifumi WATANABE , Yoichi NAKAGAWA , Risa KIMURA , Tao XU
摘要： A gas solution supply device 1 includes: a first gas-liquid separator 8 in which gas solution is stored; a second gas-liquid separator 16 provided at a stage subsequent to the first gas-liquid separator 8 and in which gas solution to be supplied to a use point is stored; an intermediate line 17 provided between the first gas-liquid separator 8 and the second gas-liquid separator 16; a pressure booster pump 18 provided on the intermediate line 17 and increases a pressure of gas solution being supplied from the first gas-liquid separator 8 to the second gas-liquid separator 16; a gas supply line 2 that supplies gas as a material of the gas solution; and a gas dissolving unit 20 provided on the intermediate line 17 and dissolves the gas supplied from the gas supply line 2 in the gas solution supplied from the first gas-liquid separator 8.
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公开(公告)号：US20210101185A1
公开(公告)日：2021-04-08
申请号：US17036531
申请日：2020-09-29
申请人： EBARA CORPORATION
发明人： Yoichi NAKAGAWA
摘要： A nozzle for generating fine bubbles, the nozzle including: a hollow housing; and a plurality of plates provided in the housing and partitioning the housing into a plurality of spaces, wherein an upper face or a side face of the housing is provided with an inflow port into which a gas-dissolved liquid flows and which communicates with an uppermost space of the spaces partitioned by the plate, each of the plates is provided with a plurality of through-holes, and a lower face of the housing is provided with a slit communicating with a lowermost space of the spaces partitioned by the plate.
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公开(公告)号：US20190262784A1
公开(公告)日：2019-08-29
申请号：US16255172
申请日：2019-01-23
申请人： EBARA CORPORATION
发明人： Yoichi NAKAGAWA
摘要： A gas-dissolved liquid producing apparatus capable of increasing a gas dissolution efficiency and enhancing stability of the concentration of gas-dissolved liquid is provided.The gas-dissolved producing apparatus 1 includes an ozone gas supply unit 2 for supplying ozone gas, a pure water supply unit 3 for supplying pure water, and an ozonated water generator 4 for dissolving ozone gas in supplied pure water to generate ozonated water. The generator 4 includes a first nozzle 10 having a first optimum flow rate, a second nozzle 11 having a second optimum flow rate different from the first optimum flow rate, a flow rate detector 15 for detecting the flow rate of the supplied pure water, and a controller 16 for controlling which one of the first nozzle and the second nozzle should be supplied with the supplied gas, based on the flow rate of the pure water detected by the detector 15.
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公开(公告)号：US20180353911A1
公开(公告)日：2018-12-13
申请号：US16003215
申请日：2018-06-08
申请人： Ebara Corporation
发明人： Yoichi NAKAGAWA
CPC分类号： B01F3/04758 , B01F3/2223 , B01F5/0471 , B01F5/0498 , B01F2003/04886 , B01F2215/008 , B01F2215/0096
摘要： A gas solution production apparatus 1 includes a gas dissolving unit 5 that dissolves the gas of the second raw material into the liquid of the first raw material to generate a gas solution with a predetermined concentration, and a gas-liquid separation unit 8 that subjects the gas solution to gas-liquid separation into a supply liquid and an exhaust gas. The unit 5 includes a first nozzle 9 that atomizes the liquid of the first raw material, a mist mixing section 11 that mixes the liquid of the first raw material atomized by the nozzle 9 and the gas of the second raw material to generate a gas solution with a higher concentration than a predetermined concentration, and a liquid mixing section 12 that mixes the gas solution with the high concentration and the liquid of the first raw material to generate the gas solution with the predetermined concentration.
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