公开(公告)号：US06478937B2

公开(公告)日：2002-11-12

申请号：US09765855

申请日：2001-01-19

申请人： Donald J. K. Olgado ,  Jayant Lakshmikanthan

发明人： Donald J. K. Olgado ,  Jayant Lakshmikanthan

IPC分类号： B23H726

CPC分类号： C25D5/04 ,  C25D7/123 ,  C25D17/001 ,  C25D17/004 ,  C25D17/06

摘要： An apparatus and associated method that removes electrolyte solution from a substrate, the apparatus comprises a thrust plate and a substrate extension unit. The thrust plate at least partially defines a spin recess. The substrate extension unit can be displaced between a retracted position and an extended position relative to the spin recess. The substrate extension unit is disposed within the spin recess when positioned in the retracted position. The substrate extension unit at least partially extends from within the spin recess when positioned in the extended position. The substrate is processed by immersing at least a portion of the substrate in a wet solution. The substrate is removed from the wet solution. The substrate extension unit extends into its extended position, and the substrate is spun. Extending the substrate extension unit limits the formation of fluid traps within the substrate holder assembly or between the substrate and the substrate holder assembly.

公开(公告)号：US06475357B2

公开(公告)日：2002-11-05

申请号：US09820426

申请日：2001-03-28

申请人： Jayant Lakshmikanthan ,  Joe Stevens

发明人： Jayant Lakshmikanthan ,  Joe Stevens

IPC分类号： C25D1700

CPC分类号： C25D17/06 ,  C25D7/123 ,  C25D17/001

摘要： The present invention provides a bladder assembly for use in an electroplating cell. The bladder assembly comprises a mounting plate, a bladder, and an annular manifold. One or more inlets are formed in the mounting plate and are coupled to a fluid source. The manifold is adapted to be received in a recess formed in the lower face of the mounting plate and secures the bladder thereto. Outlets formed in the manifold communicate with the inlets to route a fluid from the fluid source into the bladder to inflate the same. A substrate disposed on a contact ring opposite the bladder is thereby selectively biased toward a seating surface of the contact ring. A pumping system 159 coupled at the backside of the substrate 121 provides a pressure or vacuum condition.

摘要翻译： 本发明提供一种用于电镀电池的气囊组件。 气囊组件包括安装板，气囊和环形歧管。 一个或多个入口形成在安装板中并且联接到流体源。 歧管适于容纳在形成在安装板的下表面中的凹部中并将气囊固定到其上。 形成在歧管中的出口与入口连通，以将流体从流体源引导到气囊中以使其膨胀。 因此，设置在与气囊相对的接触环上的基板被选择性地偏压到接触环的就座表面。 耦合在基板121背面的泵送系统159提供压力或真空条件。

公开(公告)号：US06228233B1

公开(公告)日：2001-05-08

申请号：US09201796

申请日：1998-11-30

申请人： Jayant Lakshmikanthan ,  Joe Stevens

发明人： Jayant Lakshmikanthan ,  Joe Stevens

IPC分类号： C25D1700

CPC分类号： C25D17/06 ,  C25D7/123 ,  C25D17/001

摘要： The present invention provides a bladder assembly 130 for use in an electroplating cell 100. The bladder assembly 130 comprises a mounting plate 132, a bladder 136, and an annular manifold 146. One or more inlets 142 are formed in the mounting plate 146 and are coupled to a fluid source 138. The manifold 146 is adapted to be received in a recess 140 formed in the lower face of the mounting plate 132 and secures the bladder 136 thereto. Outlets 154 formed in the manifold 146 communicate with the inlets 142 to route a fluid from the fluid source 138 into the bladder 136 to inflate the same. A substrate 121 disposed on a contact ring 114 opposite the bladder 136 is thereby selectively biased toward a seating surface of the contact ring 114. A pumping system 159 coupled at the backside of the substrate 121 provides a pressure or vacuum condition.

摘要翻译： 本发明提供一种用于电镀单元100中的气囊组件130.气囊组件130包括安装板132，气囊136和环形歧管146.一个或多个入口142形成在安装板146中，并且是 联接到流体源138.歧管146适于容纳在形成在安装板132的下表面中的凹部140中并将囊136固定到其上。 形成在歧管146中的出口154与入口142连通，以将流体从流体源138引导到气囊136中以使其膨胀。 因此，设置在与囊状物136相对的接触环114上的基底121被选择性地朝向接触环114的就座表面偏置。耦合在基底121的背面的泵送系统159提供压力或真空条件。