公开(公告)号：US20030164243A1

公开(公告)日：2003-09-04

申请号：US10370098

申请日：2003-02-21

申请人： Dai Nippon Printing Co., Ltd.

发明人： Fumihiro Arakawa ,  Yasuhiko Ishii ,  Daisuke Hashimoto ,  Eiji Ohishi ,  Yukihiro Kyoden

IPC分类号： B32B003/24 ,  B32B015/08

CPC分类号： H05K9/0096 ,  B32B15/08 ,  H01J2211/446 ,  Y10T428/12431 ,  Y10T428/12438 ,  Y10T428/12472 ,  Y10T428/24802 ,  Y10T428/24917 ,  Y10T428/249953 ,  Y10T428/249958 ,  Y10T428/249977 ,  Y10T428/249984 ,  Y10T428/31678

摘要： A netlike metallic foil 11null and a transparent substrate film 14 are laminated with an adhesive layer 13. The adhesive-layer 13-side surface of the metallic foil 11null may be formed with a darkening layer 12. The roughness of the adhesive-layer 13-side surface (lower surface) of the metallic foil 11null is preferably such that the maximum height Rmax be more than 0 and less than 4 nullm, more preferably more than 0 and 2 nullm or less. As long as the maximum height Rmax of this surface of the metallic foil 11null falls in the above-described range, the adhesive layer never contains air bubbles in such sizes that reflectance is adversely affected. Further, the roughness of the surface (upper surface) of the metallic foil 11null, opposite to the adhesive-layer 13-side surface, is preferably such that the arithmetic mean roughness Ra is in the range between 0.02 nullm and 1 nullm. As long as the arithmetic mean roughness Ra of this surface of the metallic foil 11null is in the above range, it is possible to efficiently conduct vacuuming to bring, into close contact, a photosensitive resin layer and a photomask in sheet form placed on the photosensitive resin layer, before effecting the pattern-wise exposure of the photosensitive resin layer.

摘要翻译： 网状金属箔11'和透明基板14与粘合剂层13层叠。金属箔11'的粘合层13侧表面可以形成有变色层12.粘合剂层的粗糙度 金属箔11'的13侧表面（下表面）优选地使得最大高度Rmax大于0且小于4μm，更优选大于0和2μm或更小。 只要金属箔11'的该表面的最大高度Rmax落在上述范围内，粘合剂层就不会含有这样的尺寸的气泡，反射率受到不利影响。 此外，金属箔11'的与粘合剂层13侧表面相对的表面（上表面）的粗糙度优选地使得算术平均粗糙度Ra在0.02μm和1μm之间的范围内。 只要金属箔11'的这个表面的算术平均粗糙度Ra在上述范围内，就可以有效地进行真空吸引，使感光性树脂层和光掩模成为放置在 感光性树脂层，然后进行感光性树脂层的图案曝光。

公开(公告)号：US20040018372A1

公开(公告)日：2004-01-29

申请号：US10621382

申请日：2003-07-18

申请人： DAI NIPPON PRINTING CO., LTD.

发明人： Takayasu Komatsu ,  Daisuke Hashimoto ,  Akira Makita ,  Koji Fujiyama

IPC分类号： B21F001/00 ,  B21C001/00 ,  B21H003/00 ,  B21C027/00 ,  B21B001/00 ,  B32B003/10 ,  B21D028/00 ,  B23P009/00 ,  C23F003/00 ,  G03F007/20 ,  G03F007/40

CPC分类号： G03F7/09 ,  C23F1/02 ,  C23F1/28 ,  G03F7/0007 ,  G03F7/115 ,  H01J9/142 ,  Y10T428/12229 ,  Y10T428/12361 ,  Y10T428/12993

摘要： A process of forming a high-definition pattern by etching is provided. A photosensitive resin layer is formed on a metal substrate material having a center line-average surface roughness Ra of up to 0.10 nullm and a maximum surface roughness Rmax of up to 1.0 nullm to form a resist pattern. Then, the photosensitive resin layer provided on the metal substrate material is exposed to light to form a resist pattern. Finally, etching is carried out to form a pattern on the metal substrate material.

摘要翻译： 提供了通过蚀刻形成高清晰度图案的工艺。 感光性树脂层形成在中心线平均表面粗糙度Ra为0.10μm以上的金属基材上，最大表面粗糙度Rmax为1.0μm以形成抗蚀剂图案。 然后，将设置在金属基板材料上的感光性树脂层曝光，形成抗蚀剂图案。 最后，进行蚀刻以在金属基底材料上形成图案。