公开(公告)号：US20230298855A1

公开(公告)日：2023-09-21

申请号：US18016057

申请日：2021-07-13

Applicant: DELMIC IP B.V.

Inventor： Andries Pieter Johan EFFTING ,  Sander Vincent DEN HOEDT

IPC: H01J37/305 ,  H01J37/20 ,  G01N1/28 ,  H01J37/22

CPC classification number: H01J37/3056 ,  H01J37/20 ,  G01N1/286 ,  H01J37/228 ,  H01J2237/31745 ,  H01J2237/31749 ,  G01N2001/2873 ,  H01J2237/208

Abstract: An apparatus and a method for micromachining samples is provided. The apparatus includes an integral combination of a sample holder, a focused ion beam exposure system for projecting a FIB onto a first position on the sample, and a light optical microscope. The LM is configured for imaging or monitoring said first position. The method includes the steps of capturing LM images of the sample, determining a position and physical dimensions of a region of interest in the sample based on the LM images, establishing from the LM images settings of the sample holder and/or the FIB exposure system, for micromachining the sample to bring the region of interest more closer to the surface, and moving the sample or the trajectory of the FIB to locate the first position on the sample accordingly, and activating the FIB for micromachining the sample.

公开(公告)号：US20230045007A1

公开(公告)日：2023-02-09

申请号：US17784283

申请日：2020-12-11

Applicant: DELMIC IP B.V.

Inventor： Sander Vincent DEN HOEDT

IPC: H01J37/20

Abstract: An assembly is provided including a manipulation device and a cooling unit. The manipulation device includes a holder for samples and a thermal mass member which is arranged in thermal contact with the holder. The manipulation device is configured to place the manipulation device in a heat exchange position wherein the in thermal mass member is in thermal contact with the cooling unit, and to move the manipulation device from the heat exchange position to a manipulation position wherein the thermal mass member is thermally separated from the cooling unit. An inspection apparatus of focused ion beam apparatus is also provided including such an assembly, and a method of using such an assembly.

公开(公告)号：US20230020967A1

公开(公告)日：2023-01-19

申请号：US17790996

申请日：2021-01-05

Applicant: DELMIC IP B.V.

Inventor： Andries Pieter Johan EFFTING ,  Sander Vincent DEN HOEDT

IPC: G01N23/2252 ,  H01J37/26 ,  H01J37/28

Abstract: A method for inspecting a sample by means of a multi-beam charged particle inspection apparatus, and an apparatus for performing this method are provided. The multi-beam charged particle inspection apparatus is configured to project an array of charged particle beamlets within an exposure area on the sample. The apparatus includes a detection system for detecting X-Rays and/or cathodoluminescent light from the exposure area emitted by the sample due to an interaction of the array of charged particle beamlets with the sample. The method includes the steps of projecting the array of charged particle beamlets within the exposure area on the sample, and monitoring a combined emission of X-Rays and/or cathodoluminescent light from the interaction of substantially all charged particle beamlets of the array of charged particle beamlets with the sample.