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1.发明申请Microelectromechanical system device and method for preparing the same for subsequent processing 失效微机电系统装置及其制备方法，用于后续处理公开(公告)号：US20080108163A1
公开(公告)日：2008-05-08
申请号：US11541993
申请日：2006-10-02
IPC分类号： H01L21/00
CPC分类号： B81C1/00849 , B81C2201/112 , B81C2203/0145
摘要： A method for preparing a microelectomechanical system (MEMS) device for subsequent processing is disclosed. The method includes establishing an anti-stiction material on exposed surfaces of the MEMS device. The exposed surfaces include at least an interior surface of a chamber and an external surface of the MEMS device. The anti-stiction material is selectively removed from at least a portion of the external surface via a plasma sputtering process under controlled conditions.
摘要翻译： 公开了一种用于制备用于后续处理的微机电系统（MEMS）装置的方法。 该方法包括在MEMS器件的暴露表面上建立抗静电材料。 暴露的表面包括至少室的内表面和MEMS装置的外表面。 在受控条件下，通过等离子体溅射工艺，从外表面的至少一部分选择性地除去抗静电材料。
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2.发明授权Preparation of microelectromechanical system device using an anti-stiction material and selective plasma sputtering 失效使用抗静电材料和选择性等离子体溅射制备微机电系统装置公开(公告)号：US07443001B2
公开(公告)日：2008-10-28
申请号：US11541993
申请日：2006-10-02
IPC分类号： H01L21/00 , H01L21/302
CPC分类号： B81C1/00849 , B81C2201/112 , B81C2203/0145
摘要： A method for preparing a microelectromechanical system (MEMS) device for subsequent processing is disclosed. The method includes establishing an anti-stiction material on exposed surfaces of the MEMS device. The exposed surfaces include at least an interior surface of a chamber and an external surface of the MEMS device. The anti-stiction material is selectively removed from at least a portion of the external surface via a plasma sputtering process under controlled conditions.
摘要翻译： 公开了一种用于制备用于后续处理的微机电系统（MEMS）装置的方法。 该方法包括在MEMS器件的暴露表面上建立抗静电材料。 暴露的表面包括至少室的内表面和MEMS装置的外表面。 在受控条件下，通过等离子体溅射工艺，从外表面的至少一部分选择性地除去抗静电材料。
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公开(公告)号：US20110085435A1
公开(公告)日：2011-04-14
申请号：US12996836
申请日：2008-06-25
CPC分类号： G11B7/0037 , B41M5/323 , B41M5/3335 , B41M5/3336 , B41M5/3372 , B41M5/3375 , B41M5/41 , B41M2205/04 , G11B7/24094 , G11B7/252
摘要： Imaging layers, optical disks, and methods of preparation of each, are disclosed.
摘要翻译： 公开了成像层，光盘及其制备方法。
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公开(公告)号：US07618682B2
公开(公告)日：2009-11-17
申请号：US11527041
申请日：2006-09-25
申请人： Paul Felice Reboa , Kirby Sand
发明人： Paul Felice Reboa , Kirby Sand
IPC分类号： C23C16/00
CPC分类号： C23C14/24 , B05D1/185 , B05D1/60 , B81B3/0005 , B81C1/0096 , C10M105/68 , C10M133/16 , C10M2211/06 , C10M2215/082 , C10N2240/20 , C10N2250/06 , C10N2270/00 , C10N2280/00 , C23C14/12
摘要： A method for providing an anti-stiction coating on a metal surface includes reacting a vapor of perfluorooctylhydroxamic acid with the metal surface in a reaction chamber.
摘要翻译： 在金属表面上提供抗静电涂层的方法包括在反应室中使全氟辛基肟酸的蒸气与金属表面反应。
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5.发明申请Imaging Layers, Structures Including Imaging Layers, Methods of Making Imaging Layers, and Imaging Systems 审中-公开成像层，包括成像层的结构，成像层和成像系统的方法公开(公告)号：US20090092922A1
公开(公告)日：2009-04-09
申请号：US11868996
申请日：2007-10-09
摘要： Imaging layers, image recording media, and methods of preparation of each, are disclosed.
摘要翻译： 公开了成像层，图像记录介质及其制备方法。
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公开(公告)号：US08652607B2
公开(公告)日：2014-02-18
申请号：US12996836
申请日：2008-06-25
IPC分类号： G11B7/24
CPC分类号： G11B7/0037 , B41M5/323 , B41M5/3335 , B41M5/3336 , B41M5/3372 , B41M5/3375 , B41M5/41 , B41M2205/04 , G11B7/24094 , G11B7/252
摘要： Imaging layers, optical disks, and methods of preparation of each, are disclosed.
摘要翻译： 公开了成像层，光盘及其制备方法。
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公开(公告)号：US20080074771A1
公开(公告)日：2008-03-27
申请号：US11527041
申请日：2006-09-25
申请人： Paul Felice Reboa , Kirby Sand
发明人： Paul Felice Reboa , Kirby Sand
IPC分类号： C23C16/00
CPC分类号： C23C14/24 , B05D1/185 , B05D1/60 , B81B3/0005 , B81C1/0096 , C10M105/68 , C10M133/16 , C10M2211/06 , C10M2215/082 , C10N2240/20 , C10N2250/06 , C10N2270/00 , C10N2280/00 , C23C14/12
摘要： A method for providing an anti-stiction coating on a metal surface includes reacting a vapor of perfluorooctylhydroxamic acid with the metal surface in a reaction chamber.
摘要翻译： 在金属表面上提供抗静电涂层的方法包括在反应室中使全氟辛基肟酸的蒸气与金属表面反应。
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