公开(公告)号：US20170152134A9

公开(公告)日：2017-06-01

申请号：US13951664

申请日：2013-07-26

申请人： Chao-Hung Steve Tung ,  Jin-Woo Kim ,  Taylor Busch

发明人： Chao-Hung Steve Tung ,  Jin-Woo Kim ,  Taylor Busch

IPC分类号： B81B1/00 ,  B81C1/00 ,  G01N27/447 ,  B81C3/00 ,  C03C17/00 ,  C03C27/06 ,  C03C27/00 ,  C12Q1/68 ,  C03C15/00

CPC分类号： B81B1/00 ,  B81C1/00071 ,  B81C3/001 ,  B82Y15/00 ,  B82Y40/00 ,  C03C15/00 ,  C03C17/001 ,  C03C27/00 ,  C03C27/06 ,  C12Q1/6869 ,  G01N27/44791 ,  G01N33/48721 ,  Y10S977/924 ,  Y10T156/1056 ,  Y10T156/1064 ,  Y10T156/1074 ,  Y10T156/1082 ,  Y10T156/1309 ,  C12Q2565/631

摘要： A process for fabricating a nanochannel system using a combination of microelectromechanical system (MEMS) microfabrication techniques, atomic force microscopy (AFM) nanolithography, and focused ion beam (FIB). The nanochannel system, fabricated on either a glass or silicon substrate, has channel heights and widths on the order of single to tens of nanometers. The channel length is in the micrometer range. The nanochannel system is equipped with embedded micro and nanoscale electrodes, positioned along the length of the nanochannel for electron tunneling based characterization of nanoscale particles in the channel. Anodic bonding is used to cap off the nanochannel with a cover chip.

公开(公告)号：US09718668B2

公开(公告)日：2017-08-01

申请号：US13951664

申请日：2013-07-26

申请人： Chao-Hung Steve Tung ,  Jin-Woo Kim ,  Taylor Busch

发明人： Chao-Hung Steve Tung ,  Jin-Woo Kim ,  Taylor Busch

IPC分类号： B81B1/00 ,  C12Q1/68 ,  C03C27/06 ,  G01N33/487 ,  B32B38/04 ,  B81C1/00 ,  C03C15/00 ,  C03C17/00 ,  C03C27/00 ,  B81C3/00 ,  B82Y15/00 ,  B82Y40/00

CPC分类号： B81B1/00 ,  B81C1/00071 ,  B81C3/001 ,  B82Y15/00 ,  B82Y40/00 ,  C03C15/00 ,  C03C17/001 ,  C03C27/00 ,  C03C27/06 ,  C12Q1/6869 ,  G01N27/44791 ,  G01N33/48721 ,  Y10S977/924 ,  Y10T156/1056 ,  Y10T156/1064 ,  Y10T156/1074 ,  Y10T156/1082 ,  Y10T156/1309 ,  C12Q2565/631

摘要： A process for fabricating a nanochannel system using a combination of microelectromechanical system (MEMS) microfabrication techniques, atomic force microscopy (AFM) nanolithography, and focused ion beam (FIB). The nanochannel system, fabricated on either a glass or silicon substrate, has channel heights and widths on the order of single to tens of nanometers. The channel length is in the micrometer range. The nanochannel system is equipped with embedded micro and nanoscale electrodes, positioned along the length of the nanochannel for electron tunneling based characterization of nanoscale particles in the channel. Anodic bonding is used to cap off the nanochannel with a cover chip.

公开(公告)号：US20140231254A1

公开(公告)日：2014-08-21

申请号：US13951664

申请日：2013-07-26

申请人： Chao-Hung Steve Tung ,  Jin-Woo Kim ,  Taylor Busch

发明人： Chao-Hung Steve Tung ,  Jin-Woo Kim ,  Taylor Busch

IPC分类号： B81B1/00 ,  B81C1/00 ,  G01N27/447 ,  B81C3/00 ,  C03C17/00 ,  C03C27/06 ,  C03C27/00 ,  C12Q1/68 ,  C03C15/00

CPC分类号： B81B1/00 ,  B81C1/00071 ,  B81C3/001 ,  B82Y15/00 ,  B82Y40/00 ,  C03C15/00 ,  C03C17/001 ,  C03C27/00 ,  C03C27/06 ,  C12Q1/6869 ,  G01N27/44791 ,  G01N33/48721 ,  Y10S977/924 ,  Y10T156/1056 ,  Y10T156/1064 ,  Y10T156/1074 ,  Y10T156/1082 ,  Y10T156/1309 ,  C12Q2565/631

摘要： A process for fabricating a nanochannel system using a combination of microelectromechanical system (MEMS) microfabrication techniques, atomic force microscopy (AFM) nanolithography, and focused ion beam (FIB). The nanochannel system, fabricated on either a glass or silicon substrate, has channel heights and widths on the order of single to tens of nanometers. The channel length is in the micrometer range. The nanochannel system is equipped with embedded micro and nanoscale electrodes, positioned along the length of the nanochannel for electron tunneling based characterization of nanoscale particles in the channel. Anodic bonding is used to cap off the nanochannel with a cover chip.

摘要翻译： 使用微机电系统（MEMS）微加工技术，原子力显微镜（AFM）纳米光刻术和聚焦离子束（FIB）的组合来制造纳米通道系统的方法。 在玻璃或硅衬底上制造的纳米通道系统的通道高度和宽度大约为数十纳米。 通道长度在千分尺范围内。 纳米通道系统配备有嵌入的微纳米级电极，沿着纳米通道的长度定位，用于基于通道中的纳米尺度粒子的电子隧道分析。 使用阳极接合来封盖带有封装芯片的纳米通道。

公开(公告)号：US20130213815A1

公开(公告)日：2013-08-22

申请号：US13768960

申请日：2013-02-15

申请人： Chao-Hung Steve Tung ,  Jin-Woo Kim

发明人： Chao-Hung Steve Tung ,  Jin-Woo Kim

IPC分类号： C12Q1/68

CPC分类号： C12Q1/6869 ,  B82Y15/00 ,  B82Y40/00 ,  G01N33/48721

摘要： A process for fabricating a nanochannel system using a combination of microelectromechanical system (MEMS) microfabrication techniques and atomic force microscopy (AFM) nanolithography. The nanochannel system, fabricated on either a glass or silicon substrate, has channel heights and widths on the order of single to tens of nanometers. The channel length is in the micrometer range. The nanochannel system is equipped with embedded micro or nanoscale electrodes, positioned along the length of the nanochannel for electron tunneling based characterization of nanoscale particles in the channel. Anodic bonding is used to cap off the nanochannel with a cover chip.

摘要翻译： 使用微机电系统（MEMS）微加工技术和原子力显微镜（AFM）纳米光刻技术的组合来制造纳米通道系统的方法。 在玻璃或硅衬底上制造的纳米通道系统的通道高度和宽度大约为数十纳米。 通道长度在千分尺范围内。 纳米通道系统配备有嵌入式微纳米级电极，其沿着纳米通道的长度定位，用于基于通道中的纳米级粒子的电子隧道化表征。 使用阳极接合来封盖带有封装芯片的纳米通道。