公开(公告)号：US20150017329A1

公开(公告)日：2015-01-15

申请号：US14329381

申请日：2014-07-11

Applicant: Canon Nanotechnologies, Inc. ,  Toshiba Corporation

Inventor： Edward Brian Fletcher ,  Gerard M. Schmid ,  Se-Hyuk Im ,  Niyaz Khusnatdinov ,  Yeshwanth Srinivasan ,  Weijun Liu ,  Frank Y. Xu

IPC: B29C43/02 ,  B29C43/18 ,  G03F7/00

CPC classification number: G03F7/0002 ,  B05D3/067 ,  B05D3/12 ,  B29C43/021 ,  B29C43/18 ,  B29C2043/025 ,  B29K2105/0002 ,  B29K2105/0058 ,  B29L2031/7562

Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.

Abstract translation: 印刷光刻方法，其包含以可改善填充时间性能的模式中沉积可聚合材料的液滴，使用面向定向的印模模板。 图案基于由沿着快速和慢速轴定向的重复的液滴组形成的网格阵列，每行的液滴相对于相邻行中的液滴沿慢轴偏移。

公开(公告)号：US09651862B2

公开(公告)日：2017-05-16

申请号：US14329381

申请日：2014-07-11

Applicant: Canon Nanotechnologies, Inc. ,  Toshiba Corporation

Inventor： Edward Brian Fletcher ,  Gerard M. Schmid ,  Se-Hyuk Im ,  Niyaz Khusnatdinov ,  Yeshwanth Srinivasan ,  Weijun Liu ,  Frank Y. Xu

IPC: G03F7/00 ,  B29C43/02 ,  B29C43/18 ,  B29K105/00 ,  B29L31/00 ,  B05D3/06 ,  B05D3/12

CPC classification number: G03F7/0002 ,  B05D3/067 ,  B05D3/12 ,  B29C43/021 ,  B29C43/18 ,  B29C2043/025 ,  B29K2105/0002 ,  B29K2105/0058 ,  B29L2031/7562

Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.