公开(公告)号：US09651862B2

公开(公告)日：2017-05-16

申请号：US14329381

申请日：2014-07-11

Applicant: Canon Nanotechnologies, Inc. ,  Toshiba Corporation

Inventor： Edward Brian Fletcher ,  Gerard M. Schmid ,  Se-Hyuk Im ,  Niyaz Khusnatdinov ,  Yeshwanth Srinivasan ,  Weijun Liu ,  Frank Y. Xu

IPC: G03F7/00 ,  B29C43/02 ,  B29C43/18 ,  B29K105/00 ,  B29L31/00 ,  B05D3/06 ,  B05D3/12

CPC classification number: G03F7/0002 ,  B05D3/067 ,  B05D3/12 ,  B29C43/021 ,  B29C43/18 ,  B29C2043/025 ,  B29K2105/0002 ,  B29K2105/0058 ,  B29L2031/7562

Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.

公开(公告)号：US20150017329A1

公开(公告)日：2015-01-15

申请号：US14329381

申请日：2014-07-11

Applicant: Canon Nanotechnologies, Inc. ,  Toshiba Corporation

Inventor： Edward Brian Fletcher ,  Gerard M. Schmid ,  Se-Hyuk Im ,  Niyaz Khusnatdinov ,  Yeshwanth Srinivasan ,  Weijun Liu ,  Frank Y. Xu

IPC: B29C43/02 ,  B29C43/18 ,  G03F7/00

CPC classification number: G03F7/0002 ,  B05D3/067 ,  B05D3/12 ,  B29C43/021 ,  B29C43/18 ,  B29C2043/025 ,  B29K2105/0002 ,  B29K2105/0058 ,  B29L2031/7562

Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.

Abstract translation: 印刷光刻方法，其包含以可改善填充时间性能的模式中沉积可聚合材料的液滴，使用面向定向的印模模板。 图案基于由沿着快速和慢速轴定向的重复的液滴组形成的网格阵列，每行的液滴相对于相邻行中的液滴沿慢轴偏移。

公开(公告)号：US20160047044A1

公开(公告)日：2016-02-18

申请号：US14922953

申请日：2015-10-26

Applicant: Canon Nanotechnologies, Inc. ,  Molecular Imprints, Inc.

Inventor： Se Hyun Ahn ,  Byung-Jin Choi ,  Frank Y. Xu

IPC: C23C16/513 ,  G03F7/00 ,  C23C16/48 ,  C23C16/40 ,  B41C1/10

CPC classification number: C23C16/513 ,  B29C59/043 ,  B29C59/046 ,  B29C59/14 ,  B29C2059/145 ,  B41C1/10 ,  B82Y10/00 ,  B82Y40/00 ,  C23C16/402 ,  C23C16/48 ,  G03F7/0002

Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.

Abstract translation: 提供了用于制造具有薄金属或氧化物涂覆的图案化表面的基于聚合物的压印光刻模板的方法和系统。 这样的模板显示出增强的流体扩散和填充（即使没有吹扫气体），良好的脱模性能和使用寿命。 特别是用于制造氧化物涂层版本的方法和系统可以在大气压条件下进行，从而允许较低成本的处理和增加的生产量。

公开(公告)号：US09725807B2

公开(公告)日：2017-08-08

申请号：US14922953

申请日：2015-10-26

Applicant: Canon Nanotechnologies, Inc. ,  Molecular Imprints, Inc.

Inventor： Se Hyun Ahn ,  Byung-Jin Choi ,  Frank Y. Xu

IPC: G03G7/00 ,  C23C16/513 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B41C1/10 ,  C23C16/40 ,  C23C16/48 ,  B29C59/04 ,  B29C59/14

Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.

公开(公告)号：US20150165671A1

公开(公告)日：2015-06-18

申请号：US14632125

申请日：2015-02-26

Applicant: Canon Nanotechnologies, Inc. ,  Molecular Imprints, Inc.

Inventor： Se-Hyuk Im ,  Mahadevan Ganapathisubramanian ,  Edward Brian Fletcher ,  Niyaz Khusnatdinov ,  Gerard M. Schmid ,  Mario Johannes Meissl ,  Anshuman Cherala ,  Frank Y. Xu ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B29C45/76 ,  B29L2007/001 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/877

Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.

Abstract translation: 通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db） ）和/或材料刚度的选择。