公开(公告)号：US09482790B2

公开(公告)日：2016-11-01

申请号：US13834008

申请日：2013-03-15

Applicant: CORNING INCORPORATED

Inventor： Michael Jerome Cangemi ,  Paul Gerard Dewa ,  Joseph D Malach ,  Paul Francis Michaloski ,  Horst Schreiber ,  Jue Wang

IPC: G02B1/11 ,  G02B1/115 ,  G02B1/10 ,  G03F7/20

CPC classification number: G02B1/115 ,  G02B1/10 ,  G02B1/105 ,  G03F7/7015 ,  G03F7/70958

Abstract: The disclosure is directed to a coating consisting of a binary metal fluoride coating consisting a high refractive index metal fluoride layer on top of a substrate, a low refractive index metal fluoride layer on top of the high refractive index layer and layer of SiO2 or F—SiO2 containing 0.2 wt % to 4.5 (2000 ppm to 45,000 ppm) F on top of the low refractive index layer. In one embodiment the F content of F—SiO2 is in the range of 5000 ppm to 10,000 ppm F. The high index and low index materials are each deposited to a thickness of less than or equal to 0.9 quarter wave, and the capping material is deposited to a thickness in the range of 5 nm to 25 nm. The disclosure is also directed to optical elements having the foregoing coating and a method of making the coating.

Abstract translation: 本发明涉及一种由二元金属氟化物涂层组成的涂层，该涂层由基底顶部的高折射率金属氟化物层，高折射率层顶部的低折射率金属氟化物层和SiO 2或F- 在低折射率层的顶部含有0.2重量％〜4.5（2000ppm〜45,000ppm）F的SiO 2。 在一个实施方案中，F-SiO 2的F含量在5000ppm至10,000ppm F的范围内。高折射率和低折射率材料各自沉积至小于或等于0.9的1/4波长，并且封盖材料为 沉积到5nm至25nm范围内的厚度。 本发明还涉及具有上述涂层的光学元件和制备该涂层的方法。