公开(公告)号：US09494353B2

公开(公告)日：2016-11-15

申请号：US14302442

申请日：2014-06-12

Applicant: CHROMA ATE INC.

Inventor： Ben-Mou Yu ,  Ming-Chieh Lin ,  Ching-Wen Chang ,  Xin-Yi Wu

IPC: F25B21/02 ,  F25B49/00 ,  G05D23/19

CPC classification number: F25B49/00 ,  F25B21/02 ,  G05D23/1919

Abstract: A temperature control equipment is capable of controlling a tested object to a predetermined temperature. The temperature control equipment includes a thermal conducting plate, a temperature regulating module, a carrier plate, and a thermoelectric cooling module. The temperature regulating module is thermally connected to the thermal conducting plate for regulating the thermal conducting plate to a reference temperature. The carrier plate is used to accommodate the tested object. The thermoelectric cooling module is thermally connected between the thermal conducting plate and the carrier plate for controlling the tested object to the predetermined temperature via the carrier plate based on the reference temperature.

Abstract translation: 温度控制设备能够将测试对象控制到预定温度。 温度控制设备包括导热板，温度调节模块，承载板和热电冷却模块。 温度调节模块热连接到用于将导热板调节到参考温度的导热板。 承载板用于容纳被测物体。 热电冷却模块热连接在导热板和承载板之间，用于基于参考温度经由载板将测试对象控制到预定温度。

公开(公告)号：US09568245B2

公开(公告)日：2017-02-14

申请号：US14681093

申请日：2015-04-08

Applicant: CHROMA ATE INC.

Inventor： Hsiu-Wei Kuo ,  Xin-Yi Wu ,  Ben-Mou Yu ,  Ming-Chang Wu ,  Mao-Sheng Liu ,  Kuei-Wen Lien

IPC: F27B17/00 ,  F27B1/08 ,  F27D7/04

CPC classification number: F27B1/08 ,  F27B17/0083 ,  F27D7/04 ,  F27D2007/045

Abstract: The disclosure discloses a heating furnace including a housing, a first rack, a chamber, and at least one fan. The first rack is disposed in the housing. The chamber is disposed in the housing and located at a side of the first rack. The chamber includes an inlet, a first sidewall, and a second sidewall. The first sidewall is adjacent to the first rack. The first sidewall has a plurality of vents. The first sidewall and the second sidewall are disposed to face each other. A width is spaced between the first sidewall and the second sidewall, and the width is larger than or equal to 200 mm. The fan is disposed in the housing for generating an airflow to the inlet.

Abstract translation: 本公开公开了一种加热炉，其包括壳体，第一齿条，腔室和至少一个风扇。 第一个机架设置在外壳中。 腔室设置在壳体中并且位于第一齿条的一侧。 腔室包括入口，第一侧壁和第二侧壁。 第一侧壁与第一机架相邻。 第一侧壁具有多个通风孔。 第一侧壁和第二侧壁被设置为彼此面对。 宽度在第一侧壁和第二侧壁之间间隔开，并且宽度大于或等于200mm。 风扇设置在壳体中以产生到入口的气流。

公开(公告)号：US11609261B2

公开(公告)日：2023-03-21

申请号：US17337954

申请日：2021-06-03

Applicant: CHROMA ATE INC.

Inventor： Wei-Chih Chen ,  Ben-Mou Yu ,  Yi-Yen Lin

IPC: G01R31/26 ,  G01N21/95 ,  G01R31/28

Abstract: A wafer inspection system and a wafer inspection equipment thereof are provided. The wafer inspection system includes a susceptor device, probe card, and bridge module. The susceptor device includes a susceptor unit for placing a wafer under test. The probe card includes a probing portion and conducting portion. The conducting portion is disposed at the periphery of the probing portion and has a contact surface. The bridge module includes transmission units extended upward, positioned adjacent to a wafer placement area, and coupled to the susceptor unit. When the probing portion comes into contact with a testing point of the wafer, the contact surface of the conducting portion gets coupled to the transmission units to transmit a test signal to the probe card via the transmission units and conducting portion and thus form a test loop. Thus, the test loop path can be shortened and the accuracy of signal transmission and inspection can be enhanced.