公开(公告)号：US20030201010A1

公开(公告)日：2003-10-30

申请号：US10422429

申请日：2003-04-24

Applicant: Catalysts & Chemicals Industries Co., Ltd.

Inventor： Tsuguo Koyanagi ,  Michio Komatsu

IPC: H01L031/00

CPC classification number: H01G9/2031 ,  H01G9/2009 ,  H01G9/2036 ,  Y02E10/542

Abstract: A photovoltaic cell includes a first substrate having on its surface a first electrode layer having on its surface a semiconductor film on which a photosensitizer is adsorbed, and a second substrate having on its surface a second electrode layer. The first and second substrates are arranged so that the first electrode layer overlaid with the semiconductor film and the second electrode layer are opposite each other with an electrolyte disposed therebetween. Spacer particles are interposed between the semiconductor film and the second electrode layer, and at least one of the electrode-layer-having substrates is transparent. A coating liquid for forming the semiconductor film includes both a component for forming the semiconductor film as well as the spacer particles, dispersed in a dispersion medium.

Abstract translation: 光伏电池包括第一基板，其表面上具有在其表面上具有吸收光敏剂的半导体膜的第一电极层，以及在其表面上具有第二电极层的第二基板。 第一和第二基板被布置成使得覆盖有半导体膜和第二电极层的第一电极层彼此相对，并且其间设置有电解质。 间隔粒子插入在半导体膜和第二电极层之间，并且至少一个具有电极层的衬底是透明的。 用于形成半导体膜的涂布液包括分散在分散介质中的用于形成半导体膜的部件和间隔物颗粒。

公开(公告)号：US20030186634A1

公开(公告)日：2003-10-02

申请号：US10394217

申请日：2003-03-24

Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.

Inventor： Hiroyasu Nishida ,  Yoshinori Wakamiya ,  Michio Komatsu

IPC: B24B031/02 ,  C09C001/68

CPC classification number: B82Y30/00 ,  C01P2004/64 ,  C01P2006/10 ,  C09C1/3081 ,  C09C3/12 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/31053

Abstract: In the polishing particles each having a core-shell structure, the polishing rate can be controlled by adjusting the thickness and/or density of the shell portion. The polishing particles having the core-shell structure with the average diameter (D) in the range from 5 to 300 nm, and the shell portion of the polishing particles comprises silica with the thickness (ST) in the range from 1 to 50 nm, and the density of the shell portion is in the range from 1.6 to 2.2 g/cc, while the Na content of the shell portion is less than 10 ppm.

Abstract translation: 在具有核 - 壳结构的抛光颗粒中，可以通过调节壳部的厚度和/或密度来控制抛光速率。 具有平均直径（D）在5至300nm范围内的核 - 壳结构的抛光颗粒和抛光颗粒的壳部分包括厚度（ST）在1至50nm范围内的二氧化硅， 壳部的密度在1.6〜2.2g / cc的范围内，壳部的Na含量小于10ppm。

公开(公告)号：US20030150485A1

公开(公告)日：2003-08-14

申请号：US10361079

申请日：2003-02-06

Applicant: Catalysts & Chemicals Industries Co., LTD.

Inventor： Tsuguo Koyanagi ,  Michio Komatsu ,  Hirokazu Tanaka ,  Katsuhiro Shirono

IPC: H01L031/04

CPC classification number: B82Y30/00 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2004/84 ,  C09C1/3054 ,  H01G9/2004 ,  H01G9/2031 ,  Y02E10/542 ,  Y02P70/521

Abstract: The first photoelectric cell of the present invention comprises: an insulating base having on its surface an electrode layer (1), the electrode layer (1) having on its surface a metal oxide semiconductor film (2) on which a photosensitizer is adsorbed; an insulating base having on its surface an electrode layer (3), the electrode layer (1) and the electrode layer (3) arranged opposite to each other; and an electrolyte sealed between the metal oxide semiconductor film (2) and the electrode layer (3), wherein at least one of the electrode-having insulating bases is transparent; and the metal oxide semiconductor film (2) comprises anatase titanium oxide particles. This first photoelectric cell includes a semiconductor film comprising anatase titanium oxide particles, having a high proportion of photosensitizer adsorbed, so that the electron mobility in the semiconductor film is high to thereby realize excellent photoelectric transfer efficiency. The second photoelectric cell of the present invention comprises: an insulating base having on its surface an electrode layer (1), the electrode layer (1) having on its surface a metal oxide semiconductor layer (2) on which a photosensitizer is adsorbed; an insulating base having on its surface an electrode layer (3), the electrode layer (1) and the electrode layer (3) arranged opposite to each other; and an electrolyte sealed between the metal oxide semiconductor layer (2) and the electrode layer (3), wherein conductive protrusions (4) jutting from the surface of the electrode layer (1) exist, the metal oxide semiconductor layer (2) formed so as to cover the conductive protrusions (4) and the electrode layer (1), and at least one of the electrode-layer-having insulating bases is transparent. In this second photoelectric cell, conductive protrusions are provided on the electrode surface, so that generated electrons not only can rapidly move toward the electrode but also are free from recombining with the photosensitizer. Moreover, in this photoelectric cell, not only is the adsorption proportion of photosensitizer high but also the moving of generated electrons is smooth. Therefore, the second photoelectric cell exhibits excellent photoelectric transfer efficiency.

公开(公告)号：US20030089045A1

公开(公告)日：2003-05-15

申请号：US10291643

申请日：2002-11-12

Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.

Inventor： Kazuhiro Nakayama ,  Akira Nakashima ,  Michio Komatsu

IPC: C09C001/68 ,  C09K003/14

CPC classification number: B82Y30/00 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2004/80 ,  C01P2006/90 ,  C09C1/3081 ,  C09K3/1409

Abstract: Silica particles for polishing to planarize a surface of a substrate without generating scratches, having the average particle diameter in the range from 5 to 300 nm, carbon content in the range from 0.5 to 5 weight %, and 10%-compressive elasticity modulus in the range from 500 to 3000 kgf/mm2. When the carbon content in the silica particles is less than 0.5 weight %, there is no residual alkoxy group and siloxane bonding proceeds, so that the obtained particles are hard. In that case, although the polishing rate is high, scratches remain or are generated anew after polishing, and planarity of the polished surface is insufficient. On the other hand, when the carbon content is over 5 weight %, many residual alkoxy group are contained in the particles, so that the particles are relatively soft and a sufficient polishing rate can not be achieved.

Abstract translation: 用于抛光以平面化基材表面的二氧化硅颗粒，而不产生刮痕，其平均粒径在5至300nm的范围内，碳含量在0.5至5重量％的范围内，并且10％的压缩弹性模量在 范围从500至3000 kgf / mm2。 当二氧化硅颗粒中的碳含量小于0.5重量％时，不存在残留的烷氧基并进行硅氧烷键合，所以得到的颗粒是硬的。 在这种情况下，虽然抛光速度高，但抛光后残留或重新产生划痕，抛光面的平面度不足。 另一方面，当碳含量超过5重量％时，颗粒中含有许多残留的烷氧基，使得颗粒相对较软并且不能获得足够的抛光速率。

公开(公告)号：US20030031840A1

公开(公告)日：2003-02-13

申请号：US10172916

申请日：2002-06-17

Applicant: Catalysts & Chemicals Industries Co., Ltd.

Inventor： Hiroyasu Nishida ,  Mitsuru Nakai ,  Michio Komatsu

IPC: B41M005/00

CPC classification number: B41M5/5218 ,  Y10T428/24802 ,  Y10T428/259

Abstract: The invention provides a recording sheet having an ink-receiving layer, which comprises a substrate sheet and an ink-receiving layer formed thereon, said ink-receiving layer comprising oxide particles, wherein the ink-receiving layer has pores having a diameter in the range of 3.4 to 2,000 nm, the pore volume of pores having a diameter of 3.4 to 30 nm is in the range of 0.2 to 1.8 ml/g, and the pore volume of pores having a diameter of 30 to 2,000 nm is in the range of 0.1 to 1.5 ml/g. It is preferable that the oxide particles have an average particle diameter of 2 to 1,000 nm and are a mixture of hydrophobic oxide particles and hydrophilic oxide particles. This recording sheet shows sufficient strength, has excellent printability such that images of uniform density and high sharpness can be printed thereon without bleeding, and is excellent in water resistance, weathering resistance and fading resistance.

Abstract translation: 本发明提供了一种具有油墨接收层的记录纸，其包括基板和形成在其上的油墨接收层，所述油墨接收层包括氧化物颗粒，其中油墨接收层具有直径在该范围内的孔 为3.4〜2000nm，直径为3.4〜30nm的孔的孔体积为0.2〜1.8ml / g，直径为30〜2000nm的孔的孔体积为 0.1〜1.5ml / g。 优选氧化物粒子的平均粒径为2〜1000nm，是疏水性氧化物粒子和亲水性氧化物粒子的混合物。 该记录片材具有足够的强度，具有优异的可印刷性，使得能够在不渗色的情况下在其上印刷均匀的密度和高锐度的图像，并且具有优异的耐水性，耐候性和抗褪色性。

公开(公告)号：US20040038047A1

公开(公告)日：2004-02-26

申请号：US10649575

申请日：2003-08-26

Applicant: Catalysts & Chemicals Industries Co., Ltd

Inventor： Akira Nakashima ,  Michio Komatsu

IPC: B32B009/04

CPC classification number: H01L21/3122 ,  C09D183/04 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31058 ,  Y10S525/903 ,  Y10T428/31663 ,  C08L2666/14 ,  C08L2666/54 ,  C08L2666/04

Abstract: A coating liquid for forming a silica-containing film with a low-dielectric constant which enables formation of low-density film having a dielectric constant as low as 3 or less and having excellent resistance to oxygen plasma and process adaptation but also in the adhesion to a substrate and film strength. A substrate coated with the silica-containing film having the above characteristics, obtained by the use of the above coating liquid. The coating liquid for forming a silica-containing film with a low-dielectric constant comprises a polymer composition mainly constituted by a polysiloxane and a readily decomposable resin, said polysiloxane being a reaction product between fine particles of silica and a hydrolyzate of at least one alkoxysilane represented by the following formula (I): XnSi(OR)4-n, wherein X represents a hydrogen atom, a fluorine atom, an unfluorinated or fluorinated alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; and n is an integer of 0 to 3.

Abstract translation: 一种用于形成具有低介电常数的含二氧化硅的膜的涂布液，其能够形成介电常数低至3或更低的低密度膜，并且具有优异的耐氧等离子体和工艺适应性，而且在与 基材和膜强度。 通过使用上述涂布液获得具有上述特性的含二氧化硅的膜的基材。 用于形成具有低介电常数的含二氧化硅膜的涂布液包括主要由聚硅氧烷和易分解树脂构成的聚合物组合物，所述聚硅氧烷是二氧化硅微粒与至少一种烷氧基硅烷的水解产物之间的反应产物 由下式（I）表示：XnSi（OR）4-n，其中X表示氢原子，氟原子，1〜8个碳原子的未氟化或氟化烷基，芳基或乙烯基; R表示氢原子，1〜8个碳原子的烷基，芳基或乙烯基; n为0〜3的整数。

公开(公告)号：US20040016914A1

公开(公告)日：2004-01-29

申请号：US10621871

申请日：2003-07-17

Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.

Inventor： Masayuki Matsuda ,  Mitsuaki Kumazawa ,  Yoichi Ishihara ,  Toshiharu Hirai ,  Michio Komatsu

IPC: H01C001/00 ,  C09D001/00

CPC classification number: H05K9/0096 ,  C08K3/08 ,  C08K3/10 ,  C08K3/36 ,  C09D1/00 ,  C09D5/24 ,  C09D183/02 ,  C09D183/04 ,  H01B1/16 ,  H01B1/18

Abstract: Disclosed is a coating liquid for forming a transparent conductive film, comprising conductive fine particles having an average particle diameter of 1 to 200 nm, silica particles having an average particle diameter of 4 to 200 nm and a polar solvent. The silica particles are in the form of chain silica particles having 2 to 10 silica particles on an average being connected. The content of an alkali in the silica particles is not more than 1000 ppm in terms of an alkali metal M. Also disclosed is a substrate with a transparent conductive film, comprising a substrate, a transparent conductive fine particle layer formed on the substrate and containing conductive fine particles having an average particle diameter of 1 to 200 nm and silica particles having an average particle diameter of 4 to 200 nm and/or chain silica particles having 2 to 10 silica particles on an average being connected, and a transparent film provided on the transparent conductive fine particle layer and having a refractive index lower than that of the transparent conductive fine particle layer. A display device using the substrate with a transparent conductive film is further disclosed. The coating liquid for forming a transparent conductive film is capable of forming a transparent conductive film having low surface resistance, excellent antistatic properties, excellent electromagnetic blocking properties, high film strength and excellent adhesion to a substrate.

Abstract translation: 公开了一种用于形成透明导电膜的涂布液，其包含平均粒径为1〜200nm的导电性微粒，平均粒径为4〜200nm的二氧化硅粒子和极性溶剂。 二氧化硅颗粒是平均连接有2至10个二氧化硅颗粒的链二氧化硅颗粒的形式。 二氧化硅颗粒中的碱的含量以碱金属M计为1000ppm以下。还公开了具有透明导电膜的基板，包括基板，形成在基板上的透明导电微粒层， 平均粒径为1〜200nm的导电性微粒和平均粒径为4〜200nm的二氧化硅粒子和/或平均连接有2〜10个二氧化硅粒子的链二氧化硅粒子，以及设置在 该透明导电微粒层的折射率低于透明导电性微粒层的折射率。 进一步公开了使用具有透明导电膜的基板的显示装置。 用于形成透明导电膜的涂布液能够形成具有低表面电阻，优异的抗静电性，优异的电磁阻隔性，高膜强度和对基材的优异粘附性的透明导电膜。

公开(公告)号：US20030089276A1

公开(公告)日：2003-05-15

申请号：US10291550

申请日：2002-11-12

Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.

Inventor： Hiroyasu Nishida ,  Noboru Senju ,  Michio Komatsu

IPC: C09K003/00 ,  C04B035/14

CPC classification number: C04B35/63 ,  A61K6/0008 ,  A61K6/0076 ,  A61K6/0088 ,  A61K6/0235 ,  A61K6/024 ,  A61K6/0245 ,  A61K6/0255 ,  C04B35/62655 ,  C04B38/009 ,  C04B2111/00836 ,  C04B2235/3213 ,  C04B2235/3215 ,  C04B2235/3217 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/3232 ,  C04B2235/3244 ,  C04B2235/3284 ,  C04B2235/3409 ,  C04B2235/3418 ,  C04B2235/5409 ,  C04B2235/5436 ,  C04B2235/9646 ,  C04B12/04 ,  C04B22/08 ,  C04B28/24 ,  C04B40/0082 ,  A61K6/083 ,  C08L43/04 ,  C08L33/14 ,  C08L33/10

Abstract: The present invention provides amorphous inorganic particles as a dental material comprising silica and inorganic oxide(s) other than silica and having high x-ray impermeability. The inorganic particles as a dental material comprise silica with the content in the range from 70 to 98 weight % and oxide(s) of one or more elements selected from the group consisting of Zr, Ti, La, Ba, Sr, Hf, Y, Zn, AL, and B, wherein 5 to 70 weight % of the silica is originated from an acidic silicic acid solution and 30 to 95 weight % of the silica is originated from a sol of silica. This inorganic particles as a dental material have average particle diameter in the range from 1 to 10 nullm, specific surface area in the range from 50 to 350 m2/g, pore volume in the range from 0.05 to 0.5 ml/g, amorphous crystallinity as observed by x-ray diffraction, and the refractive index in the range from 1.47 to 1.60.

Abstract translation: 本发明提供了作为牙科材料的无定形无机颗粒，其包括二氧化硅和除了二氧化硅之外的无机氧化物并具有高X射线不渗透性。 作为牙科材料的无机颗粒包含含量为70-98重量％的二氧化硅和选自Zr，Ti，La，Ba，Sr，Hf，Y的一种或多种元素的氧化物 ，Zn，AL和B，其中5至70重量％的二氧化硅源自酸性硅酸溶液，30至95重量％的二氧化硅源自二氧化硅溶胶。 作为牙科用材料的无机粒子的平均粒径为1〜10μm，比表面积为50〜350m 2 / g，孔体积为0.05〜0.5ml / g，无定形结晶度为 通过x射线衍射观察，折射率在1.47至1.60的范围内。