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公开(公告)号:US20220186359A1
公开(公告)日:2022-06-16
申请号:US17485170
申请日:2021-09-24
发明人: Nianqi YAO , Ce NING , Zhengliang LI , Hehe HU , Dapeng XUE , Lizhong WANG , Shuilang DONG , Jie HUANG , Jiayu HE , Lubin SHI , Yancai LI
IPC分类号: C23C14/50
摘要: A fixture, a tray and a sputtering system. The fixture is internally provided with a support structure and a clamping structure connected with each other, wherein the clamping structure is configured to clamp a to-be-sputtered substrate; an orthographic projection of the clamping structure on a plane where the support structure is located and the support structure share an superimposed area and are separate in non-superimposed areas; wherein the support structure located in the non-superimposed area and/or the clamping structure located in the non-superimposed area has a first hollowed structure. The fixture is internally provided with the first hollowed structure, such that a part of an area of the to-be-sputtered substrate covered by the fixture may be exposed via the first hollowed structure when the fixture holds the to-be-sputtered substrate, so as to reduce the area of the to-be-sputtered substrate covered by the fixture.