Polymer, method for preparing the same and solar cell comprising the polymer

    公开(公告)号:US11114251B2

    公开(公告)日:2021-09-07

    申请号:US15959572

    申请日:2018-04-23

    Inventor: Zhihong Wu

    Abstract: The present invention provides a polymer, a method for preparing the same, and a solar cell comprising the polymer having a structure represented by Formula I, the polymer has excellent interface-modified property, water resistance and/or excellent electron-transporting property, and thus can be effectively used to prepare solar cells. The polymer not only can significantly improve the hydrophobic property of the thin film surface of the solar cell, thereby protecting the intermediate active layer of the cell from moisture in the air so as to improve the lifetime of the cell device, but also can be used for large-area processing to prepare a flexible cell device.

    Microfluidic control chip, microfluidic apparatus, and manufacturing method thereof

    公开(公告)号:US11517899B2

    公开(公告)日:2022-12-06

    申请号:US16469366

    申请日:2018-11-30

    Inventor: Zhihong Wu

    Abstract: The disclosure relates to a microfluidic control chip. The microfluidic control chip may include an upper cover, a lower cover, and a chip functional layer between the upper cover and the lower cover. The chip functional layer may include a first region. The chip functional layer in the first region may include at least one chamber unit, an inlet flow channel to the chamber unit, and an outlet flow channel from the chamber unit. The chamber unit may include a main flow channel, a plurality of secondary flow channels, and a plurality of microcavity structures. The chamber unit may be configured to allow a liquid to flow from the main flow channel to the plurality of secondary flow channels, and then to the plurality of microcavity structures.

    Method for patterning quantum dot layer, method for manufacturing light emitting device

    公开(公告)号:US12022723B2

    公开(公告)日:2024-06-25

    申请号:US18139277

    申请日:2023-04-25

    CPC classification number: H10K71/00 H10K50/115 H10K71/20

    Abstract: A method of patterning quantum dot layer includes: forming, on a substrate, a film layer including a photosensitive material and quantum dots with ligands on surfaces of the quantum dots; irradiating a quantum dot reserved area with light of a preset wavelength; where under irradiation with light of the preset wavelength, the photosensitive material or a product of the photosensitive material after light irradiation reacts with the ligands on the surfaces of the quantum dots, to allow the ligands to fall off from the surfaces of the quantum dots, so that solubility of the quantum dots is changed to cause the quantum dots to undergo coagulation; and removing a portion of the film layer which is not irradiated by the light of the preset wavelength, to form a patterned quantum dot portion of the quantum dot layer in the quantum dot reserved area.

    METHOD FOR PATTERNING QUANTUM DOT LAYER, METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE

    公开(公告)号:US20230263040A1

    公开(公告)日:2023-08-17

    申请号:US18139277

    申请日:2023-04-25

    CPC classification number: H10K71/00 H10K50/115 H10K71/20

    Abstract: A method of patterning quantum dot layer includes: forming, on a substrate, a film layer including a photosensitive material and quantum dots with ligands on surfaces of the quantum dots; irradiating a quantum dot reserved area with light of a preset wavelength; where under irradiation with light of the preset wavelength, the photosensitive material or a product of the photosensitive material after light irradiation reacts with the ligands on the surfaces of the quantum dots, to allow the ligands to fall off from the surfaces of the quantum dots, so that solubility of the quantum dots is changed to cause the quantum dots to undergo coagulation; and removing a portion of the film layer which is not irradiated by the light of the preset wavelength, to form a patterned quantum dot portion of the quantum dot layer in the quantum dot reserved area.

    Microfluidic particle sorting apparatus and manufacturing method thereof

    公开(公告)号:US11338292B2

    公开(公告)日:2022-05-24

    申请号:US16624813

    申请日:2019-03-12

    Abstract: A microfluidic particle sorting apparatus for capturing targets from fluid containing the targets is disclosed. The apparatus includes an inlet for receiving the fluid; a sorting chamber allowing the fluid to flow through; a first outlet for discharging the fluid after flowing through the sorting chamber; a capturing structure for capturing the cells, wherein the capturing structure is upstream of the first outlet, and includes obstacles in an array, each extending through the sorting chamber in a lateral direction with respect to a fluid flow of the fluid; and a second outlet upstream of the capturing structure comprising a plurality of openings; wherein a gap between two adjacent obstacles is equal to or greater than each opening of the second outlet.

    METHOD FOR PATTERNING QUANTUM DOT LAYER, METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE

    公开(公告)号:US20220013752A1

    公开(公告)日:2022-01-13

    申请号:US17194451

    申请日:2021-03-08

    Abstract: A method of patterning quantum dot layer includes: forming, on a substrate, a film layer including a photosensitive material and quantum dots with ligands on surfaces of the quantum dots; irradiating a quantum dot reserved area with light of a preset wavelength; where under irradiation with light of the preset wavelength, the photosensitive material or a product of the photosensitive material after light irradiation reacts with the ligands on the surfaces of the quantum dots, to allow the ligands to fall off from the surfaces of the quantum dots, so that solubility of the quantum dots is changed to cause the quantum dots to undergo coagulation; and removing a portion of the film layer which is not irradiated by the light of the preset wavelength, to form a patterned quantum dot portion of the quantum dot layer in the quantum dot reserved area.

    Method for patterning quantum dot layer, method for manufacturing light emitting device

    公开(公告)号:US11672162B2

    公开(公告)日:2023-06-06

    申请号:US17194451

    申请日:2021-03-08

    CPC classification number: H01L51/56 H01L51/0014 H01L51/502

    Abstract: A method of patterning quantum dot layer includes: forming, on a substrate, a film layer including a photosensitive material and quantum dots with ligands on surfaces of the quantum dots; irradiating a quantum dot reserved area with light of a preset wavelength; where under irradiation with light of the preset wavelength, the photosensitive material or a product of the photosensitive material after light irradiation reacts with the ligands on the surfaces of the quantum dots, to allow the ligands to fall off from the surfaces of the quantum dots, so that solubility of the quantum dots is changed to cause the quantum dots to undergo coagulation; and removing a portion of the film layer which is not irradiated by the light of the preset wavelength, to form a patterned quantum dot portion of the quantum dot layer in the quantum dot reserved area.

    MICROFLUIDIC CONTROL CHIP, MICROFLUIDIC APPARATUS, AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20220032291A1

    公开(公告)日:2022-02-03

    申请号:US16469366

    申请日:2018-11-30

    Inventor: Zhihong Wu

    Abstract: The disclosure relates to a microfluidic control chip. The microfluidic control chip may include an upper cover, a lower cover, and a chip functional layer between the upper cover and the lower cover. The chip functional layer may include a first region. The chip functional layer in the first region may include at least one chamber unit, an inlet flow channel to the chamber unit, and an outlet flow channel from the chamber unit. The chamber unit may include a main flow channel, a plurality of secondary flow channels, and a plurality of microcavity structures. The chamber unit may be configured to allow a liquid to flow from the main flow channel to the plurality of secondary flow channels, and then to the plurality of microcavity structures.

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