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1.发明申请公开(公告)号：US20180358578A1
公开(公告)日：2018-12-13
申请号：US15538637
申请日：2017-01-12
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Wei LI , Youngsuk SONG , Jianye ZHANG
Abstract: The present disclosure provides an OLED array substrate comprising a plurality of pixel units each including a plurality of sub-pixel units, each of the sub-pixel units comprising a light-emitting portion, each light-emitting portion having a first electrode, a second electrode and an organic light-emitting layer sandwiched between the first electrode and the second electrode, wherein the sub-pixel unit further comprises an organic film layer and a semi-reflecting mirror layer disposed successively on a light exit side of the second electrode, the first electrode comprises a reflective layer, the second electrode is a transparent electrode, a structure between the first electrode and the semi-reflecting mirror layer constitutes a microcavity structure, and organic film layers of the sub-pixel units of different colors of each pixel unit have different thicknesses. The present disclosure further provides an OLED display panel, an OLED display device, and a method of manufacturing the array substrate.
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公开(公告)号：US20210134905A1
公开(公告)日：2021-05-06
申请号：US16834470
申请日：2020-03-30
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Jianye ZHANG , Xiaoxin SONG
Abstract: A display substrate includes a base, and a gate metal layer, a source-drain metal layer, and a planarization layer that are all disposed above the base. The planarization layer is disposed at a side of the gate metal layer away from the base, and the source-drain metal layer is disposed between the gate metal layer and the planarization layer. The gate metal layer includes gate electrodes, and the source-drain metal layer includes source electrodes and drain electrodes. One of the gate electrodes, a respective one of the source electrodes, and a respective one of the drain electrodes are used to form a thin film transistor. The display substrate further includes auxiliary patterns disposed on surfaces of the source electrodes and the drain electrodes facing away from the base, the auxiliary patterns are in contact with the planarization layer, and a material of the auxiliary patterns includes at least one oleophobic material.
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公开(公告)号：US20210013246A1
公开(公告)日：2021-01-14
申请号：US16917527
申请日：2020-06-30
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Jianye ZHANG
IPC: H01L27/12 , H01L21/311 , H01L21/768
Abstract: A display substrate, a manufacturing method thereof, a display panel, and a display device are provided. The method for manufacturing a display substrate includes: forming a thin film transistor on a base substrate; forming a planarization layer covering the thin film transistor; forming a metal mask layer on the planarization layer; patterning the metal mask layer to form an etching hole in the metal mask layer, the etching hole exposing a portion of the planarization layer; etching the portion of the planarization layer exposed by the etching hole to form a first via hole penetrating the planarization layer, and removing a remaining metal mask layer on the planarization layer.
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4.发明申请公开(公告)号：US20200225582A9
公开(公告)日：2020-07-16
申请号：US16300474
申请日：2018-04-25
Inventor： Wei LI , Tongshang SU , Guangyao LI , Yingbin HU , Rui MA , Jifeng SHAO , Yang ZHANG , Jianye ZHANG
Abstract: The present disclosure provides a positive photoresist composition including a major adhesive material and a photosensitizer, wherein the photoresist composition further includes a photoisomerizable compound which would be converted into an ionic structure with an increased degree of molecular polarity after ultraviolet irradiation. The formation of the ionic structure with increased polarity of the molecule reduces the adhesion between the positive photoresist and the organic film layer, facilitates stripping after formation of the via, and improves the product rate of pass. Further, the present disclosure provides a via-forming method using the positive resist composition, a display substrate including the via formed by the via-forming method, and a display device including the display substrate.
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Patent Agency Ranking
5.发明申请公开(公告)号：US20190146341A1
公开(公告)日：2019-05-16
申请号：US16300474
申请日：2018-04-25
Inventor： Wei LI , Tongshang SU , Guangyao LI , Yingbin HU , Rui MA , Jifeng SHAO , Yang ZHANG , Jianye ZHANG
Abstract: The present disclosure provides a positive photoresist composition including a major adhesive material and a photosensitizer, wherein the photoresist composition further includes a photoisomerizable compound which would be converted into an ionic structure with an increased degree of molecular polarity after ultraviolet irradiation. The formation of the ionic structure with increased polarity of the molecule reduces the adhesion between the positive photoresist and the organic film layer, facilitates stripping after formation of the via, and improves the product rate of pass. Further, the present disclosure provides a via-forming method using the positive resist composition, a display substrate including the via formed by the via-forming method, and a display device including the display substrate.
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公开(公告)号：US20180331205A1
公开(公告)日：2018-11-15
申请号：US15865433
申请日：2018-01-09
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Jianye ZHANG , Youngsuk Song , Wei Li
IPC: H01L29/66 , H01L29/423 , H01L27/32 , H01L21/02 , H01L21/311 , H01L27/12
CPC classification number: H01L29/66742 , H01L21/02172 , H01L21/311 , H01L21/31111 , H01L27/12 , H01L27/3262 , H01L27/3272 , H01L29/42384 , H01L2029/42388
Abstract: A method for fabricating a TFT-containing backplate is disclosed. The method includes forming a top-gate TFT on a substrate. The top-gate TFT includes a gate insulating layer which includes a positive silicone light shielding material. A TFT-containing backplate is also disclosed.
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公开(公告)号：US20240423024A1
公开(公告)日：2024-12-19
申请号：US18698597
申请日：2022-09-29
Applicant: BOE Technology Group Co., Ltd.
Inventor： Hongda SUN , Fengjuan LIU , Jianye ZHANG , Jinglu BAI
IPC: H10K59/122 , H10K59/12 , H10K59/124
Abstract: A display panel includes: a first substrate, a driving circuit layer including a plurality of thin-film transistors, a planarization layer including a first portion, a second portion, and a third portion; where a thickness of the first portion is less than that of the second portion, and a thickness of the third portion is less than that of the second portion; the first portion includes a first through hole; a light-emitting device including an anode, where the anode covers the first portion and a lateral surface adjacent to the first portion, of the second portion, and an angle between a surface at a side away from the first substrate, of a part of the anode covering the lateral surface of the second portion and a surface parallel to a plane where the first substrate is located, of the anode, is greater than 0.
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公开(公告)号：US20240282862A1
公开(公告)日：2024-08-22
申请号：US18024990
申请日：2022-03-31
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Fengjuan LIU , Jianye ZHANG , Yuhang LU , Hongda SUN , Pan XU
IPC: H01L29/786
CPC classification number: H01L29/7869 , H01L29/78645
Abstract: A thin film transistor including: a base substrate, and an active layer and a gate on the base substrate, where the active layer includes a first part and a second part, a conductivity of the second part is greater than a conductivity of the first part; an orthographic projection of the gate on the base substrate covers an orthographic projection of the first part on the base substrate, and the orthographic projection of the gate on the base substrate does not overlap an orthographic projection of the second part on the base substrate; and the first part includes a plurality of first sub-parts, and two sides of any one first sub-part in a trend direction of the active layer are each connected to the second part.
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公开(公告)号：US20210226180A1
公开(公告)日：2021-07-22
申请号：US16955195
申请日：2019-12-19
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Ying HAN , Wei LIU , Jianye ZHANG , Fengjuan LIU , Xing ZHANG
Abstract: A manufacturing method of OLED microcavity structure is provided. The manufacturing method includes: forming a reflective anode on a substrate; forming a transparent conductive film layer having a thickness corresponding to a required pixel on the reflective anode; patterning the transparent conductive film layer and the reflective anode with a pixel mask corresponding to the required pixel to form a pattern of the required pixel; and repeating the above steps on a resultant structure surface according to display requirements until a pixel display structure required by a display device is obtained.
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