Abstract:
An electronic device manufacturing system that includes a process tool and a tool server coupled to the process tool and comprising a communication node and an evaluation system. The communication node is configured to obtain one or more attributes from an evaluation system and provide a monitoring device comprising a data collection plan that is based on the one or more attributes. The communication node is further configured to register the monitoring device with a process tool. The communication node is further configured to receive, from the process tool, data based on the data collection plan and send the received data to the evaluation system.
Abstract:
A method includes identifying time values for a length of time to carry out process fluid delivery within multiple processing chambers that concurrently process multiple substrates; translating each time value to a recipe parameter for execution of an operation of a processing recipe; and causing the operation to be performed using each recipe parameter as a control value to control valves of a fluid panel of the multiple processing chambers. For each processing chamber of the multiple processing chambers: causing the process fluid to flow to the processing chamber for a first period of time corresponding to a first time value; and causing the process fluid to flow to a divert foreline of the processing chamber for a second period of time, the second period of time being based on a timestep of the operation and the time value.
Abstract:
A method includes identifying time values for a length of time to carry out process fluid delivery within multiple processing chambers that concurrently process multiple substrates; translating each time value to a recipe parameter for execution of an operation of a processing recipe; and causing the operation to be performed using each recipe parameter as a control value to control valves of a fluid panel of the multiple processing chambers. For each processing chamber of the multiple processing chambers, selectively controlling process fluid flow to the process chamber for a first period of time corresponding to a time value of the set of time values and to a divert foreline of the process chamber for a second period of time.
Abstract:
A server computer system creates a reference fingerprint for a first tool running a recipe. The server computer system uses reference data that pertains to the first tool performing within parameters to create the reference fingerprint. The reference fingerprint includes a target baseline and allowable ranges based on the target baseline. The server computer system determines whether sample data that is associated with a second tool running the recipe is performing within the parameters based on a comparison of the sample data to the reference fingerprint. The second tool can be the first tool or another tool of a same type as the first tool. The server computer system provides a classification of the second tool to at least one of a system or a user based on the comparison of the sample data to the reference fingerprint. The classification indicates whether the second tool is performing within the parameters.
Abstract:
Systems and methods for monitoring and detecting a malfunction within a gas distribution system are provided. A system may first enable, by a controller, gas flow through a flow path of the gas distribution system. Afterwards, the system may receive data including pressure data and/or flow rate data associated with the flow path of the gas distribution system while gas flow is enabled through the flow path. The system may process the data to determine whether the first flow path of the gas distribution system includes a malfunction. Responsive to determining that the flow path includes a malfunction, the system may determine a relative location of the malfunction within the flow path, with respect to a mass flow controller (MFC) or sensor within the flow path. The system may generate a report indicating whether the flow path includes a malfunction and a relative location of any determined malfunction.
Abstract:
An electronic device manufacturing system that includes a process tool, an evaluation system, and a communication node. The communication node is configured to obtain one or more attributes from the evaluation system and identify a data collection plan that is based on the one or more attributes. The communication node is further configured to register with the process tool to receive data according to the data collection plan and receive, from the process tool, data according to the data collection plan. The communication node is further configured to send the received data to the evaluation system.
Abstract:
An electronic device manufacturing system that includes a process tool and a tool server coupled to the process tool and comprising a communication node and an evaluation system. The communication node is configured to obtain one or more attributes from an evaluation system and provide a monitoring device comprising a data collection plan that is based on the one or more attributes. The communication node is further configured to register the monitoring device with a process tool. The communication node is further configured to receive, from the process tool, data based on the data collection plan and send the received data to the evaluation system.
Abstract:
A method and apparatus for automatically providing a virtual sensor have been described. In one embodiment, a method for automatically providing a virtual sensor includes receiving a plurality of virtual sensor templates from a server. The method further includes selecting a virtual sensor template from the plurality of virtual sensor templates. The selected virtual sensor template has an algorithm to provide a desired functionality. The method further includes selecting at least one parameter to configure the selected virtual sensor template. The method further includes automatically creating a virtual sensor associated with the selected virtual sensor template.
Abstract:
An electronic device manufacturing system that includes a process tool and a tool server coupled to the process tool and comprising a communication node and an evaluation system. The communication node is configured to receive, from a monitoring device registered on the process tool, data based on a data collection plan and send the received data to the evaluation system. The communication node is further configured to receive, from the evaluation system, feedback data based on the received data and cause the process tool to perform a corrective action based on the feedback data.
Abstract:
A method includes identifying time values for a length of time to carry out process fluid delivery within multiple processing chambers that concurrently process multiple substrates; translating each time value to a recipe parameter for execution of an operation of a processing recipe; and causing the operation to be performed using each recipe parameter as a control value to control valves of a fluid panel of the multiple processing chambers. For each processing chamber of the multiple processing chambers, selectively controlling process fluid flow to the process chamber for a first period of time corresponding to a time value of the set of time values and to a divert foreline of the process chamber for a second period of time.