公开(公告)号：US11335531B2

公开(公告)日：2022-05-17

申请号：US16789591

申请日：2020-02-13

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Morgan Evans ,  Thomas Soldi ,  Rutger Meyer Timmerman Thijssen ,  Maurice Emerson Peploski

IPC: H01J37/08 ,  H01J29/07 ,  H01J37/20 ,  H01J37/305

Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.

公开(公告)号：US20220238295A1

公开(公告)日：2022-07-28

申请号：US17722874

申请日：2022-04-18

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Morgan Evans ,  Thomas Soldi ,  Rutger Meyer Timmerman Thijssen ,  Maurice Emerson Peploski

IPC: H01J37/08 ,  H01J29/07 ,  H01J37/20 ,  H01J37/305

Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.

公开(公告)号：US20250069850A1

公开(公告)日：2025-02-27

申请号：US18236711

申请日：2023-08-22

Applicant: Applied Materials, Inc.

Inventor： Daniel Distaso ,  Thomas Soldi ,  Joseph C. Olson

IPC: H01J37/317 ,  H01J37/08 ,  H01L21/66

Abstract: A processing system that includes an ion source to direct an ion beam at a workpiece, and an angle measurement system, is disclosed. The angle measurement system includes a current measurement device, such as one or more Faraday sensors, that may be moved in at least two orthogonal directions. The current measurement device scans in a first direction, seeking the largest current measurement. The current measurement device then moves to a second position in the second direction and repeats the scanning procedure. Based on data collected at two different locations in the second direction, the angle of incidence of the incoming ion beam may be determined.

公开(公告)号：US20220100078A1

公开(公告)日：2022-03-31

申请号：US17032520

申请日：2020-09-25

Applicant: Applied Materials, Inc.

Inventor： M. Arif Zeeshan ,  Ross Bandy ,  Peter F. Kurunczi ,  Shantanu Kallakuri ,  Thomas Soldi ,  Joseph C. Olson

IPC: G03F1/36 ,  G03F1/80 ,  G03F1/70 ,  G03F1/74

Abstract: Methods and devices for producing substrates with variable height features are provided. In one example, a proximity mask may include a plate positioned over a substrate, wherein at least a portion of the plate is separated from the substrate by a distance. The plate may include a first opening and a second opening, wherein the first opening is defined by a first perimeter having a first shape, wherein the second opening is defined by a second perimeter having a second shape, and wherein the first shape is different than the second shape.

公开(公告)号：US20210257179A1

公开(公告)日：2021-08-19

申请号：US16789591

申请日：2020-02-13

Applicant: Applied Materials, Inc.

Inventor： Joseph C. Olson ,  Morgan Evans ,  Thomas Soldi ,  Rutger Meyer Timmerman Thijssen ,  Maurice Emerson Peploski

IPC: H01J37/08 ,  H01J37/305 ,  H01J37/20 ,  H01J29/07

Abstract: Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.