公开(公告)号：US10083818B2

公开(公告)日：2018-09-25

申请号：US14863153

申请日：2015-09-23

Applicant: Applied Materials, Inc.

Inventor： Abdul Aziz Khaja ,  Mohamad A. Ayoub ,  Ramesh Bokka ,  Jay D. Pinson, II ,  Juan Carlos Rocha-Alvarez

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32155 ,  H01J37/32357 ,  H01J37/32458

Abstract: A remote plasma source is disclosed that includes a core element and a first plasma block including one or more surfaces at least partially enclosing an annular-shaped plasma generating region that is disposed around a first portion of the core element. The remote plasma source further comprises one or more coils disposed around respective second portions of the core element. The remote plasma source further includes an RF power source configured to drive a RF power signal onto the one or more coils that is based on a determined impedance of the plasma generating region. Energy from the RF power signal is coupled with the plasma generating region via the one or more coils and the core element.

公开(公告)号：US10984990B2

公开(公告)日：2021-04-20

申请号：US15955290

申请日：2018-04-17

Applicant: Applied Materials, Inc.

Inventor： Ramesh Bokka ,  Jason M. Schaller ,  Jay D. Pinson, II ,  Luke Bonecutter

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/50 ,  H01L21/67 ,  H01L21/683 ,  C23C16/503 ,  C23C16/517 ,  C23C16/509 ,  C23C16/46

Abstract: A plasma processing apparatus is provided including a radio frequency power source; a direct current power source; a chamber enclosing a process volume; and a substrate support assembly disposed in the process volume. The substrate support assembly includes a substrate support having a substrate supporting surface; an electrode disposed in the substrate support; and an interconnect assembly coupling the radio frequency power source and the direct current power source with the electrode.

公开(公告)号：US09466469B2

公开(公告)日：2016-10-11

申请号：US15068690

申请日：2016-03-14

Applicant: Applied Materials, Inc.

Inventor： Abdul Aziz Khaja ,  Mohamad A. Ayoub ,  Ramesh Bokka ,  Jay D. Pinson, II ,  Juan Carlos Rocha-Alvarez

IPC: H01J37/32

CPC classification number: H01J37/32458 ,  H01J37/3211 ,  H01J37/32357

Abstract: A plasma source is provided including a core element extending from a first end to a second end along a first axis. The plasma source further includes one or more coils disposed around respective one or more first portions of the core element. The plasma source further includes a plasma block having one or more interior walls at least partially enclosing an annular plasma-generating volume that is disposed around a second portion of the core element. The annular plasma-generating volume includes a first region that is symmetrical about a plurality of perpendicular axes that are perpendicular to a first point positioned on the first axis, the first region having a width in a direction parallel to the first axis and a depth in a direction perpendicular from the first axis. The first region has a width that is at least three times greater than the depth of the first region.

Abstract translation: 提供了等离子体源，其包括沿着第一轴线从第一端延伸到第二端的芯元件。 等离子体源还包括设置在核心元件的相应的一个或多个第一部分周围的一个或多个线圈。 等离子体源还包括具有一个或多个内壁的等离子体块，其至少部分地包围围绕核心元件的第二部分设置的环形等离子体产生容积。 环形等离子体产生体积包括关于垂直于位于第一轴线上的第一点的多个垂直轴对称的第一区域，第一区域具有在平行于第一轴线的方向上的宽度， 与第一轴垂直的方向。 第一区域具有比第一区域的深度至少三倍的宽度。