公开(公告)号：US12249525B1

公开(公告)日：2025-03-11

申请号：US18680896

申请日：2024-05-31

Applicant: Applied Materials, Inc.

Inventor： Ian McDonald ,  Prashant Aji ,  Chengqing Wang ,  Shifang Li ,  Xinyuan Chong

IPC: H01L21/67 ,  H01L21/66

Abstract: Systems, methods, and computer-readable mediums for monitoring temperature of a substrate are described. Spectroscopic measurements are performed on a surface of the substrate using a metrology tool integrated with a processing tool. The measurements may be used to determine that the substrate has cooled below a threshold temperature using the spectroscopic measurements.

公开(公告)号：US12265377B2

公开(公告)日：2025-04-01

申请号：US18325918

申请日：2023-05-30

Applicant: Applied Materials, Inc.

Inventor： Priyadarshi Panda ,  Lei Lian ,  Pengyu Han ,  Todd J. Egan ,  Prashant Aji ,  Eli Mor ,  Alex J. Tom ,  Leonard Michael Tedeschi

IPC: G05B19/4155 ,  G06N20/00

Abstract: A cool cluster comprises one or more transfer chambers; a plurality of process chambers connected to the one or more transfer chambers; and a computing device of the tool cluster. The computing device is to receive first measurements generated by sensors of a first process chamber during or after a process is performed within the first process chamber; determine that the first process chamber is due for maintenance based on processing the first measurements using a first trained machine learning model; after maintenance has been performed on the first process chamber, receive second measurements generated by the sensors during or after a seasoning process is performed within the first process chamber; and determine that the first process chamber is ready to be brought back into service based on processing the second measurements using a second trained machine learning model.

公开(公告)号：US20230305531A1

公开(公告)日：2023-09-28

申请号：US18325918

申请日：2023-05-30

Applicant: Applied Materials, Inc.

Inventor： Priyadarshi Panda ,  Lei Lian ,  Pengyu Han ,  Todd J. Egan ,  Prashant Aji ,  Eli Mor ,  Alex J. Tom ,  Leonard Michael Tedeschi

IPC: G05B19/4155 ,  G06N20/00

CPC classification number: G05B19/4155 ,  G06N20/00 ,  G05B2219/31368 ,  G05B2219/45031

Abstract: A cool cluster comprises one or more transfer chambers; a plurality of process chambers connected to the one or more transfer chambers; and a computing device of the tool cluster. The computing device is to receive first measurements generated by sensors of a first process chamber during or after a process is performed within the first process chamber; determine that the first process chamber is due for maintenance based on processing the first measurements using a first trained machine learning model; after maintenance has been performed on the first process chamber, receive second measurements generated by the sensors during or after a seasoning process is performed within the first process chamber; and determine that the first process chamber is ready to be brought back into service based on processing the second measurements using a second trained machine learning model.

公开(公告)号：US11709477B2

公开(公告)日：2023-07-25

申请号：US17143072

申请日：2021-01-06

Applicant: Applied Materials, Inc.

Inventor： Priyadarshi Panda ,  Lei Lian ,  Pengyu Han ,  Todd J. Egan ,  Prashant Aji ,  Eli Mor ,  Alex J. Tom ,  Leonard Michael Tedeschi

IPC: G05B19/4155 ,  G06N20/00

CPC classification number: G05B19/4155 ,  G06N20/00 ,  G05B2219/31368 ,  G05B2219/45031

Abstract: A substrate processing system comprises one or more transfer chambers; a plurality of process chambers connected to the one or more transfer chambers; and a computing device connected to each of the plurality of process chambers. The computing device is to receive first measurements generated by sensors of a first process chamber during or after a process is performed within the first process chamber; determine that the first process chamber is due for maintenance based on processing the first measurements using a first trained machine learning model; after maintenance has been performed on the first process chamber, receive second measurements generated by the sensors during or after a seasoning process is performed within the first process chamber; and determine that the first process chamber is ready to be brought back into service based on processing the second measurements using a second trained machine learning model.

公开(公告)号：US20220214662A1

公开(公告)日：2022-07-07

申请号：US17143072

申请日：2021-01-06

Applicant: Applied Materials, Inc.

Inventor： Priyadarshi Panda ,  Lei Lian ,  Pengyu Han ,  Todd J. Egan ,  Prashant Aji ,  Eli Mor ,  Alex J. Tom ,  Leonard Michael Tedeschi

IPC: G05B19/4155 ,  G06N20/00

Abstract: A substrate processing system comprises one or more transfer chambers; a plurality of process chambers connected to the one or more transfer chambers; and a computing device connected to each of the plurality of process chambers. The computing device is to receive first measurements generated by sensors of a first process chamber during or after a process is performed within the first process chamber; determine that the first process chamber is due for maintenance based on processing the first measurements using a first trained machine learning model; after maintenance has been performed on the first process chamber, receive second measurements generated by the sensors during or after a seasoning process is performed within the first process chamber; and determine that the first process chamber is ready to be brought back into service based on processing the second measurements using a second trained machine learning model.